Lena Zavyalova

THESES

Zavyalova, L.V., Measuring Aberrations in Lithographic Projection Systems with Phase Wheel Targets, Ph.D. Dissertation, Rochester Institute of Technology, College of Science, Center for Imaging Science, Rochester, New York, United States, March (2011)

Zavyalova, L.V., UV optical properties of thin films, M.S. Thesis, Rochester Institute of Technology, College of Science, Center for Imaging Science, Rochester, New York, United States, June (2001)

REFEREED JOURNAL ARTICLES

Fan, Y.; Lafferty, N.V.; Bourov, A.; Zavyalova, L.V.; Smith, B.W., Air bubble-induced light-scattering effect on image quality in 193 nm immersion lithography,, Applied Optics, 44, 19, pp. 3904-3911 (2005)

Smith, B.W.; Fonseca, C.; Zavyalova, L.V.; Alam, Z.; Bourov, A., Plasma reactive ion etching of 193nm attenuated phase shift mask materials,, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 15, 6, pp. 2259-2262 (1997)

Smith, B.W.; Zavyalova, L.V.; Bourov, A.; Butt, S.A.; Fonseca, C., Investigation into excimer laser radiation damage of DUV optical phase masking films, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 15, 6, pp. 2444-2447 (1997)

CONFERENCE PROCEEDINGS

Zavyalova, L.V.; Smith, B.W.; Bourov, A.; Zhang, G.; Vellanki, V.; Reynolds, P.; Flagello, D.G., Practical approach to full-field wavefront aberration measurement using phase wheel targets, Proceedings of the SPIE, SPIE, Optical Microlithography XIX, 6154, San Jose, California, United States, pp. 342-350 (2006)

Cropanese, F.C.; Bourov, A.; Fan, Y.; Zhou, J.; Zavyalova, L.V.; Smith, B.W., Synthetic defocus in interferometric lithography, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVIII, Image Quality and Characterization, 5754, Santa Clara, California, United States, pp. 1769-1779 (2005)

Zhou, J.; Fan, Y.; Bourov, A.; Lafferty, N.V.; Cropanese, F.C.; Zavyalova, L.V.; Estroff, A.; Smith, B.W., Immersion lithography fluids for high NA 193 nm lithography, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVIII, Advanced Lithographic Materials, 5754, Santa Clara, California, United States, pp. 630-637 (2005)

Smith, B.W.; Fan, Y.; Slocum, M.; Zavyalova, L.V., 25nm Immersion Lithography at a 193nm Wavelength, Proceedings of SPIE, SPIE Microlithography, Optical Microlithography XVIII, Immersion Lithography, 5754, San Jose, California, United States, pp. 141-147 (2005)

Fan, Y.; Bourov, A.; Zavyalova, L.V.; Zhou, J.; Estroff, A.; Lafferty, N.V.; Smith, B.W., ILSim - A compact simulation tool for interferometric lithography, Proceedings of SPIE, SPIE Microlithography, Optical Microlithography XVIII, Image Quality and Characterization, 5754, San Jose, California, United States, pp. 1805-1816 (2005)

Zavyalova, L.V.; Bourov, A.; Smith, B.W., Automated Aberration Extraction using Phase Wheel Targets, Proc. SPIE Optical Microlithography, 5754 (2005)

Smith, B.W.; Bourov, A.; Fan, Y.; Zavyalova, L.V.; Lafferty, N.V.; Cropanese, F.C., Approaching the numerical aperture of water - immersion lithography at 193nm, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVII, Immersion Lithography, 5377, Santa Clara, California, United States, pp. 273-284 (2004)

Fan, Y.; Lafferty, N.V.; Bourov, A.; Zavyalova, L.V.; Smith, B.W., Study of Air Bubble Induced Light Scattering Effect On Image Quality in 193 nm Immersion Lithography, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVII, Flare, Scatter, and Stray Light, 5377, Santa Clara, California, United States, pp. 477-486 (2004)

Bourov, A.; Fan, Y.; Cropanese, F.C.; Lafferty, N.V.; Zavyalova, L.V.; Kang, H.; Smith, B.W., Immersion microlithography at 193nm with a Talbot prism interferometer,, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVII, Immersion Lithography, 5377, Santa Clara, California, United States, pp. 1573-1578 (2004)

Smith, B.W.; Zavyalova, L.V.; Estroff, A., Benefiting from polarization - effects of high-NA on imaging, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVII, High-NA and Polarization, 5377, Santa Clara, California, United States, pp. 68-79 (2004)

Estroff, A.; Fan, Y.; Cropanese, F.C.; Lafferty, N.V.; Zavyalova, L.V.; Smith, B.W., Mask induced polarization, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVII, Masks, 5377, Santa Clara, California, United States, pp. 1069-1080 (2004)

Zavyalova, L.V.; Smith, B.W.; Suganaga, T.; Matsuura, S.; Itani, T.; Cashmore, J.S., In-situ aberration monitoring using phase wheel targets, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVII, Image Quality and Characterization, 5377, Santa Clara, California, United States, pp. 172-184 (2004)

Cropanese, F.C.; Bourov, A.; Fan, Y.; Estroff, A.; Zavyalova, L.V.; Smith, B.W., Synthesis of projection lithography for low k1 via interferometry, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVII, Exposure Tools, Subsystems, and Materials, 5377, Santa Clara, California, United States, pp. 1836-1842 (2004)

Smith, B.W.; Bourov, A.; Zavyalova, L.V.; Cangemi, M., Design and development of thin film materials for 157 nm and VUV wavelengths:, Proceedings of the SPIE, SPIE Microlithography, Emerging Lithographic Technologies III, Novel Lithographic and Optical Techniques, 3676, Santa Clara, California, United States, pp. 350-359 (1999)

Smith, B.W.; Zavyalova, L.V.; Petersen, J.S., Illumination pupil filtering using modified quadrupole apertures, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XI, Process Optimization and Enhancement Techniques, 3334, Santa Clara, California, United States, pp. 384-394 (1998)

Smith, B.W.; Zavyalova, L.V.; Butt, S.A.; Bourov, A.; Bergman, N.; Fonseca, C.; Alam, Z., The effects of excimer laser radiation on attenuated phase-shift masking materials, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography X, Advanced Masks, 3051, Santa Clara, California, United States, pp. 236-244 (1997)

BOOK CHAPTERS

Smith, B.W.; Bourov, A.; Kang, H.; Cropanese, F.C.; Zavyalova, L.V., Water immersion optical lithography at 193 nm,, Microfab and Microsys, J. Microlith, 3(1), pp. 44-51 (2004)