Bruce Smith

• RIT - Innovation Hall of Fame Inductee (2013)

BOOKS

Smith, B.W., Principles of Optical Nanolithography, CRC Press (Taylor and Francis) (2006)

Smith, B.W., The Fundamental Limits of Optical Lithography, Shortcourse Workbook 2000-2005 (2005)

Smith, B.W., Advancing the Limits of Optical Lithography, Shortcourse Workbook 2000-2005 (2005)

Smith, B.W., Principles of Microlithography, Shortcourse Workbook 1995-2005 (2005)

Smith, B.W., Polarization, Immersion, and Optical Enhancement Technology, Shortcourse Workbook 2003-2005 (2005)

Smith, B.W., Deep – Ultraviolet (DUV) Lithography, Shortcourse Workbook 1997-2003 (2003)

Smith, B.W., Understanding Lens Aberrations and Influences with RET, Shortcourse Workbook (1999)

Smith, B.W., Understanding the Limits of Optical Lithography, Shortcourse Workbook (1999)

Smith, B.W., Maskmaking for IC Microlithography, Shortcourse Workbook (1998)

Smith, B.W., Multilayer Resist Systems for Optical Lithography, Shortcourse Workbook (1997)

Sheats; Smith, B.W., Microlithography:Science and Technology, Marcel Dekker, New York (1997)

THESES

Smith, B.W., Excimer Laser Microlithography At 193 Nm, Ph.D. Dissertation, RIT, Rochester, New York, United States (1994)

REFEREED JOURNAL ARTICLES

Zhou, J.; Fan, Y.; Bourov, A.; Smith, B.W., High NA 193nm Immersion Lithography for 32nm Half-Pitch Imaging, Applied Optics, 45, 13, pp. 3077-3082 (2006)

Fan, Y.; Lafferty, N.V.; Bourov, A.; Zavyalova, L.V.; Smith, B.W., Air bubble-induced light-scattering effect on image quality in 193 nm immersion lithography,, Applied Optics, 44, 19, pp. 3904-3911 (2005)

Smith, B.W., Under Water: Immersion techniques carry 193-nm lithography beyond the 65-nm node, oe magazine (2004)

Smith, B.W.; Fan, Y.; Zhou, J.; Bourov, A.; Lafferty, N.V.; Cropanese, F.C.; Estroff, A., Hyper NA water immersion lithography at 193 nm and 248 nm, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 22, 6, pp. 3439-3443 (2004)

Smith, B.W., Immersion Optical Lithography at 193nm, Future Fab International, 15 (2003)

Smith, B.W., Mutually Optimizing resolution enhancement techniques, Journal of Microlithography, Microfabrication, and Microsystems, 1, 2, pp. 95-105 (2002)

Smith, B.W.; Kang, H., Frequency filtering in alternative pupil planes, Journal of Vacuum Science & Technology B (2000)

Smith, B.W.; Petersen, J.S., Influence of off-axis illumination on optical lens aberration, Journal of Vacuum Science & Technology B, 16, 5 (1998)

Smith, B.W.; Alam, Z.; Butt, S.A.; Kurinec, S.K.; Lane, R.; Arthur, G., Development and characterization of nitride and oxide based composite materials for sub-0.18mm attenuated phase shift masking, Microelectronic Engineering, 35, 1, pp. 201-204 (1997)

Smith, B.W.; Fonseca, C.; Zavyalova, L.V.; Alam, Z.; Bourov, A., Plasma reactive ion etching of 193nm attenuated phase shift mask materials,, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 15, 6, pp. 2259-2262 (1997)

Smith, B.W.; Zavyalova, L.V.; Bourov, A.; Butt, S.A.; Fonseca, C., Investigation into excimer laser radiation damage of DUV optical phase masking films, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 15, 6, pp. 2444-2447 (1997)

Smith, B.W.; Butt, S.A.; Alam, Z., Attenuated phase shift mask materials for 248 and 193 nm lithography, Microlithography World, 6, 2 (1997)

Reichmanis, E.; Nalamasu, O.; Wallow, T.I.; Cirelli, R.A.; Dabbagh, G.; Hutton, R.S.; Novembre, A.E.; Smith, B.W., Resist design concepts for 193nm lithography: Opportunities for innovation and invention, Journal of Vacuum Science & Technology B, 15, 6 (1997)

Smith, B.W.; Novembre, A.E.; Mixon, A Negative Acting Single Layer Resist for 193 nm Lithography, P(SI-CMS), Microelectronic Engineering, 34, 2 (1997)

Smith, B.W., Strategies toward sub-0.25 micron lithography, Optics and Photonics News, 3, 23 (1997)

Smith, B.W.; Butt, S.A.; Alam, Z.; Kurinec, S.K.; Lane, R., Attenuated phase shift mask materials for 248 and 193 nm lithography, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 14, 6, pp. 3719-3723 (1996)

CONFERENCE PROCEEDINGS

Zavyalova, L.V.; Smith, B.W.; Bourov, A.; Zhang, G.; Vellanki, V.; Reynolds, P.; Flagello, D.G., Practical approach to full-field wavefront aberration measurement using phase wheel targets, Proceedings of the SPIE, SPIE, Optical Microlithography XIX, 6154, San Jose, California, United States, pp. 342-350 (2006)

Smith, B.W.; Fan, Y.; Zhou, J.; Lafferty, N.V.; Estroff, A., Evanescent wave imaging in optical lithography, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XIX, High-NA and Polarization, 6154, San Jose, California, United States (2006)

Fan, Y.; Bourov, A.; Slocum, M.; Smith, B.W., Effects of beam pointing instability on two-beam interferometric lithography, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XIX, Exposure Tools, Subsystems, and Materials, 6154, San Jose, California, United States (2006)

Bourov, A.; Robertson, S.A.; Smith, B.W.; Slocum, M.; Piscani, E.C., Resist process window characterization for the 45-nm node using an interferometric immersion microstepper, Proceedings of the SPIE, SPIE Microlithography, Advances in Resist Technology and Processing XXIII, Resist Processing, 6153, San Jose, California, United States (2006)

Robertson, S.A.; Leonard, J.M.; Smith, B.W.; Bourov, A., Comparison of immersion lithography from projection and interferometric exposure tools, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XIX, Polarization, High-NA, and Immersion Lithography, 6154, San Jose, California, United States (2006)

Zhou, J.; Fan, Y.; Smith, B.W., Three-dimensional imaging of 30-nm nanospheres using immersion interferometric lithography, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XIX, Polarization, High-NA, and Immersion Lithography, 6154, San Jose, California, United States (2006)

Bourov, A.; Robertson, S.A.; Smith, B.W.; Slocum, M.; Piscani, E.C., Experimental measurement of photoresist modulation curves, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XIX, Image Quality and Characterization, 6154, San Jose, California, United States (2006)

Cropanese, F.C.; Bourov, A.; Fan, Y.; Zhou, J.; Zavyalova, L.V.; Smith, B.W., Synthetic defocus in interferometric lithography, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVIII, Image Quality and Characterization, 5754, Santa Clara, California, United States, pp. 1769-1779 (2005)

Zhou, J.; Fan, Y.; Bourov, A.; Lafferty, N.V.; Cropanese, F.C.; Zavyalova, L.V.; Estroff, A.; Smith, B.W., Immersion lithography fluids for high NA 193 nm lithography, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVIII, Advanced Lithographic Materials, 5754, Santa Clara, California, United States, pp. 630-637 (2005)

Estroff, A.; Fan, Y.; Bourov, A.; Smith, B.W.; Foubert, P.; Leunissen, L.H.; Philipsen, V.; Askenov, Y., Mask-induced polarization effects at high NA, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVIII , Mask Polarization Effects, 5754, DOI:10.1117/12.602422, San Jose, California, United States (2005)

Smith, B.W.; Fan, Y.; Slocum, M.; Zavyalova, L.V., 25nm Immersion Lithography at a 193nm Wavelength, Proceedings of SPIE, SPIE Microlithography, Optical Microlithography XVIII, Immersion Lithography, 5754, San Jose, California, United States, pp. 141-147 (2005)

Smith, B.W.; Bourov, A.; Fan, Y.; Cropanese, F.C., Amphibian XIS: An Immersion Lithography Microstepper Platform, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVIII, Advanced Exposure Systems and Components II, 5754, San Jose, California, United States, pp. 751-759 (2005)

Fan, Y.; Bourov, A.; Zavyalova, L.V.; Zhou, J.; Estroff, A.; Lafferty, N.V.; Smith, B.W., ILSim - A compact simulation tool for interferometric lithography, Proceedings of SPIE, SPIE Microlithography, Optical Microlithography XVIII, Image Quality and Characterization, 5754, San Jose, California, United States, pp. 1805-1816 (2005)

Bourov, A.; Fan, Y.; Cropanese, F.C.; Smith, B.W., Photoresist Modulation Curves, Proc. SPIE Optical Microlithography, SPIE Microlithography, Optical Microlithography XVIII, Image Quality and Characterization, 5754, San Jose, California, United States, pp. 1762-1768 (2005)

Zavyalova, L.V.; Bourov, A.; Smith, B.W., Automated Aberration Extraction using Phase Wheel Targets, Proc. SPIE Optical Microlithography, 5754 (2005)

Lee, K.; Kunjappu, J.; Jockusch, S.; Turro, N.J.; Widerschpan, T.; Zhou, J.; Smith, B.W.; Zimmerman, P.; Conley, W., Amplification of the index of refraction of aqueous immersion fluids by ionic surfactants, Proceedings of the SPIE, SPIE, Advances in Resist Technology and Processing XXII, 5753, DOI: 10.1117/12.606105, San Jose, California, United States, pp. 537-553 (2005)

Lafferty, N.V.; Vandenberghe, G.; Smith, B.W.; Lassiter, M.; Martin, P.G., Gray assist bar OPC, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVII, Resolution Enhancement Technology for low k1 II, 5377, Santa Clara, California, United States, pp. 381-392, February (2004)

Smith, B.W.; Bourov, A.; Fan, Y.; Zavyalova, L.V.; Lafferty, N.V.; Cropanese, F.C., Approaching the numerical aperture of water - immersion lithography at 193nm, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVII, Immersion Lithography, 5377, Santa Clara, California, United States, pp. 273-284 (2004)

Fan, Y.; Lafferty, N.V.; Bourov, A.; Zavyalova, L.V.; Smith, B.W., Study of Air Bubble Induced Light Scattering Effect On Image Quality in 193 nm Immersion Lithography, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVII, Flare, Scatter, and Stray Light, 5377, Santa Clara, California, United States, pp. 477-486 (2004)

Bourov, A.; Fan, Y.; Cropanese, F.C.; Lafferty, N.V.; Zavyalova, L.V.; Kang, H.; Smith, B.W., Immersion microlithography at 193nm with a Talbot prism interferometer,, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVII, Immersion Lithography, 5377, Santa Clara, California, United States, pp. 1573-1578 (2004)

Smith, B.W.; Zavyalova, L.V.; Estroff, A., Benefiting from polarization - effects of high-NA on imaging, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVII, High-NA and Polarization, 5377, Santa Clara, California, United States, pp. 68-79 (2004)

Estroff, A.; Fan, Y.; Cropanese, F.C.; Lafferty, N.V.; Zavyalova, L.V.; Smith, B.W., Mask induced polarization, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVII, Masks, 5377, Santa Clara, California, United States, pp. 1069-1080 (2004)

Zavyalova, L.V.; Smith, B.W.; Suganaga, T.; Matsuura, S.; Itani, T.; Cashmore, J.S., In-situ aberration monitoring using phase wheel targets, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVII, Image Quality and Characterization, 5377, Santa Clara, California, United States, pp. 172-184 (2004)

Cropanese, F.C.; Bourov, A.; Fan, Y.; Estroff, A.; Zavyalova, L.V.; Smith, B.W., Synthesis of projection lithography for low k1 via interferometry, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVII, Exposure Tools, Subsystems, and Materials, 5377, Santa Clara, California, United States, pp. 1836-1842 (2004)

Smith, B.W., Forbidden Pitch or Duty-Free: Revealing the Causes of Across-Pitch Imaging Differences, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVI, Techniques for Low-k1 Imaging, 5040, DOI: 10.1117/12.485490, Santa Clara, California, United States, pp. 399-407 (2003)

Smith, B.W.; Kang, H.; Cropanese, F.C.; Fan, Y., Water Immersion Optical Lithography for the 45nm Node, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVI, Immersion Lithography, 5040, DOI: 10.1117/12.485489, Santa Clara, California, United States, pp. 679-689 (2003)

Smith, B.W.; Ewbank, D.E., OPC and image optimization using localized frequency analysis, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XV, Lithography Simulation and Analysis, 4691, DOI: 10.1117/12.474509, Santa Clara, California, United States, pp. 148-157, July (2002)

Smith, B.W.; Cashmore, J.S., Challenges in High NA, Polarization, and Photoresists, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XV, Image Quality Assessment, 4691, doi:10.1117/12.474562, Santa Clara, California, United States, pp. 11-24, July (2002)

Smith, B.W.; Vandenberghe, G., Image Enhancement Through Square Illumination Shaping, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XV, Poster Session, 4691, doi:10.1117/12.474535, Santa Clara, California, United States, pp. 1500-1503, July (2002)

Smith, B.W., Spatial filtering effects of the attenuated PSM and assist bar OPC, Proceedings of the SPIE, SPIE Microlithography, Lithography for Semiconductor Manufacturing II, Poster Session, 4404, doi:10.1117/12.425233, Edinburgh, Scotland, United Kingdom, pp. 412-419, April (2001)

Kang, H.; Bourov, A.; Smith, B.W., Optical lithography at a 126nm wavelength, Proceedings of the SPIE, SPIE Microlithography, Emerging lithographic technologies V , Poster Session, 4343, doi:10.1117/12.436707, Santa Clara, California, United States, pp. 797-801, February (2001)

Smith, B.W.; McCallum, M., A study of obscuration in catadioptric lenses, Proceedings of the SPIE, SPIE Microlithography, Optical microlithography XIV, 4346, Santa Clara, California, United States, pp. 1128-1136 (2001)

Venkataraman, P.; Smith, B.W., Aberration of steppers using phase shifting point diffraction interferometry, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XIII, Poster Session, 4000, doi:10.1117/12.388962, Santa Clara, California, United States, pp. 1245-1249, March (2000)

Cangemi, M.; Lassiter, M.; Bourov, A.; Smith, B.W., Properties and potential of VUV lithographic thin film materials, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XIII, Poster Session, 4000, doi:10.1117/12.388995, Santa Clara, California, United States, pp. 1546-1552, March (2000)

Smith, B.W.; Kang, H., Spatial frequency filtering in the pellicle plane, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XIII, Double Exposure and Filters, 4000, doi:10.1117/12.389014, Santa Clara, California, United States, pp. 252-265, March (2000)

Smith, B.W.; Schlief, R.E., Understanding lens aberration and influences to lithographic imaging, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XIII, Image Quality and Overlay, 4000, doi:10.1117/12.389018, Santa Clara, California, United States, pp. 294-306, March (2000)

Kang, H.; Smith, B.W., Fabrication of small contacts using practical pupil filtering, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XIII, Poster Session, 4000, doi:10.1117/12.388944, Santa Clara, California, United States, pp. 1086-1091, March (2000)

Smith, B.W.; Petersen, J.S., Resolution and DOF improvement through the use of square-shaped illumination, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XII, Enhancement Techniques III, 3679, Santa Clara, California, United States, pp. 408-419, March (1999)

Smith, B.W., Variations to the influence of lens aberration invoked with PSM and OAI, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XII, Image Quality II, 3679, doi:10.1117/12.354346, Santa Clara, California, United States, pp. 330-346, March (1999)

Smith, B.W.; Bourov, A.; Zavyalova, L.V.; Cangemi, M., Design and development of thin film materials for 157 nm and VUV wavelengths:, Proceedings of the SPIE, SPIE Microlithography, Emerging Lithographic Technologies III, Novel Lithographic and Optical Techniques, 3676, Santa Clara, California, United States, pp. 350-359 (1999)

Smith, B.W.; Webb, J.E.; Petersen, J.S.; Meute, J., Aberration evaluation and tolerancing of 193 nm lithographic objective lenses, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XI, Image Quality, 3334, doi:10.1117/12.310756, Santa Clara, California, United States, pp. 269-280, February (1998)

Smith, B.W.; Zavyalova, L.V.; Petersen, J.S., Illumination pupil filtering using modified quadrupole apertures, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XI, Process Optimization and Enhancement Techniques, 3334, Santa Clara, California, United States, pp. 384-394 (1998)

Anderson, P.G.; Smith, B.W.; MaCallum; Kachwala; Socha; Chen, J.F.; Laidlaw; Gordon; Mack, Assessment of a hypothetical roadmap to extend optical lithography through the 70nm SIA technology node, SPIE, SPIE BACUS (1998)

Smith, B.W., Revalidation of the Rayleigh resolution and DOF limits, SPIE Optical Microlithography XI, 3334 (1998)

Smith, B.W.; Zavyalova, L.V.; Butt, S.A.; Bourov, A.; Bergman, N.; Fonseca, C.; Alam, Z., The effects of excimer laser radiation on attenuated phase-shift masking materials, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography X, Advanced Masks, 3051, Santa Clara, California, United States, pp. 236-244 (1997)

Rizvi, N.H.; Gower, M.C.; Ashworth, D.; Sykes, N.; Rumsby, P.T.; Smith, B.W.; Goodall, F.N.; Lawes, R.A., 193nm imaging using a small-field high-resoultion resist exposure tool, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography IX, 193-nm Lithography, 2726, doi:10.1117/12.240981, Santa Clara, California, United States, pp. 721-731, March (1996)

Randolf; Kurinec, S.K.; Smith, B.W., Optical and dielectric properties of sputtered aluminum nitride thin films, Proc. MRS Symposium on Materials Research, Rochester, New York, United States (1996)

Carcia, P.F.; French, R.H.; Sharp; Meth, J.S.; Smith, B.W., Materials screening for attenuated embedded phase shift photomasks for DUV and 193nm lithography, Proc. 16th Annual BACUS Symposium on Microlithography (1996)

Turgut, S.; Smith, B.W., Direct Measurement of Optical Constants of Metals from a KrF Excimer using Polarization Methods, Proceedings of the SPIE, SPIE, Integrated Circuit Metrology, Inspection, and Process Control IX, Poster Session, 2439, doi:10.1117/12.209235, Santa Clara, California, United States, pp. 503-505, May (1995)

Smith, B.W.; Butt, S.A.; Novembre, A.E.; Mixon, D.A., Design and Characterization of Poly(trimethylsilylmethyl methacrylate-co-chloromethyl styrene) for 193 nm exposure, Proceedings of the SPIE, SPIE Microlithography, Advances in Resist Technology and Processing XII, 193-nm Resists and Processes, 2438, doi:10.1117/12.210400, Santa Clara, California, United States, pp. 504-512, February (1995)

Chowdhury, S.D.; Alexander, D.W.; Goldman, M.; Kukas, A.W.; Farrar, N.R.; Takemoto, C.H.; Smith, B.W.; Karklin, L., Photolithography Process Characterization and 3D Modeling using DRM Data, Proceedings of the SPIE, SPIE Microlithography, Advances in Resist Technology and Processing XII, Aspects of Processing, 2438, doi:10.1117/12.210364, Santa Clara, California, United States, pp. 659-672, February (1995)

Sauer; Smith, B.W.; Dean; Morita; Tan; Ewbank; Duttagupta, Evaluation of Commercial and Experimental Resist Materials for use in Electron beam Application, Proc. 15th Annual BACUS Symposium on Microlithography (1995)

Smith, B.W.; Turgut, S., Phase-shift Mask Issues for 193 nm Lithography, Proceedings of the SPIE, SPIE, Optical/Laser Microlithography V, PSM Technology, 2197, San Jose, California, United States, pp. 201-210, March (1994)

Smith, B.W.; Eakin, T.D.; Johnson, D.W., Characterization of Safe Solvent PMMA Resist Variables for Electron Beam Lithography, Proceedings of the SPIE, SPIE, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV, Resists for Manufacturing, 2194, San Jose, California, United States, pp. 375-382, March (1994)

Crow, R.T.; Iravani, M.V.; Smith, B.W., Near-field Optical Microscopy Characterization of ICs, Proceedings of the SPIE, SPIE, Integrated Circuit Metrology, Inspection, and Process Control VIII, SEM Metrology I, 2196, doi:10.1117/12.174165, San Jose, California, United States, pp. 62-73, March (1994)

Drennan, P.G.; Smith, B.W.; Alexander, D.W., Technique for the Measurement of the In-Situ Development Rate of DNQ/Novalac Resists, Proceedings of the SPIE, SPIE, Integrated Circuit Metrology, Inspection, and Process Control VIII, Modeling, 2196, doi:10.1117/12.174145, San Jose, California, United States, pp. 449-465, March (1994)

Drennan, P.G.; Smith, B.W., Extraction of Process Specific Photolithography Model Parameters, Proceedings of the SPIE, SPIE, Integrated Circuit Metrology, Inspection, and Process Control VIII, Modeling, 2196, doi:10.1117/12.174146, San Jose, California, United States, pp. 466-478, March (1994)

Smith, B.W.; Novembre, A.E., A Negative Acting Single Layer Resist for 193 nm Lithography, P(SI-CMS), Proc. Tenth International Conference on Photopolymers (1994)

Zhang, G.; Smith, B.W.; Fuller, L.F., Optimization of a Liquid Phase Silylation Process for 248 nm Lithography using EL IR Photoresists, Proceedings of the SPIE, SPIE, Advances in Resist Technology and Processing, Dry-Developed Resists/Top Surface Imaging Systems and Chemistry and Process Development of Antireflective Coatings, 2195, doi:10.1117/12.175365, San Jose, California, United States, pp. 506-511 (1994)

Smith, B.W.; Gower, M.C.; Westcott, M.; Fuller, L.F., A 193 nm Deep-UV Lithography System using a Line-narrowed ArF Excimer Laser,, Proceedings of the SPIE, SPIE, Optical/Laser Microlithography, Poster Session, 1927, San Jose, California, United States, pp. 914-925, March (1993)

Smith, B.W.; Flagello, D.G.; Summa, J.R.; Fuller, L.F., Comparison of Scalar and Vector Diffraction Theory for Deep-UV Lithography, Proceedings of the SPIE, SPIE, Optical/Laser Microlithography, Poster Session, 1927, doi:10.1117/12.150481, San Jose, California, United States, pp. 847-857, March (1993)

Connors, J.E.; Kos, T.M.; Pack, R.C.; Smith, B.W., Advanced lithography simulation tools for development and analysis of wide-field high NA projection optical systems, Proceedings of the SPIE, SPIE, Optical/Laser Microlithography, Simulations and Experiments II, 1927, doi:10.1117/12.150447, San Jose, California, United States, pp. 494-510, March (1993)

Crow, R.T.; Iravani, M.V.; Smith, B.W.; Summa, J.R., Characterization of Atomic Force Microscopy and Electrical Probing Techniques for IC Metrology, Proceedings of the SPIE, SPIE, Integrated Circuit Metrology, Inspection, and Process Control VII, Scanning Probe Metrology II, 1926, doi:10.1117/12.148946, San Jose, California, United States, pp. 357-368, March (1993)

Smith, B.W.; Shaio, W.; Holscher, R.D.; Mahoney, P.F., Response Surface Modelling Utilizing Lithographic Process Simulation, Proceedings of the SPIE, SPIE, Integrated Circuit Metrology, Inspection, and Process Control VI, Lithographic Process Monitoring/Metrology II, 1673, doi:10.1117/12.59829, San Jose, California, United States, pp. 486-493, March (1992)

BOOK CHAPTERS

Smith, B.W.; Bourov, A.; Kang, H.; Cropanese, F.C.; Zavyalova, L.V., Water immersion optical lithography at 193 nm,, Microfab and Microsys, J. Microlith, 3(1), pp. 44-51 (2004)

Smith, B.W.; Bourov, A.; Liu, Optimizing vacuum ultraviolet attenuated phase shift masking materials, J. Vac. Sci.Technol. B: Microelectronics and Nanometer Structures, 20(6) 6, 2578-2582 (2002)

Smith, B.W., Optical research for UV and VUV, SRC Review, Madison, WI (2001)

Smith, B.W., Resist processing, Microlithography: Science and Technology, J. Sheats and B.W. Smith, Marcel Dekker, Ch. 9, New York (1997)

Smith, B.W., Multilayer resist technology, Microlithography: Science and Technology, J. Sheats and B.W. Smith, Marcel Dekker, Ch. 10, New York (1997)

Smith, B.W., Optics for microlithography, Microlithography: Science and Technology, J. Sheats and B.W. Smith, Marcel Dekker, Ch. 2, New York (1997)

Crivello, J.V.; Shim, S.Y.; Smith, B.W., Deep UV Chemically Amplified Dissolution Inhibited Photoresists, Chem. of Matls., 6, 11, 2167 (1994)

OTHER

Smith, B.W., Principles of Microlithgraphy, (2005)

SEMINAR ABSTRACTS

Smith, B.W., Advancing the Limits of Optical Lithography, 2000-2003 SPIE (2000)

Smith, B.W., The Fundamental Limits of Optical Lithography, 2000-2005 SPIE (2000)

Smith, B.W.; Butt, S.A.; Alam, Z., Optical films for attenuated phase shift mask application at 193nm, IEEE Lithography Workshop (1996)

Smith, B.W.; Stem, D.; Alam, Z.; Butt, S.A., Optical properties and optimization of SixNy as an anti-reflective layer for 193 nm photolithograph, Second International Symposium on 193nm Lithography (1996)

Smith, B.W.; Ramamoorthi, S., The Impact of Optical Aberrations and Flare on High NA 193nm Lithography: Resist Requirements for DOF, First International Symposium on 193nm Lithography (1995)

Smith, B.W.; Butt, S.A.; Alam, Z.; Toledo-Crow, R.; Turgut, S., Attenuated Phase-Shift Masks for 193nm, First International Symposium on 193nm Lithography (1995)

CONFERENCE PRESENTATION (NO PROCEEDINGS)

Smith, B.W., Nanolithography and the Future of the IC, Western NY Meeting of the Optical Society of America, Rochester, NY, November (2006)

Smith, B.W., Interferometric Immersion Nanopatterning, DARPA, DARPA NanoFab Workshop, Salt Lake City, Utah, United States, November (2006)

Smith, B.W., Solid Immersion and Evanescent Wave Lithography at Numerical Apertures > 1.60,, Sematech Immersion Symposium, Kyoto, Japan, October (2006)

Smith, B.W., Research Activities in Immersion Interferometric Lithography, Sematech Immersion Symposium, Kyoto, Japan, October (2006)

Smith, B.W., Metrology for EUV Projection Optics, Albany Nanotech Workshop on EUV Optics, Albany, NY, June (2006)

Smith, B.W., Pushing the limits of optical lithography, Optical Fabrication & Testing 2004, OSA Annual Meeting, Rochester, NY, October (2004)

Smith, B.W., High NA and Polarization Considerations with Immersion Lithography, ARCH Interface 2004 Microlithography Symposium, Phoenix, AZ, September (2004)

Smith, B.W., 193nm - 248nm Immersion Lithography: Water and Beyond, IMEC, IMEC Lithography Review, Leuven, Brussels, Belgium, June (2004)

Smith, B.W., Water-based 193nm Immersion Lithography, Sematech, Sematech Immersion Lithography Workshop, Los Angeles, California, United States, January (2004)

Smith, B.W., Water Immersion Lithography at Excimer Laser Wavelengths, DARPA, DARPA Microlithography Program Review, Las Vegas, Nevada, United States, January (2004)

Smith, B.W., Pushing the Limits: Optical Enhancement, Polarization, and Immersion Lithography, Semiconductor International, SEMICON West 2004, San Francisco, California, United States (2004)

Smith, B.W., Lithography at 134nm and 6.42eV (193nm Water Immersion Lithography), Sematech, Sematech Immersion Lithography Workshop, Almaden, California, United States, December (2003)

Smith, B.W., Optical microlithography: will the party ever end?, OSA Rochester New York Section, Rochester, NY, November (2003)

Smith, B.W., Optical Lithography at the Limits of Diffraction, Optical Society of America, Rochester Section, October (2003)

Smith, B.W., Water Immersion Optical Lithography at 193nm for sub-0.25 k1 Imaging,, DARPA, DARPA Microlithography Program Review, Santa Fe, New Mexico, United States, September (2003)

Smith, B.W., Extreme-NA Water Immersion Lithography for 35-65 nm Technology, Third International Symposium on 157nm Lithography, Antwerp, Belgium, September (2002)

Smith, B.W., Extreme NA Lithography at 0.8 to 1.4, IMEC, IMEC Lithography Review, Leuven, Brussels, Belgium, June (2002)

Smith, B.W., Optimizing VUV Attenuated Phase Shift masking Materials, 46th International Conference EIPBN, Anaheim, CA, May (2002)

Smith, B.W., Optical research for UV and VUV, Semiconductor Research Corporation, SRC Review, Austin, Texas, United States (2002)

Smith, B.W., 157nm Aberration Parameter Modeling Using Phase Ring Structures, Sematech, 157nm Technical Data Review, Orlando, Florida, United States, December (2001)

Smith, B.W., Challenges in Microlithography for Sub-100 nm Device Patterning,, 25th Annual EDS/CAS Conference, Rochester, NY, November (2001)

Smith, B.W., Federal and State Research Funding Opportunities in Engineering, Government Relations Committee Meeting, Rochester Institute of Technology, November (2001)

Smith, B.W., Spatial Filtering Effects of the Attenuated PSM and Assist Bar OPC, SPIE Symposium on Microelectronic and MEMS Technology, Edinburgh, Scotland, June (2001)

Smith, B.W., OPC and RET with Gray Bars for the 100nm Technology Node, IMEC, IMEC Lithography Review, Leuven, Brussels, Belgium, June (2001)

Smith, B.W., Customizing Illumination and Square Pupil Shapes, IMEC, IMEC Lithography Review, Leuven, Brussels, Belgium, June (2001)

Smith, B.W., Pupil Plane Filtering Near Mask and Image Planes, IEEE, IEEE Lithography Workshop, Saint John, Virgin Islands, December (2000)

Smith, B.W., Impact of Aberrations of Optical Extension OE Lens Code, Sematech, Sematech OE Workshop, Burlington, Vermont, United States, June (2000)

Smith, B.W., Optical research for UV and VUV, Semiconductor Research Corporation, SRC Review, Madison, Wisconsin, United States, June (2000)

Smith, B.W., Lithographic Challenges for 130nm Devices, IEEE Computer and Electron Device Society Maine Chapter, May (2000)

Smith, B.W., Tolerancing of aberrations for resolution enhancement technology: Issues involed in optimizing, Sematech, Sematech OE Workshop, Austin, Texas, United States, January (2000)

Smith, B.W., Optical enhancement techniques for 193-nm lithography: modified illumination and attenuated phase-shift masking,, ISMA’97, Singapore, June (1997)

French, R.H.; Carcia, P.F.; Sharp, K.G.; Meht, J.S.; Smith, B.W.; Cannon, R.M., New Materials Families for 193 nm and DUV Attenuating Embedded Phase Shifter Photomasks, American Ceramic Society, Annual Meeting, Cincinnati, OH, May (1997)