Lynn F. Fuller, Ph.D.
Professor

Ph.D., Electrical Engineering
State University of Buffalo

2637 Microelectronic and Computer Engineering
(585)475-2035
lffeee@rit.edu

Research Highlights

1) Chemical Imaging Materials & Processes

Electron beam imaging is the pivotal technology for all types of lithography. Optical lithography (Deep UV, I-line, Eximer Laser, etc.) uses photomasks on quartz made by e-beam technology. E-beam direct write on wafer is a low throughput-high resolution methodology. X-ray lithography uses masks made by e-beam technology. At RIT we have built a research program focused on electron beam imaging.

Current experiments are directed toward making smaller images (approaching 0.1 micrometer), modeling and simulation of the imaging system, data preparation and manipulation, new materials evaluation, and evaluation of defects.

The laboratory facilities for this work include the Perkin-Elmer Laboratory for Electron Beam Lithography and the Center for Microelectronic and Computer Engineering, including over $15 million in state-of-the-art equipment for all aspects of semiconductor manufacturing and maskmaking.

This research program has allowed RIT to make advances in the state of the art of electron beam maskmaking and imaging, furthering our goal to provide new knowledge and to provide the manpower needed to further expand the frontiers in this important technological area.

Selected Publications

Fuller, L.F., R.E. Pearson, I.R. Turkman, S. Kurinec, R.L. Lane, M.A. Jackson, and B.W. Smith, "Microelectronics Manufacturing Education," Proceedings of the Advanced Semiconductor Manufacturing Conference, Boston, MA, October 1993.

Fuller, L.F., P.C. Waldrop, and K.D. Hirschman, "Process Capability Improvement in a Student Run Integrated Circuit Factory," Proceedings of the Advanced Semiconductor Manufacturing Conference,, Boston, MA October, 1993.

Fuller, L.F., P. C. Waldrop, S.J. Grubel, and L.M. Young, "Applying CIM and TQM to a Student Run Integrated Circuit Factory," Proceedings of the 10th Biennial University Industry Government Microelectronics Symposium, Durham NC, May 1993.

Fuller, L.F., R.E. Pearson, S.K. Kurinec, I.R. Turkman, M.A. Jackson, B.W. Smith, and R.L. Lane, "Microelectronic Engineering at RIT - The First 10 Years," Proceedings of the 10th Biennial University Industry Government Microelectronics Symposium, Durham, NC, May 1993.

Smith, B.W., D.G. Flagello, J.R. Summa, and L.F. Fuller, "Comparison of scalar and vector diffraction modeling for deep-UV lithography," Proceedings of the SPIE Symposium, March 1993.

Smith, B.W., M.C. Gower, M. Westcott, and L.F. Fuller, "An ArF Deep-UV Lithography System Using a Line-narrowed Excimer Laser," Proceedings of the SPIE Symposium, March 1993.