Nanoimaging & Materials

We conduct research into the design, development, and application of imaging to material and biological systems on very small scales, in conjunction with the Departments of Chemistry, Physics, and Electrical Engineering.
Associated Laboratories
Nanoimaging Laboratory
Nanolithography Research Labs
NanoPower Research Laboratory
Related Faculty
Richard Hailstone
Seth Hubbard (Physics)
Mike Kotlarchyk (Physics)
Bruce Smith (Electrical and Microsystems Engineering)
Tom Smith (Chemistry)
George Thurston (Physics)

Group Publications

BOOKS

    Chen, S.H.; Kotlarchyk, M., Interactions of Photons and Neutrons with Matter, 2nd Edition, World Scientific Publishing, , , Singapore (2007)

    Smith, B.W., Principles of Optical Nanolithography, CRC Press (Taylor and Francis) (2006)

    Smith, B.W., The Fundamental Limits of Optical Lithography, Shortcourse Workbook 2000-2005 (2005)

    Smith, B.W., Advancing the Limits of Optical Lithography, Shortcourse Workbook 2000-2005 (2005)

    Smith, B.W., Principles of Microlithography, Shortcourse Workbook 1995-2005 (2005)

    Smith, B.W., Polarization, Immersion, and Optical Enhancement Technology, Shortcourse Workbook 2003-2005 (2005)

    Smith, B.W., Deep – Ultraviolet (DUV) Lithography, Shortcourse Workbook 1997-2003 (2003)

    Smith, B.W., Understanding Lens Aberrations and Influences with RET, Shortcourse Workbook (1999)

    Smith, B.W., Understanding the Limits of Optical Lithography, Shortcourse Workbook (1999)

    Smith, B.W., Maskmaking for IC Microlithography, Shortcourse Workbook (1998)

    Smith, B.W., Multilayer Resist Systems for Optical Lithography, Shortcourse Workbook (1997)

    Sheats, J; Smith, B.W., Microlithography:Science and Technology, Marcel Dekker, New York (1997)


THESES

    Zavyalova, L.V., Measuring Aberrations in Lithographic Projection Systems with Phase Wheel Targets, Ph.D. Dissertation, Rochester Institute of Technology, College of Science, Center for Imaging Science, Rochester, New York, United States, March (2011)

    Tan, J., Electronic Properties Study Of The Centers In Chemical Sensitization, Ph.D. Dissertation, Rochester Institute of Technology, College of Science, Center for Imaging Science, Rochester, New York, United States (2004)

    Zavyalova, L.V., UV optical properties of thin films, M.S. Thesis, Rochester Institute of Technology, College of Science, Center for Imaging Science, Rochester, New York, United States, June (2001)


REFEREED JOURNAL ARTICLES

    Augustyn, C.L.; Allston, T.D.; Hailstone, R.K.; Reed, K.J., One-Vessel Synthesis of Iron Oxide Nanoparticles Prepared in Non-Polar Solvent, RCS Advances, DOI: 10.1039/c3ra472 (2014)

    Hailstone, R.K.; DiFrancesco, A.G.; Allston, T.D.; Parsiegla, K; Reed, K.J., Is Iron Doping of Nanoceria Possible at Low Temperatures?, J. Nanoparticle Research, in press (2014)

    Smith, T.W., Imidazole Polymers Derived from Ionic Liquid 4-Vinylimidazolium Monomers: Their Synthesis and Thermal and Dielectric Properties, Molecules, ASAP, ma300862t (2013)

    Heckman, K.L.; DeCoteau, W.E.; Estevez, A; Reed, K.J.; Costanzo, W.A.; Sanford, D; Leiter, J.C.; Clauss, J; Knapp, K; Gomez, C; Mullen, P; Rathbun, E; Prime, K; Marini, J; Patchefsky, J; Patchefsky, A.S.; Hailstone, R.K.; Ehrlichman, J.S., Custom Cerium Oxide Nanoparticles Protect against a Free Radical Mediated Autoimmune Degenerative Disease in the Brain, ACS Nano, 7, 12, pp. 10582-10596 (2013)

    Heckman, K.L.; DeCoteau, W.E.; Estevez, A; Reed, K.J.; Costanzo, W.A.; Sanford, D; Leiter, J.C.; Clauss, J; Knapp, K; Gomez, C; Mullen, P; Rathbun, E; Prime, K; Marini, J; Patchefsky, J; Patchefsky, A.S.; Hailstone, R.K.; Ehrlichman, J.S., Custom Cerium Oxide Nanoparticles Protect against a Free Radical Mediated Autoimmune Degenerative Disease in the Brain, ACS Nano, DOI: 10.1021/nn40374 (2013)

    Smith, T.W., Bis(trifluoromethyl)carbinol polynorbornene as a pseudo-polyelectrolyte in multilayered films, Thin Solid Films, 520, pp. 6170-6173 (2012)

    Pierce, M.S.; Davies, J.E.; Turner, J.J.; Chesnel, E.E.; Fullerton, E.E.; Hailstone, R.K.; Devan, S.D.; Kortright, J.B.; Liu, K; Sorenson, L.B.; York, B.R.; Hellwig, O, The Influence of Structural Disorder on Magnetic Domain Formation in Ferromagnetic Thin Films, Physical Review B, submitted (2012)

    Wang, W.; McCarney, J.P.; Hughes, K.A.; Trotter, K.J.; Stapleton, R.A.; Chabot, J.R.; Siochi, E.J.; Kotlarchyk, M.; Illingsworth, M.L., Pendent Polyimides Using Mellitic Acid Dianhydride. III. The Effect of Pendent Group Functionality on Polymer Properties, Journal of Polymer Chemistry (2009)

    Hailstone, R.K.; DiFrancesco, A.G.; Leong, J; Allston, T.D.; Reed, K.J., A Study of Lattice Expansion in CeO2 Nanoparticles by Transmission Electron Microscopy, J. Physical Chemistry C, 113, pp. 15155-15159 (2009)

    Landi, B.J.; Raffaelle, R.P., Effects of Carrier Gas Dynamics on Single Wall Carbon Nanotube Chiral Distributions During Laser Vaporization Synthesis, Journal of Nanoscience and Nanotechnology, 7, 3, pp. 883-890 (2007)

    Raffaelle, R.P.; DiLeo, R.A.; Landi, B.J., Purity Assessment of Multiwalled Carbon Nanotubes by Raman Spectroscopy, Journal of Applied Physics, 101, 6, pp. 064307/1-064307/5 (2007)

    Fagan, J.A.; Simpson, J.R.; Landi, B.J.; Richter, L.J.; Mandelbaum, I.; Bajpai, V.; Ho, D.L.; Raffaelle, R.P.; Walker, A.R.; Bauer, B.J.; Hobbie, E.K., Dielectric Response of Aligned Semiconducting Single-Wall Nanotubes, Physical Review Letters, 98, 14, pp. 147402/1-147402/4 (2007)

    Hubbard, S.M.; Raffaelle, R.P.; Robinson, R.; Bailey, C.; Wilt, D.M.; Wolford, D.; Maurer, W.; Bailey, S.G., Growth and Characterization of InAs Quantum Dot Enhanced Photovoltaic Devices, Materials Research Society Symposium Proceedings, Boston, MA, 1017E, DD13-11. (2007)

    Zambrano, E.; Kotlarchyk, M.; Langner, A.; Faraone, A., Isomeric and Concentration Effects of C4-Cosurfactants on Four-Component Microemulsions Investigated by Neutron Spin-Echo and Small-Angle Scattering, J. Phys.: Condens. Matter, 18, S2451 (2006)

    Smith, T.W.; Ayubali, M.; Kotlarchyk, M.; Langner, A., Synthesis of KDP Nanocrystals in Micellar Solutions of Block Copolymers of Poly(styrene) and Poly(oxyethylene), Polymer Preprints, 47, 464 (2006)

    Cress, C.D.; Landi, B.J.; Raffaelle, R.P.; Wilt, D.M., InGaP Alpha Voltaic Batteries: Synthesis, Modeling, and Radiation Tolerance, Journal of Applied Physics, 100, 11, pp. 114519-1-114519/5. (2006)

    Fagan, J.A.; Landi, B.J.; Mandelbaum, I.; Simpson, J.R.; Bajpai, V.; Bauer, B.J.; Migler, K.; Walker, A.R.; Hight Walker, A.R.; Hobbie, E.K., Comparative Measures of Single-Wall Carbon Nanotube Dispersion, The Journal of Physical Chemistry, 110, 47, pp. 23801-23805. (2006)

    Landi, B.J.; Evans, C.M.; Worman, J.J.; Castro, S.L.; Bailey, S.G.; Raffaelle, R.P., Noncovalent Attachment of CdSe Quantum Dots to Single Wall Carbon Nanotubes, Materials Letters, 60, 29-30, pp. 3502-3506 (2006)

    Parekh, B.; Debies, T.; Evans, C.M.; Landi, B.J.; Raffaelle, R.P.; Takacs, G.A., Photo-Oxidation of Single-Walled Carbon Nanotubes, Materials Research Society Symposium Proceedings, 887, pp. 3-8 (2006)

    Hubbard, S.M.; Wilt, D.M.; Bailey, S.G.; Byrnes, D.; Raffaelle, R.P., OMVPE Grown InAs Quantum Dots for Application in Nanostructured Photovoltaics, Proc. of the IEEE World Conference on Photovoltaic Energy Conversion, 1, pp. 118-121 (2006)

    Zhou, J.; Fan, Y.; Bourov, A.; Smith, B.W., High NA 193nm Immersion Lithography for 32nm Half-Pitch Imaging, Applied Optics, 45, 13, pp. 3077-3082 (2006)

    Atkinson, J.; Collett, J.L.; Marconi, A.; Axon, D.J.; Alonso-Herrero, A.; Batcheldor, D.; Binney, J.; Capetti, A.; Carollo, M.C.; Dressel, L.; Ford, H.; Gerssen, J.; Hughes, M.A.; Macchetto, D.; Maciejewski, W.; Merrifield, M.; Scarlata, C.; Sparks, W.B., Supermassive black hole mass estimates for NGC 1300 and NGC 2748 based on HST emission-line gas kinematics, Monthly Notices of the Royal Astronomical Society, 359, 504 (2005)

    Landi, B.J.; Cress, C.D.; Evans, C.M.; Raffaelle, R.P., Thermal Oxidation Profiling of Single-Walled Carbon Nanotubes, Chemistry of Materials, 17, 26, pp. 6819-6834 (2005)

    Huang, S.; Efstathiadis, H.; Haldar, P.; Lee, H.; Landi, B.J.; Raffaelle, R.P., Fabrication of Nanorod Arrays for Organic Solar Cell Applications, Materials Research Society Symposium Proceedings, 836, pp. 49-53 (2005)

    Hepp, A.F.; Banger, K.K.; Raffaelle, R.P., Thin Films and Nanomaterials for Energy Conversion and Storage, Materials Science and Engineering , 116, 3, pp. 231-417 (2005)

    Landi, B.J.; Raffaelle, R.P.; Heben, M.J.; Alleman, J.L.; Van Derveer, W.; Gennett, T., Development and Characterization of Single Wall Carbon Nanotube-Nafion Composite Actuators, Materials Science and Engineering: B, 116, pp. 359-362 (2005)

    Landi, B.J.; Raffaelle, R.P.; Castro, S.L.; Bailey, S.G., Single Wall Carbon Nanotube-Polymer Solar Cells, Prog. in Photovolt 13, pp. 1-8 (2005)

    Raffaelle, R.P.; Landi, B.J.; Harris, J.D.; Bailey, S.G.; Hepp, A.F., Carbon Nanotubes for Power Applications, Materials Science and Engineering: B, 116, pp. 233-243 (2005)

    Harris, J.D.; Raffaelle, R.P.; Gennett, T.; Landi, B.J.; Hepp, A.F., Growth of Multi-Walled Carbon Nanotubes by Injection CVD Using Cyclopentadienyliron Dicarbonyl Dimer and Cyclooctatetraene Iron Tricarbonyl,, Materials Science and Engineering: B, 116, pp. 369-374 (2005)

    Landi, B.J.; Castro, S.L.; Ruf, H.J.; Evans, C.M.; Bailey, S.G.; Raffaelle, R.P., CdSe Quantum Dot-Single Wall Carbon Nanotube Complexes for Polymeric Solar Cells, Solar Energy Materials and Solar Cells, 87, pp. 733-746 (2005)

    Landi, B.J.; Ruf, H.J.; Evans, C.M.; Cress, C.D.; Raffaelle, R.P., Purity Assessment of Single Wall Carbon Nanotubes, Using Optical Absorption Spectroscopy, Journal of Physical Chemistry B, 109, pp. 9952-9965 (2005)

    Neupane, P.P.; Manasreh, O.; Weaver, B.D.; Landi, B.J.; Raffaelle, R.P., Proton Irradiation Effect on Single-Wall Carbon Nanotubes in a Poly(3-octylthiophene) Matrix, Applied Physics Letters, 86 (2005)

    Landi, B.J.; Raffaelle, R.P.; Castro, S.L.; Bailey, S.G., Single-Wall Carbon Nanotube-Polymer Solar Cells, Progress in Photovoltaics, 13, 2, pp. 165-172 (2005)

    Landi, B.J.; Castro, S.L.; Evans, C.M.; Ruf, H.J.; Bailey, S.G.; Raffaelle, R.P., Quantum Dot-Single Wall Carbon Nanotube Complexes for Polymeric Photovoltaics, Materials Research Society Symposium Proceedings, 836, pp. 55-60 (2005)

    Raffaelle, R.P.; Sinharoy, S.; King, W.C.; Bailey, S.G., InAs Quantum Dot Development for Enhanced InGaAs Space Solar Cells, Materials Research Society Symposium Proceedings, 851, pp. 195-203 (2005)

    Fan, Y.; Lafferty, N.V.; Bourov, A.; Zavyalova, L.V.; Smith, B.W., Air bubble-induced light-scattering effect on image quality in 193 nm immersion lithography,, Applied Optics, 44, 19, pp. 3904-3911 (2005)

    Evans, C.M.; Landi, B.J.; Raffaelle, R.P.; Krainsky, I.; Bailey, S.G.; Landis, G.A., Thermoelectric and Thermionic Emission Properties of Carbon Nanotubes,, American Institute of Aeronautics and Astronautics: 2nd International Energy Conversion Engineering Conference (2004)

    Ruf, H.J.; Landi, B.J.; Raffaelle, R.P., SWNT Enhanced PEM Fuel Cell Membranes, American Institute of Aeronautics and Astronautics: 2nd International Energy Conversion Engineering Conference (2004)

    Landi, B.J.; Ruf, H.J.; Schauerman, C.M.; Raffaelle, R.P.; Harris, J.D.; Hepp, A.F., Injection CVD Grown MWNTs for PEM Fuel Cells, American Institute of Aeronautics and Astronautics: 2nd International Energy Conversion Engineering Conference (2004)

    Castro, S.L.; Raffaelle, R.P.; Bailey, S.G.; Landi, B.J., Colloidal CuInS2 Nanoparticles for Polymeric Solar Cells, American Institute of Aeronautics and Astronautics: 2nd International Energy Conversion Engineering Conference (2004)

    Landis, G.A.; Jenkins, P.; Scheiman, D.A.; Raffaelle, R.P., Extended Temperature Solar Cell Technology Development, American Institute of Aeronautics and Astronautics: 2nd International Energy Conversion Engineering Conference (2004)

    Huang, S.; Efstathiadis, H.; Haldar, P.; Lee, H.; Landi, B.J.; Raffaelle, R.P., Investigation of Nanostructure-Polymer Blend Solar Cells, American Institute of Aeronautics and Astronautics: 2nd International Energy Conversion Engineering Conference (2004)

    Landi, B.J.; Ruf, H.J.; Raffaelle, R.P., Purity Assessment of As-Produced Single Wall Carbon Nanotube Soot, Carbon, 33.5 (2004)

    Smith, B.W., Under Water: Immersion techniques carry 193-nm lithography beyond the 65-nm node, oe magazine (2004)

    Ruf, H.J.; Landi, B.J.; Raffaelle, R.P., SWNT Enhanced PEM Fuel Cells, American Society of Mechanical Engineers Fuel Cell (2004)

    Hailstone, R.K.; French, J.; De Keyzer, R., Latent-Image Formation in AgBr Tabular Grain Emulsions: Experimental Studies, The Imaging Science Journal, 52 (2004)

    Hailstone, R.K.; De Keyzer, R., Latent-Image Formation in AgBr Tabular Grain Emulsions: Computer Simulation Studies, The Imaging Science Journal, 52 (2004)

    Hailstone, R.K.; DiFrancesco, G.A.; Tyne, M.; De Keyzer, R., Sulphide Centers on AgIBr (100) Surfaces: Effect of Tetraazaindene on Electronic Properties, The Imaging Science Journal, 52 (2004)

    Tan, J.; Hailstone, R.K., Gold-Sulfide vs Sulphide Centers on (111) AgIBr Surfaces: Characterization and Mechanism, The Imaging Science Journal (2004)

    Bailey, S.G.; Raffaelle, R.P.; Landi, B.J.; Castro, S.L., Nanotube/Quantum Dot-Polymer Solar Cells, Proceedings of the 19th European PVSEC, 3, pp. 2137-2143 (2004)

    Morris, S.R.; Dixon, B.G.; Gennett, T.; Raffaelle, R.P., High-Energy, Rechargeable Li-Ion Battery Based on Carbon Nanotube Technology, Proceedings of the 41st Power Sources Conference, pp. 389-392 (2004)

    Morris, S.R.; Dixon, B.G.; Gennett, T.; Raffaelle, R.P.; Heben, M.J., High-Energy, Rechargeable Li-Ion Battery Based on Carbon Nanotube Technology, Journal of Power Sources, 138, 1-2, pp. 277-280 (2004)

    Castro, S.L.; Bailey, S.G.; Raffaelle, R.P.; Banger, K.K.; Hepp, A.F., Synthesis and Characterization of Colloidal CuInS2 Nanoparticles from a Molecular Single-Source Precursor, Journal of Physical Chemistry B, 108, pp. 12429-12435 (2004)

    Landi, B.J.; Ruf, H.J.; Worman, J.J.; Raffaelle, R.P., Effects of Alkyl Amide Solvents on the Dispersion of Single Wall Carbon Nanotubes, Journal of Physical Chemistry B, 108, pp. 17089-17095 (2004)

    Landi, B.J.; Castro, S.L.; Evans, C.M.; Ruf, H.J.; Bailey, S.G.; Raffaelle, R.P., Quantum Dot-Single Wall Carbon Nanotube Complexes for Polymeric Photovoltaics, Materials Research Society Symposium Proceedings, L2.8 (2004)

    Smith, B.W.; Fan, Y.; Zhou, J.; Bourov, A.; Lafferty, N.V.; Cropanese, F.C.; Estroff, A., Hyper NA water immersion lithography at 193 nm and 248 nm, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 22, 6, pp. 3439-3443 (2004)

    Bailey, S.G.; Raffaelle, R.P.; Lau, J.E.; Jenkins, P.; Castro, S.L.; Scheiman, D.A.; Tin, P.; Wilt, D.M., Scanning Tunneling Optical Resonance Spectroscopy, Photonics Tech Briefs, pp. 2a-6a (2003)

    Harris, J.D.; Hepp, A.F.; Raffaelle, R.P.; Gennett, T.; Vander Wal, R.; Landi, B.J.; Luo, Y., Growth and Characterization of Multi-Walled Carbon Nanotubes at NASA Glenn Research Center, American Institute of Aeronautics and Astronautics: 1st International Energy Conversion Engineering Conference, 5953 (2003)

    Helguera, M.; Rao, N.A., On the Role of Narrow Bandwidth Excitation and Resolution Cell Volume in the Study of Tissue Microstructure Analysis with Ultrasound, Physics in Medicine and Biology (2003)

    Zheng, J.P.; DiFrancesco, G.A.; Hailstone, R.K.; Callant, P.; De Keyzer, R., Dye Desensitization Studies: AgBr Core-Shell vs AgBr-Core/AgIBr Shell Emulsions, The Imaging Science Journal, 51, 47 (2003)

    Hailstone, R.K.; French, J.; De Keyzer, R., Sulphide Centers on AgIBr (100) Surfaces: Characterization and Energy Levels, The Imaging Science Journal, 51, 21 (2003)

    Hailstone, R.K.; French, J.; De Keyzer, R., Selenide vs Sulphide Centers on AgIBr (100) Surfaces: Characterization and Energy Levels, The Imaging Science Journal, 51, 33 (2003)

    Hailstone, R.K.; French, J.; De Keyzer, R., Sulphide Centers on (111) AgBr Surfaces: Energy Levels and Computer-Simulated Sensitometry, The Imaging Science Journal, 51, 125 (2003)

    Hailstone, R.K.; French, J.; Tan, J.; De Keyzer, R., Sulphide Centers on (111) AgBr Surfaces: Effect of Thiocyanate on Electronic Properties, The Imaging Science Journal, 51, 141 (2003)

    Raffaelle, R.P.; Gennett, T.; Lau, J.E.; Jenkins, P.; Castro, S.L.; Tin, P.; Wilt, D.M.; Pal, A.M., Scanning Tunneling Optical Resonance Microscopy (STORM), Materials Research Society, 738, pp. 135-141 (2003)

    Castro, S.L.; Bailey, S.G.; Raffaelle, R.P.; Banger, K.K.; Hepp, A.F., Nanocrystalline Chalcopyrite Materials (CuInS2 and CuInSe2) Via Low-Temperature Pyrolysis of Molecular Single-Source Precursors, Chemistry of Materials, 15, 16, pp. 3142-3147 (2003)

    Castro, S.L.; Bailey, S.G.; Raffaelle, R.P.; Banger, K.K.; Hepp, A.F., Quantum Dot Development for Space Photovoltaics, Proceedings of the 1st International Energy Conversion Engineering Conference, pp. 233-236 (2003)

    Elich, J.M.; Landi, B.J.; Gennett, T.; Raffaelle, R.P.; Krainsky, I.; Landis, G.A.; Bailey, S.G., Thermionic Properties of Single Wall Carbon Nanotubes, Proceedings of the 1st International Energy Conversion Engineering Conference, pp. 233-236 (2003)

    Wilt, D.M.; Hepp, A.F.; Moran, M.; Jenkins, P.; Scheiman, D.A.; Raffaelle, R.P., Integrated Micro-Power System (IMPS) Development at NASA Glenn Research Center, Proceedings - Electrochemical Society, pp. 194-202 (2003)

    Gennett, T.; Landi, B.J.; Elich, J.M.; Jones, K.M.; Alleman, J.L.; Lamarre, P.; Morris, S.R.; Raffaelle, R.P.; Heben, M.J., Fuel Cell Applications of Nanotube-Metal Supported Catalysts, Materials Research Society Symposium Proceedings, 756, pp. 379-384 (2003)

    Smith, B.W., Immersion Optical Lithography at 193nm, Future Fab International, 15 (2003)

    Gennett, T.; Landi, B.J.; Elich, J.M.; Jones, K.M.; Alleman, J.L.; Lamarre, P.; Morris, S.R.; Raffaelle, R.P.; Heben, M.J., Fuel Cell Applications of Nanotube-Metal Supported Catalysts, Materials Research Society Symposium Proceedings, Boston, MA, 756, FF5.81 (2002)

    Dai, J.; DiFrancesco, G.A.; Hailstone, R.K., Electronic Properties of Chemically Produced Silver Clusters: Sensitometric Studies, Journal of Imaging Science & Technology, 46 (2002)

    Tan, J.; Hailstone, R.K., Electronic Properties of Chemically Produced Silver Clusters: Photobleaching Studies, Journal of Imaging Science & Technology, 46 (2002)

    Calcines, J.; Dolan, H.M.; Falkenstern, K.R.; Kelly, C.D.; Murphy, E.P.; Klinger, R.L.; Kahn, B.E.; DiFrancesco, G.A.; Hailstone, R.K., Silver Halide Recrystallization Kinetics for the Conversion of AgCl to AgClBr, Journal of Imaging Science & Technology, 46 (2002)

    Zheng, J.P.; DiFrancesco, G.A.; Hailstone, R.K.; Callant, P.; De Keyzer, R., Dye Desensitization Studies: AgBr Core-Shell Emulsions, The Imaging Science Journal, 49 (2002)

    Raffaelle, R.P.; Castro, S.L.; Hepp, A.F.; Bailey, S.G., Quantum Dot Solar Cells, Progress in Photovoltaics, 10, 1 (2002)

    Raffaelle, R.P.; Gennett, T.; Maranchi, J.; Kumta, P.; Hepp, A.F.; Heben, M.J.; Dillon, A.C.; Jones, K.C., Carbon Nanotube Anodes For Lithium Ion Batteries, Materials Research Society Symposium Proceedings, 706, pp. 343-349 (2002)

    Patterson, J.D.; Blatt, J.H.; Burns, J.; Mantovani, J.G.; Raffaelle, R.P., A Model of Enhanced STM Current Due to Semiconductor Optical Absorption, Journal of Physics and Chemistry of Solids, 63 (2002)

    Raffaelle, R.P.; Hepp, A.F.; Landis, G.A.; Hoffman, D.J., Mission Applicability Assessment of Integrated Power Supplies and Components, Progress in Photovoltiacs (2002)

    Bailey, S.G.; Hepp, A.F.; Raffaelle, R.P.; Flood, D., Advanced Thin Film Solar Arrays for Space - the Terrestrial Legacy, Proceedings of the 12th International Photovoltaic Science and Engineering Conference, 10, pp. 571-574 (2002)

    Bailey, S.G.; Hepp, A.F.; Raffaelle, R.P., Thin Film Photovoltaics for Space Applications, Proceedings of the 36th Intersociety Energy Conversion Engineering Conference, pp. 235-238 (2002)

    Bailey, S.G.; Raffaelle, R.P.; Emery, K., Space and Terrestrial Photovoltaics – Synergy and Diversity, Progress in Photovoltaics, 10, 6, pp. 399-406 (2002)

    Raffaelle, R.P.; Hepp, A.F.; Bailey, S.G.; Landis, G.A., Microelectronic Space Power Supplies, Proceedings of the Sixth European Space Power Conference, pp. 153-157 (2002)

    Bailey, S.G.; Harris, J.D.; Hepp, A.F.; Anglin, E.J.; Raffaelle, R.P.; Clark, H.R.; Gardner, S.T.; Sun, S.S., Thin-Film Organic-Based Solar Cells for Space Power,, Proceedings of the 37th Intersociety Energy Conversion Engineering Conference, pp. 233-236 (2002)

    Bailey, S.G.; Landis, G.A.; Raffaelle, R.P., The Next-Generation of Space Cells for Diverse Environments, Proceedings of the Sixth European Space Power Conference, pp. 9-15 (2002)

    Landi, B.J.; Raffaelle, R.P.; Heben, M.J.; Alleman, J.L.; Van Derveer, W.; Gennett, T., Single Wall Carbon Nanotube-Nafion Composite Actuators, Nano Letters, 2 (2002)

    Smith, B.W., Mutually Optimizing resolution enhancement techniques, Journal of Microlithography, Microfabrication, and Microsystems, 1, 2, pp. 95-105 (2002)

    Raffaelle, R.P.; Landi, B.J.; Gennett, T.; Morris, S.R.; Dixon, B.G.; Lamarre, P., Fuel Cell Applications of Carbon Nanotubes,, American Society of Mechanical Engineers Fuel Cell 2003: Fuel Cell Science, Engineering, and Technology, 1708 (2001)

    Raffaelle, R.P.; Castro, S.L.; Hepp, A.F.; Bailey, S.G., Quantum Dot Solar Cells, Photovoltaic Research and Technology Conference, 178, 186 (2001)

    Hailstone, R.K.; Zhao, T; DiFrancesco, G.A.; Tyne, M., Sulfide Centers on (111) AgBr Surfaces: Characterization., Journal of Imaging Science & Technology, 45 (2001)

    Hailstone, R.K.; De Keyzer, R., The Effect of Trap Depth on Latent-Image Formation in an AgBr Tab¬ular Grain: A Computer Simulation Study, Journal of Imaging Science & Technology, 45 (2001)

    Hailstone, R.K.; De Keyzer, R., A Computer Simulation Study of Silver-Gold Cluster Formation on AgBr Tabular Microcrystals with AgIBr Cores, Journal of Physical Chemistry B, 105 (2001)

    Tan, J.; Dai, J.; DiFrancesco, G.A.; Hailstone, R.K., Electronic Properties of Chemically Produced Sil¬ver Clusters: Grain Morphology Studies, The Imaging Science Journal, 49 (2001)

    Hailstone, R.K., Electronic Properties of Chemically Produced Silver Clusters: Electron Trapping or Hole Removing?, The Imaging Science Journal, 49 (2001)

    Henderson, D.O.; Mu, R.; Ueda, A.; Wu, M.H.; Gordon, E.M.; Tung, Y.S.; Huang, M.; Keay, B.J.; Feldman, L.C.; Hollingsworth, J.A.; Buhro, W.E.; Harris, J.D.; Hepp, A.F.; Raffaelle, R.P., Optical and Structural Characterization of Copper Indium Disulfide Thin Films, Materials & Design, 22, 7, pp. 585-589 (2001)

    Nomura, A.E.; Kurinec, S.K.; Raffaelle, R.P., Ohmic Contact Formation on N-type 6H-SiC Using Polysilicon and Silicides, International Semiconductor Device Research Symposium Proceedings, pp. 523-526 (2001)

    Obi, N.; Takeuchi, J.; DiFrancesco, G.A.; Hailstone, R.K., Mechanistic Studies of a New Nucleated Infectious Development System Using Pyridinium Salts, Journal of Imaging Science & Technology, 44 (2000)

    Hailstone, R.K.; Vandenbroucke, D.; De Keyzer, R., Effect of Deep Electron Traps on Contrast in AgCl Emulsions., Journal of Imaging Science & Technology, 44 (2000)

    Wen, Z.; DiFrancesco, G.A.; Hailstone, R.K., A New Approach to Measuring the Fraction of Grains Developable in Polydisperse Emulsions., Journal of Imaging Science & Technology, 44 (2000)

    Smith, B.W.; Kang, H., Frequency filtering in alternative pupil planes, Journal of Vacuum Science & Technology B (2000)

    Schnabel, C.M.; Tabib-Azar, M.; Raffaelle, R.P.; Su, H.; Dudley, M.; Neudeck, P.G.; Bailey, S.G., Electrical Characterization of Defects in SiC Schottky Barriers, 16th Space Photovoltaic Research and Technology Conference, pp. 183-188 (1999)

    Raffaelle, R.P.; Junek, W.; Gorse, J.; Thompson, T.L.; Harris, J.D.; Hehemann, D.G.; Hepp, A.F.; Rybicki, G.C., Chemically Deposited Thin-Film Solar Cell Materials, 16th Space Photovoltaic Research and Technology Conference, pp. 158-163 (1999)

    Hailstone, R.K., Effect of I- impurity on the efficiency of silver cluster formation on AgBr microcrystal surfaces., Journal of Applied Physics, 86 (1999)

    Pattanaik, S.N.; Ferwerda, J.A.; Fairchild, M.D.; Greenberg, D.P., A multiscale model of adaptation and spatial vision for image display, Proceedings of SIGGRAPH, pp. 287-298 (1998)

    Obi, N.; Takeuchi, J.; Kojima, Y.; Shigemitsu, Y.; DiFrancesco, G.A.; Hailstone, R.K., Mechanistic Studies of a New Nucleated Infectious Development System Using Pyridinium Salts: Nucleation of Silver Halide Grains by Dihydropyridines, Journal of Imaging Science & Technology, 42 (1998)

    Smith, B.W.; Petersen, J.S., Influence of off-axis illumination on optical lens aberration, Journal of Vacuum Science & Technology B, 16, 5 (1998)

    Smith, B.W.; Alam, Z.; Butt, S.A.; Kurinec, S.K.; Lane, R.; Arthur, G., Development and characterization of nitride and oxide based composite materials for sub-0.18mm attenuated phase shift masking, Microelectronic Engineering, 35, 1, pp. 201-204 (1997)

    Smith, B.W.; Fonseca, C.; Zavyalova, L.V.; Alam, Z.; Bourov, A., Plasma reactive ion etching of 193nm attenuated phase shift mask materials,, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 15, 6, pp. 2259-2262 (1997)

    Smith, B.W.; Zavyalova, L.V.; Bourov, A.; Butt, S.A.; Fonseca, C., Investigation into excimer laser radiation damage of DUV optical phase masking films, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 15, 6, pp. 2444-2447 (1997)

    Hossain, M.; Bajorski, P.; Yang, W., Frictional Characteristics of Sand and Sand-Deicer Mixtures on Bare Ice, Transportation Research Record, 1585, pp. 30-38 (1997)

    Smith, B.W.; Butt, S.A.; Alam, Z., Attenuated phase shift mask materials for 248 and 193 nm lithography, Microlithography World, 6, 2 (1997)

    Reichmanis, E.; Nalamasu, O.; Wallow, T.I.; Cirelli, R.A.; Dabbagh, G.; Hutton, R.S.; Novembre, A.E.; Smith, B.W., Resist design concepts for 193nm lithography: Opportunities for innovation and invention, Journal of Vacuum Science & Technology B, 15, 6 (1997)

    Smith, B.W.; Novembre, A.E.; Mixon, D, A Negative Acting Single Layer Resist for 193 nm Lithography, P(SI-CMS), Microelectronic Engineering, 34, 2 (1997)

    Smith, B.W., Strategies toward sub-0.25 micron lithography, Optics and Photonics News, 3, 23 (1997)

    Smith, B.W.; Butt, S.A.; Alam, Z.; Kurinec, S.K.; Lane, R., Attenuated phase shift mask materials for 248 and 193 nm lithography, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 14, 6, pp. 3719-3723 (1996)

    Guo, S.; Hailstone, R.K., Spectroscopic and Sensitometric Studies of Chemically Produced Silver Clusters, Journal of Imaging Science & Technology, 40, 3, pp. 210-219 (1996)

    Hailstone, R.K., From Physics to Photography via Computer Simulation, Journal of Imaging Science & Technology, 59 (1996)

    DiFrancesco, G.A.; Pryor, C.; Tyne, M.; Hailstone, R.K., Hole Removal in High-pH-Induced Reduction-Sensitized Silver Bromide Grains, Journal of Imaging Science & Technology, 40 (1996)

    Hailstone, R.K.; Heieck, J., Computer Simulation of Photoconductivity Decay in AgBr Microcrystals: Two-Center Model, Journal of Physics D: Applied Physics, 28 (1995)

    Hailstone, R.K., Computer Simulation Studies of Silver Cluster Formation on AgBr Microcrystals, Journal of Physical Chemistry, 99 (1995)

    Rogers, J.K.; Toledo-Crow, R.; Vaez-Iravani, M.; DiFrancesco, G.A.; Zhao, T; Hailstone, R.K., Correlative Near-Field Direct/Fluorescence Imaging and Spectroscopy of a Sensitizing Dye on Single Microcrystals of Silver Halide, Journal of Imaging Science & Technology, 39, 3, pp. 205-210 (1995)

    Hailstone, R.K., Computer Simulation Study of the Effect of Grain Size on the Efficiency of Latent-Image Formation., Journal of Imaging Science & Technology, 39 (1995)

    Hailstone, R.K.; De Keyzer, R., Computer Simulation Study of the Sensitometric Effects of Corner Rounding in Cubic Grains., Journal of Imaging Science & Technology, 39 (1995)

    Hailstone, R.K., Transputer-based Simulations of Image Recording in Silver-Halide Materials, Computers in Physics, 8 (1994)

    Hailstone, R.K., Effect of Internal Latent-Image Formation in Diagnosing Unit- vs Segmented-Grain Behavior, Journal of the Society of Photographic Science and Technology of Japan, 57 (1994)

    Hailstone, R.K.; Erdtmann, D.E., Computer Simulation of Photoconductivity Decay in AgBr Microcrystals: Relaxation Model, Journal of Applied Physics, 76 (1994)

    Zhang, D.; Hailstone, R.K., Electronic Properties of Sensitizer Centers, Journal of Imaging Science & Technology, 37 (1993)

    Kotlarchyk, M.; Sheu, E.Y.; Capel, M., Structural and Dynamical Transformations Between Neighboring Dense Microemulsion Phases, Physical Review A, 46, 2, pp. 928-939 (1992)

    Hailstone, R.K.; Liebert, N.B.; Levy, M.; Hamilton, J.F., Achieving High Quantum Sensitivities with Hydrogen Hypersensitization. 2. Mechanism, Journal of Imaging Science & Technology, 35 (1991)

    Kotlarchyk, M.; Ritzau, S.M., Paracrystal Model of the High-Temperature Lamellar Phase of a Ternary Microemulsion System, ournal of Applied Crystallography, 24 (1991)

    Hailstone, R.K.; Liebert, N.B.; Levy, M., On the Mechanism of Oversensitization, Journal of Imaging Science & Technology, 34 (1990)

    Hailstone, R.K.; Liebert, N.B.; Levy, M., Development Center Distributions in a AgBr Model Emul¬sion. 2. Sulfur-Sensitized Versions, Journal of Imaging Science & Technology, 33 (1989)

    Hailstone, R.K.; Liebert, N.B.; Levy, M.; Hamilton, J.F., A Study of Internal Latent Image in AgBr Core/Shell Emulsions, Journal of Photographic Science, 36, 2 (1988)

    Hailstone, R.K.; Liebert, N.B.; Levy, M.; McCleary, R.T.; Girolmo, S.R.; Jeanmaire, D.L.; Boda, C.R., Achieving High Quantum Sensitivities with Hydrogen Hypersensitization. 1. Measurement, Journal of Imaging Science & Technology, 32 (1988)

    Hailstone, R.K.; Liebert, N.B.; Levy, M.; Hamilton, J.F., Development Center Distributions in a AgBr Model Emulsion. 1. Sulfur-Plus-Gold-Sensitized Versions, Journal of Imaging Science & Technology, 32 (1988)

    Kotlarchyk, M.; Stephens, R.B.; Huang, J.S., Study of Schultz Distribution to Model Polydispersity of Microemulsion Droplets, Journal of Physical Chemistry, 92 (1988)

    Hailstone, R.K.; Hamilton, J.F., Effect of a Distribution of Developable Sizes in Determination of the Minimum Size of the Latent Image, Journal of Imaging Science & Technology, 31 (1987)

    Hailstone, R.K.; Liebert, N.B.; Levy, M.; Hamilton, J.F., Latent Subimage in a AgBr Model Emulsion. 2. Sulfur-Sensitized Versions, Journal of Imaging Science & Technology, 31 (1987)

    Hailstone, R.K.; Hamilton, J.F., On Detecting the Latent Subimage with Light Latensification, Journal of Photographic Science, 34 (1986)

    Hailstone, R.K.; Liebert, N.B.; Levy, M.; Hamilton, J.F., Latent Subimage in a AgBr Model Emulsion. 1. Sulfur-Plus-Gold Sensitization, Journal of Imaging Science & Technology, 31 (1986)

    Huang, J.S.; Kotlarchyk, M., Study of Interfacial Curvature in a Three-Component Microemulsion with Equal Volumes of Water and Oil, Physical Review Letters, 57 (1986)

    Kotlarchyk, M.; Huang, J.S.; Kim, M.W.; Chen, S.H., Analysis of SANS Data from Dense Microemulsions, Surfactants in Solution, 6 (1986)

    Kotlarchyk, M., Structure of Concentrated Microemulsions Studied by Small-Angle Neutron Scattering, Physica B, 136 (1986)

    Chen, S.H.; Lin, T.L.; Kotlarchyk, M., Analysis of Critical Scattering Daa from AOT/D2O/n-Decane Microemulsions,, Surfactants in Solution, 6 (1986)

    Huang, J.S.; Kotlarchyk, M., Study of Interfacial Curvature in a Three-Component Microemulsion with Equal Volumes of Water and Oil, Physical Review Letters, 57 (1986)

    Hailstone, R.K.; Hamilton, J.F., Determination of the Minimum Size of the Latent Image, Journal of Imaging Science & Technology, 29 (1985)

    Chen, S.H.; Kotlarchyk, M., Structure of a Three-Component Microemulsion in the Critical Region Determined by Small-Angle Neutron Scattering, Physics of Amphiphiles: Micelles, Vescicles, and Microemulsions, 90 (1985)

    Kotlarchyk, M.; Huang, J.S.; Kim, M.W.; Chen, S.H., Structure of Dense Sodium Di-2-Ethylhexylsulfosuccinate/D2O/Decane Microemulsions, Physical Review Letters, 53, 9, pp. 941-944 (1984)

    Kotlarchyk, M.; Chen, S.H.; Huang, J.S.; Kim, M.W., Structure of Three-Component Microemulsions in the Critical Region Determined by Small-Angle Neutron Scattering, Physical Review A, 29, 4, pp. 2054-2069 (1984)

    Hailstone, R.K., Effect of Dye Energy Level on the Efficiency and Energetics of Spectral Sensitization, Journal of Photographic Science, 32 (1984)

    Huang, J.S.; Safran, S.A.; Kim, M.W.; Grest, G.S.; Kotlarchyk, M.; Quirke, N., Attractive Interactions in Micelles and Microemulsions, Physical Review Letters, 53, 6, pp. 592-595 (1984)

    Kotlarchyk, M.; Huang, J.S.; Kim, M.W.; Chen, S.H., Structure of AOT Reversed Micelles Determined by Small-Angle Neutron Scattering, Physical Review Letters, 53 (1984)

    Hailstone, R.K., A Variable-Temperature Vacuum Sensitometer for Studying the Temperature Depen¬dence of Photographic Sensitivity, Photography Science & Engineering, 27 (1983)

    Rao, N.A.; Garland, J.C.; Tanner, D.B., Thermodynamic Transition of Small Superconducting Particles, Physical Review B, 29, 3 (1983)

    Kotlarchyk, M.; Chen, S.H., Analysis of Small-Angle Neutron Scattering Spectra from Polydisperse Interacting Colloids, Journal of Chemical Physics, 79 (1983)

    Kotlarchyk, M.; Chen, S.H.; Huang, J.S., Critical Behavior of a Microemulsion Studied by Small-Angle Neutron Scattering, M., Physical Review A, 28 (1983)

    Kotlarchyk, M.; Chen, S.H.; Huang, J.S., Temperature Dependence of Size and Polydispersity in a Three-Component Microemulsion by Small-Angle Neutron Scattering, Journal of Physical Chemistry, 86 (1982)

    Rao, N.A.; Goldman, A.M., Fluctuation Heat Capacity of Amorphous Nb3Ge Films, Journal of Low Temperature Physics, 42, pp. 253-276 (1981)

    Kotlarchyk, M.; Po, H., Curved Tube Correction Factors for Indirect Measurements with a Radiation Thermometer, Applied Optics, 20 (1981)

    Rao, N.A.; Dahlberg, E.; Goldman, A.M., Thermodynamic and Resistive Transitions of Thin Superconducting Films, Physical Review Letters, 44, 2 (1980)

    Kotlarchyk, M.; Chen, S.H.; Asano, S., Accuracy of RGD Approximation for Computing Light Scattering Properties of Diffusing and Motile Bacteria, Applied Optics, 18, 14, pp. 2470-2479 (1979)


CONFERENCE PROCEEDINGS

    Smith, T.W., PVDF-based polymer blend films for fuel cell membranes, Materials Research Society Symposium Proceedings, Advance Materials for Fuel Cells, MRS, 2012, Boston, Massachusetts, United States, pp. 1384- (2013)

    Zavyalova, L.V.; Smith, B.W.; Bourov, A.; Zhang, G.; Vellanki, V.; Reynolds, P.; Flagello, D.G., Practical approach to full-field wavefront aberration measurement using phase wheel targets, Proceedings of the SPIE, SPIE, Optical Microlithography XIX, 6154, San Jose, California, United States, pp. 342-350 (2006)

    Smith, B.W.; Fan, Y.; Zhou, J.; Lafferty, N.V.; Estroff, A., Evanescent wave imaging in optical lithography, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XIX, High-NA and Polarization, 6154, San Jose, California, United States (2006)

    Fan, Y.; Bourov, A.; Slocum, M.; Smith, B.W., Effects of beam pointing instability on two-beam interferometric lithography, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XIX, Exposure Tools, Subsystems, and Materials, 6154, San Jose, California, United States (2006)

    Bourov, A.; Robertson, S.A.; Smith, B.W.; Slocum, M.; Piscani, E.C., Resist process window characterization for the 45-nm node using an interferometric immersion microstepper, Proceedings of the SPIE, SPIE Microlithography, Advances in Resist Technology and Processing XXIII, Resist Processing, 6153, San Jose, California, United States (2006)

    Robertson, S.A.; Leonard, J.M.; Smith, B.W.; Bourov, A., Comparison of immersion lithography from projection and interferometric exposure tools, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XIX, Polarization, High-NA, and Immersion Lithography, 6154, San Jose, California, United States (2006)

    Zhou, J.; Fan, Y.; Smith, B.W., Three-dimensional imaging of 30-nm nanospheres using immersion interferometric lithography, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XIX, Polarization, High-NA, and Immersion Lithography, 6154, San Jose, California, United States (2006)

    Bourov, A.; Robertson, S.A.; Smith, B.W.; Slocum, M.; Piscani, E.C., Experimental measurement of photoresist modulation curves, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XIX, Image Quality and Characterization, 6154, San Jose, California, United States (2006)

    Raffaelle, R.P.; Cress, C.D.; Wilt, D.M.; Bailey, S.G., Degradation of Nanomaterials, Materials Research Society Symposium Proceedings, 887, pp. 147-157 (2006)

    Cropanese, F.C.; Bourov, A.; Fan, Y.; Zhou, J.; Zavyalova, L.V.; Smith, B.W., Synthetic defocus in interferometric lithography, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVIII, Image Quality and Characterization, 5754, Santa Clara, California, United States, pp. 1769-1779 (2005)

    Zhou, J.; Fan, Y.; Bourov, A.; Lafferty, N.V.; Cropanese, F.C.; Zavyalova, L.V.; Estroff, A.; Smith, B.W., Immersion lithography fluids for high NA 193 nm lithography, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVIII, Advanced Lithographic Materials, 5754, Santa Clara, California, United States, pp. 630-637 (2005)

    Estroff, A.; Fan, Y.; Bourov, A.; Smith, B.W.; Foubert, P.; Leunissen, L.H.; Philipsen, V.; Askenov, Y., Mask-induced polarization effects at high NA, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVIII , Mask Polarization Effects, 5754, DOI:10.1117/12.602422, San Jose, California, United States (2005)

    Smith, B.W.; Fan, Y.; Slocum, M.; Zavyalova, L.V., 25nm Immersion Lithography at a 193nm Wavelength, Proceedings of SPIE, SPIE Microlithography, Optical Microlithography XVIII, Immersion Lithography, 5754, San Jose, California, United States, pp. 141-147 (2005)

    Smith, B.W.; Bourov, A.; Fan, Y.; Cropanese, F.C., Amphibian XIS: An Immersion Lithography Microstepper Platform, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVIII, Advanced Exposure Systems and Components II, 5754, San Jose, California, United States, pp. 751-759 (2005)

    Fan, Y.; Bourov, A.; Zavyalova, L.V.; Zhou, J.; Estroff, A.; Lafferty, N.V.; Smith, B.W., ILSim - A compact simulation tool for interferometric lithography, Proceedings of SPIE, SPIE Microlithography, Optical Microlithography XVIII, Image Quality and Characterization, 5754, San Jose, California, United States, pp. 1805-1816 (2005)

    Bourov, A.; Fan, Y.; Cropanese, F.C.; Smith, B.W., Photoresist Modulation Curves, Proc. SPIE Optical Microlithography, SPIE Microlithography, Optical Microlithography XVIII, Image Quality and Characterization, 5754, San Jose, California, United States, pp. 1762-1768 (2005)

    Zavyalova, L.V.; Bourov, A.; Smith, B.W., Automated Aberration Extraction using Phase Wheel Targets, Proc. SPIE Optical Microlithography, 5754 (2005)

    Lee, K.; Kunjappu, J.; Jockusch, S.; Turro, N.J.; Widerschpan, T.; Zhou, J.; Smith, B.W.; Zimmerman, P.; Conley, W., Amplification of the index of refraction of aqueous immersion fluids by ionic surfactants, Proceedings of the SPIE, SPIE, Advances in Resist Technology and Processing XXII, 5753, DOI: 10.1117/12.606105, San Jose, California, United States, pp. 537-553 (2005)

    Lafferty, N.V.; Vandenberghe, G.; Smith, B.W.; Lassiter, M.; Martin, P.G., Gray assist bar OPC, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVII, Resolution Enhancement Technology for low k1 II, 5377, Santa Clara, California, United States, pp. 381-392, February (2004)

    Smith, B.W.; Bourov, A.; Fan, Y.; Zavyalova, L.V.; Lafferty, N.V.; Cropanese, F.C., Approaching the numerical aperture of water - immersion lithography at 193nm, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVII, Immersion Lithography, 5377, Santa Clara, California, United States, pp. 273-284 (2004)

    Fan, Y.; Lafferty, N.V.; Bourov, A.; Zavyalova, L.V.; Smith, B.W., Study of Air Bubble Induced Light Scattering Effect On Image Quality in 193 nm Immersion Lithography, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVII, Flare, Scatter, and Stray Light, 5377, Santa Clara, California, United States, pp. 477-486 (2004)

    Bourov, A.; Fan, Y.; Cropanese, F.C.; Lafferty, N.V.; Zavyalova, L.V.; Kang, H.; Smith, B.W., Immersion microlithography at 193nm with a Talbot prism interferometer,, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVII, Immersion Lithography, 5377, Santa Clara, California, United States, pp. 1573-1578 (2004)

    Smith, B.W.; Zavyalova, L.V.; Estroff, A., Benefiting from polarization - effects of high-NA on imaging, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVII, High-NA and Polarization, 5377, Santa Clara, California, United States, pp. 68-79 (2004)

    Estroff, A.; Fan, Y.; Cropanese, F.C.; Lafferty, N.V.; Zavyalova, L.V.; Smith, B.W., Mask induced polarization, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVII, Masks, 5377, Santa Clara, California, United States, pp. 1069-1080 (2004)

    Zavyalova, L.V.; Smith, B.W.; Suganaga, T.; Matsuura, S.; Itani, T.; Cashmore, J.S., In-situ aberration monitoring using phase wheel targets, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVII, Image Quality and Characterization, 5377, Santa Clara, California, United States, pp. 172-184 (2004)

    Cropanese, F.C.; Bourov, A.; Fan, Y.; Estroff, A.; Zavyalova, L.V.; Smith, B.W., Synthesis of projection lithography for low k1 via interferometry, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVII, Exposure Tools, Subsystems, and Materials, 5377, Santa Clara, California, United States, pp. 1836-1842 (2004)

    Smith, B.W., Forbidden Pitch or Duty-Free: Revealing the Causes of Across-Pitch Imaging Differences, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVI, Techniques for Low-k1 Imaging, 5040, DOI: 10.1117/12.485490, Santa Clara, California, United States, pp. 399-407 (2003)

    Smith, B.W.; Kang, H.; Cropanese, F.C.; Fan, Y., Water Immersion Optical Lithography for the 45nm Node, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XVI, Immersion Lithography, 5040, DOI: 10.1117/12.485489, Santa Clara, California, United States, pp. 679-689 (2003)

    Smith, B.W.; Ewbank, D.E., OPC and image optimization using localized frequency analysis, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XV, Lithography Simulation and Analysis, 4691, DOI: 10.1117/12.474509, Santa Clara, California, United States, pp. 148-157, July (2002)

    Smith, B.W.; Cashmore, J.S., Challenges in High NA, Polarization, and Photoresists, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XV, Image Quality Assessment, 4691, doi:10.1117/12.474562, Santa Clara, California, United States, pp. 11-24, July (2002)

    Smith, B.W.; Vandenberghe, G., Image Enhancement Through Square Illumination Shaping, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XV, Poster Session, 4691, doi:10.1117/12.474535, Santa Clara, California, United States, pp. 1500-1503, July (2002)

    Smith, B.W., Spatial filtering effects of the attenuated PSM and assist bar OPC, Proceedings of the SPIE, SPIE Microlithography, Lithography for Semiconductor Manufacturing II, Poster Session, 4404, doi:10.1117/12.425233, Edinburgh, Scotland, United Kingdom, pp. 412-419, April (2001)

    Kang, H.; Bourov, A.; Smith, B.W., Optical lithography at a 126nm wavelength, Proceedings of the SPIE, SPIE Microlithography, Emerging lithographic technologies V , Poster Session, 4343, doi:10.1117/12.436707, Santa Clara, California, United States, pp. 797-801, February (2001)

    Smith, B.W.; McCallum, M., A study of obscuration in catadioptric lenses, Proceedings of the SPIE, SPIE Microlithography, Optical microlithography XIV, 4346, Santa Clara, California, United States, pp. 1128-1136 (2001)

    Venkataraman, P.; Smith, B.W., Aberration of steppers using phase shifting point diffraction interferometry, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XIII, Poster Session, 4000, doi:10.1117/12.388962, Santa Clara, California, United States, pp. 1245-1249, March (2000)

    Cangemi, M.; Lassiter, M.; Bourov, A.; Smith, B.W., Properties and potential of VUV lithographic thin film materials, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XIII, Poster Session, 4000, doi:10.1117/12.388995, Santa Clara, California, United States, pp. 1546-1552, March (2000)

    Smith, B.W.; Kang, H., Spatial frequency filtering in the pellicle plane, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XIII, Double Exposure and Filters, 4000, doi:10.1117/12.389014, Santa Clara, California, United States, pp. 252-265, March (2000)

    Smith, B.W.; Schlief, R.E., Understanding lens aberration and influences to lithographic imaging, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XIII, Image Quality and Overlay, 4000, doi:10.1117/12.389018, Santa Clara, California, United States, pp. 294-306, March (2000)

    Kang, H.; Smith, B.W., Fabrication of small contacts using practical pupil filtering, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XIII, Poster Session, 4000, doi:10.1117/12.388944, Santa Clara, California, United States, pp. 1086-1091, March (2000)

    Smith, B.W.; Petersen, J.S., Resolution and DOF improvement through the use of square-shaped illumination, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XII, Enhancement Techniques III, 3679, Santa Clara, California, United States, pp. 408-419, March (1999)

    Smith, B.W., Variations to the influence of lens aberration invoked with PSM and OAI, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XII, Image Quality II, 3679, doi:10.1117/12.354346, Santa Clara, California, United States, pp. 330-346, March (1999)

    Smith, B.W.; Bourov, A.; Zavyalova, L.V.; Cangemi, M., Design and development of thin film materials for 157 nm and VUV wavelengths:, Proceedings of the SPIE, SPIE Microlithography, Emerging Lithographic Technologies III, Novel Lithographic and Optical Techniques, 3676, Santa Clara, California, United States, pp. 350-359 (1999)

    Smith, B.W.; Webb, J.E.; Petersen, J.S.; Meute, J., Aberration evaluation and tolerancing of 193 nm lithographic objective lenses, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XI, Image Quality, 3334, doi:10.1117/12.310756, Santa Clara, California, United States, pp. 269-280, February (1998)

    Smith, B.W.; Zavyalova, L.V.; Petersen, J.S., Illumination pupil filtering using modified quadrupole apertures, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography XI, Process Optimization and Enhancement Techniques, 3334, Santa Clara, California, United States, pp. 384-394 (1998)

    Anderson, P.G.; Smith, B.W.; MaCallum, M; Kachwala, N; Socha, R; Chen, J.F.; Laidlaw, T; Gordon, R; Mack, C, Assessment of a hypothetical roadmap to extend optical lithography through the 70nm SIA technology node, SPIE, SPIE BACUS (1998)

    Smith, B.W., Revalidation of the Rayleigh resolution and DOF limits, SPIE Optical Microlithography XI, 3334 (1998)

    Smith, B.W.; Zavyalova, L.V.; Butt, S.A.; Bourov, A.; Bergman, N.; Fonseca, C.; Alam, Z., The effects of excimer laser radiation on attenuated phase-shift masking materials, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography X, Advanced Masks, 3051, Santa Clara, California, United States, pp. 236-244 (1997)

    Rizvi, N.H.; Gower, M.C.; Ashworth, D.; Sykes, N.; Rumsby, P.T.; Smith, B.W.; Goodall, F.N.; Lawes, R.A., 193nm imaging using a small-field high-resoultion resist exposure tool, Proceedings of the SPIE, SPIE Microlithography, Optical Microlithography IX, 193-nm Lithography, 2726, doi:10.1117/12.240981, Santa Clara, California, United States, pp. 721-731, March (1996)

    Randolf, A; Kurinec, S.K.; Smith, B.W., Optical and dielectric properties of sputtered aluminum nitride thin films, Proc. MRS Symposium on Materials Research, Rochester, New York, United States (1996)

    Carcia, P.F.; French, R.H.; Sharp, K; Meth, J.S.; Smith, B.W., Materials screening for attenuated embedded phase shift photomasks for DUV and 193nm lithography, Proc. 16th Annual BACUS Symposium on Microlithography (1996)

    Turgut, S.; Smith, B.W., Direct Measurement of Optical Constants of Metals from a KrF Excimer using Polarization Methods, Proceedings of the SPIE, SPIE, Integrated Circuit Metrology, Inspection, and Process Control IX, Poster Session, 2439, doi:10.1117/12.209235, Santa Clara, California, United States, pp. 503-505, May (1995)

    Smith, B.W.; Butt, S.A.; Novembre, A.E.; Mixon, D.A., Design and Characterization of Poly(trimethylsilylmethyl methacrylate-co-chloromethyl styrene) for 193 nm exposure, Proceedings of the SPIE, SPIE Microlithography, Advances in Resist Technology and Processing XII, 193-nm Resists and Processes, 2438, doi:10.1117/12.210400, Santa Clara, California, United States, pp. 504-512, February (1995)

    Chowdhury, S.D.; Alexander, D.W.; Goldman, M.; Kukas, A.W.; Farrar, N.R.; Takemoto, C.H.; Smith, B.W.; Karklin, L., Photolithography Process Characterization and 3D Modeling using DRM Data, Proceedings of the SPIE, SPIE Microlithography, Advances in Resist Technology and Processing XII, Aspects of Processing, 2438, doi:10.1117/12.210364, Santa Clara, California, United States, pp. 659-672, February (1995)

    Sauer, C; Smith, B.W.; Dean, R; Morita, E; Tan, Z; Ewbank, D; Duttagupta, S, Evaluation of Commercial and Experimental Resist Materials for use in Electron beam Application, Proc. 15th Annual BACUS Symposium on Microlithography (1995)

    Smith, B.W.; Turgut, S., Phase-shift Mask Issues for 193 nm Lithography, Proceedings of the SPIE, SPIE, Optical/Laser Microlithography V, PSM Technology, 2197, San Jose, California, United States, pp. 201-210, March (1994)

    Smith, B.W.; Eakin, T.D.; Johnson, D.W., Characterization of Safe Solvent PMMA Resist Variables for Electron Beam Lithography, Proceedings of the SPIE, SPIE, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV, Resists for Manufacturing, 2194, San Jose, California, United States, pp. 375-382, March (1994)

    Crow, R.T.; Iravani, M.V.; Smith, B.W., Near-field Optical Microscopy Characterization of ICs, Proceedings of the SPIE, SPIE, Integrated Circuit Metrology, Inspection, and Process Control VIII, SEM Metrology I, 2196, doi:10.1117/12.174165, San Jose, California, United States, pp. 62-73, March (1994)

    Drennan, P.G.; Smith, B.W.; Alexander, D.W., Technique for the Measurement of the In-Situ Development Rate of DNQ/Novalac Resists, Proceedings of the SPIE, SPIE, Integrated Circuit Metrology, Inspection, and Process Control VIII, Modeling, 2196, doi:10.1117/12.174145, San Jose, California, United States, pp. 449-465, March (1994)

    Drennan, P.G.; Smith, B.W., Extraction of Process Specific Photolithography Model Parameters, Proceedings of the SPIE, SPIE, Integrated Circuit Metrology, Inspection, and Process Control VIII, Modeling, 2196, doi:10.1117/12.174146, San Jose, California, United States, pp. 466-478, March (1994)

    Raman, N; Rao, N.A., Pre-enhancement of chirp signal for inverse filtering in medical ultrasound, Proc. 16th Annual International Conference of IEEE Engg. Med. Biol. (1994)

    Smith, B.W.; Novembre, A.E., A Negative Acting Single Layer Resist for 193 nm Lithography, P(SI-CMS), Proc. Tenth International Conference on Photopolymers (1994)

    Zhang, G.; Smith, B.W.; Fuller, L.F., Optimization of a Liquid Phase Silylation Process for 248 nm Lithography using EL IR Photoresists, Proceedings of the SPIE, SPIE, Advances in Resist Technology and Processing, Dry-Developed Resists/Top Surface Imaging Systems and Chemistry and Process Development of Antireflective Coatings, 2195, doi:10.1117/12.175365, San Jose, California, United States, pp. 506-511 (1994)

    Smith, B.W.; Gower, M.C.; Westcott, M.; Fuller, L.F., A 193 nm Deep-UV Lithography System using a Line-narrowed ArF Excimer Laser,, Proceedings of the SPIE, SPIE, Optical/Laser Microlithography, Poster Session, 1927, San Jose, California, United States, pp. 914-925, March (1993)

    Smith, B.W.; Flagello, D.G.; Summa, J.R.; Fuller, L.F., Comparison of Scalar and Vector Diffraction Theory for Deep-UV Lithography, Proceedings of the SPIE, SPIE, Optical/Laser Microlithography, Poster Session, 1927, doi:10.1117/12.150481, San Jose, California, United States, pp. 847-857, March (1993)

    Connors, J.E.; Kos, T.M.; Pack, R.C.; Smith, B.W., Advanced lithography simulation tools for development and analysis of wide-field high NA projection optical systems, Proceedings of the SPIE, SPIE, Optical/Laser Microlithography, Simulations and Experiments II, 1927, doi:10.1117/12.150447, San Jose, California, United States, pp. 494-510, March (1993)

    Crow, R.T.; Iravani, M.V.; Smith, B.W.; Summa, J.R., Characterization of Atomic Force Microscopy and Electrical Probing Techniques for IC Metrology, Proceedings of the SPIE, SPIE, Integrated Circuit Metrology, Inspection, and Process Control VII, Scanning Probe Metrology II, 1926, doi:10.1117/12.148946, San Jose, California, United States, pp. 357-368, March (1993)

    Smith, B.W.; Shaio, W.; Holscher, R.D.; Mahoney, P.F., Response Surface Modelling Utilizing Lithographic Process Simulation, Proceedings of the SPIE, SPIE, Integrated Circuit Metrology, Inspection, and Process Control VI, Lithographic Process Monitoring/Metrology II, 1673, doi:10.1117/12.59829, San Jose, California, United States, pp. 486-493, March (1992)

    Ritenour, E.; Alamoudi, O.A.; Rao, N.A.; Manco-Johnson, M.L., Measurement of Dwell Time and calculation of Absorbed Energy for Specific Fetal Organs during Normal Obstetrical Ultrasound Exams, Presented at the American Inst. Of Ultrasound in Med. Annual convention, July (1988)

    Shin, S; Rao, N; Ritenour, R; Waldren, C, Bioeffects of Ultrasonic waves on Somatic Hybrid Mammalian Cells, Bulletin of Am. Physical Soc., 32, 3, March (1987)

    Hazeu, T; Rao, N; Robinson, J.H., Statics Analysis with Non-hyperbolic Moveout, Shell Geophysical Conf., Houston, Internal Publication (1984)

    Vuckovich, D.C.; Rao, N; Hazeu, T; Robinson, J.H., Wyoming Folded Belt Processing: Key Line Improvements, Shell Geophysical Conf., Houston, Internal Publication (1984)

    Rao, N; Tanner, D.B.; Garland, J.C., Heat Capacity of Superconducting Metal-Insulator Composite, Bulletin of Am. Physical Soc., 25, 3, March (1980)

    Rao, N; Cantor, R.H.; Dahlberg, E.; Goldman, A.M.; Toth, L.E.; Umbach, C, Investigation of Amorphous Thin Films of Nb-Ge in the Superconducting State, Bulletin of Am. Physical Soc., 25, 3, March (1980)

    Rao, N; Dahlberg, E.; Goldman, A.M.; Toth, L.E.; Umbach, C, Experimental Investigation of the Resistence in Thin Superconducting Films of Niobium-Germanium, Am. Inst. of Physics Conf. Proc., Inhomogeneous Superconductors, Ed. By D.U. Gubser, T.L. Francavilla, S.A. Wolf, J.R. Leibowitz, 58, New York (1980)


BOOK CHAPTERS

    Kotlarchyk, M., Scattering Theory, Elsevier Reference Module in Chemistry, Molecular Sciences and Chemical Engineering, 1st Edition, J. Reedijk, Elsevier, Waltham, Massachusetts, United States (2013)

    Smith, B.W.; Bourov, A.; Kang, H.; Cropanese, F.C.; Zavyalova, L.V., Water immersion optical lithography at 193 nm,, Microfab and Microsys, J. Microlith, 3(1), pp. 44-51 (2004)

    Kotlarchyk, M., Electromagnetic Radiation and Interactions with Matter, Encyclopedia of Imaging Science and Technology, J. Hornak, Wiley, New York (2002)

    Smith, B.W.; Bourov, A.; Liu, Y, Optimizing vacuum ultraviolet attenuated phase shift masking materials, J. Vac. Sci.Technol. B: Microelectronics and Nanometer Structures, 20(6) 6, 2578-2582 (2002)

    Hailstone, R.K., Silver Halide Detector Technology, Encyclopedia of Imaging Science and Technology, 1st Edition, Hornak, John Wiley and Sons, New York, New York, United States (2002)

    Smith, B.W., Optical research for UV and VUV, SRC Review, Madison, WI (2001)

    Kotlarchyk, M., Scattering Theory, Encyclopedia f Spectroscopy and Spectrometry, J.C. Lindon, G.E. Tranter, J.L. Holmes, Academic Press, London (1999)

    Smith, B.W., Resist processing, Microlithography: Science and Technology, J. Sheats and B.W. Smith, Marcel Dekker, Ch. 9, New York (1997)

    Smith, B.W., Multilayer resist technology, Microlithography: Science and Technology, J. Sheats and B.W. Smith, Marcel Dekker, Ch. 10, New York (1997)

    Smith, B.W., Optics for microlithography, Microlithography: Science and Technology, J. Sheats and B.W. Smith, Marcel Dekker, Ch. 2, New York (1997)

    Crivello, J.V.; Shim, S.Y.; Smith, B.W., Deep UV Chemically Amplified Dissolution Inhibited Photoresists, Chem. of Matls., 6, 11, 2167 (1994)

    Sheu, E.Y.; De Tar, M.M.; Kotlarchyk, M.; Lin, J.S.; Capel, M.; Storm, D.A., Structural Evolution and Transition of a Three-Component Dense Microemulsion System, Structure and Dynamics of Strongly Interacting Colloids and Supramolecular Aggregates in Solution, S.H. Chen, J.S. Huang, P. Tartaglia, Kluwer Academic Publishers, P. 419, Netherlands (1992)

    Huang, J.S.; Kotlarchyk, M.; Chen, S.H., Structure and Properties of Three-Component Microemulsions Near the Critical Point, Micellar Solutions and Microemulsions: Structure, Dynamics, and Statistical Thermodynamics, S. H. Chen, R. Rajagopalan, Springer-Verlag, p. 227, New York (1990)


OTHER

    Smith, B.W., Principles of Microlithgraphy, (2005)


SEMINAR ABSTRACTS

    Smith, B.W., Advancing the Limits of Optical Lithography, 2000-2003 SPIE (2000)

    Smith, B.W., The Fundamental Limits of Optical Lithography, 2000-2005 SPIE (2000)

    Smith, B.W.; Butt, S.A.; Alam, Z., Optical films for attenuated phase shift mask application at 193nm, IEEE Lithography Workshop (1996)

    Smith, B.W.; Stem, D.; Alam, Z.; Butt, S.A., Optical properties and optimization of SixNy as an anti-reflective layer for 193 nm photolithograph, Second International Symposium on 193nm Lithography (1996)

    Smith, B.W.; Ramamoorthi, S., The Impact of Optical Aberrations and Flare on High NA 193nm Lithography: Resist Requirements for DOF, First International Symposium on 193nm Lithography (1995)

    Smith, B.W.; Butt, S.A.; Alam, Z.; Toledo-Crow, R.; Turgut, S., Attenuated Phase-Shift Masks for 193nm, First International Symposium on 193nm Lithography (1995)


SENIOR RESEARCH PROJECTS

    Hann, D.S., Specular Image Capture and Evaluation for Microgloss Uniformity Measurements., Senior Research Project, Rochester Institute of Technology, College of Science, Center for Imaging Science, Rochester, New York, United States, May (2003)

    Pyrdsa, J.M., LIDAR Receiver Optical Design, Senior Research Project, Rochester Institute of Technology, College of Science, Center for Imaging Science, Rochester, New York, United States (2003)

    Godlewski, M., Image Resizing and Image Quality, Senior Research Project, Rochester Institute of Technology, College of Science, Center for Imaging Science, Rochester, New York, United States, May (2001)

    Jacoby, K., Characterizing the Effect of Spatial Translations on JPEG-compressed Images, Senior Research Project, Rochester Institute of Technology, College of Science, Center for Imaging Science, Rochester, New York, United States, May (1998)

    Weiner, C., Improved Acquisition of Underdrawings in Oil-Paintings Using IR-Reflectography, Senior Research Project, Rochester Institute of Technology, College of Science, Center for Imaging Science, Rochester, New York, United States, May (1998)

    Wong, Y., Modeling the Halftone Image to Determine the Area Fraction of Ink, Senior Research Project, Rochester Institute of Technology, College of Science, Center for Imaging Science, Rochester, New York, United States (1998)


PATENTS

    Chowdery-Corvan, P; Irving, L; Hailstone, R.K.; Reed, K.J.; Allston, T.D.; Augustyn, C, Cerium-Containing Nanoparticles Prepared in Non-Polar Solvent, U. S. Pat. 2012/0117863, November (2012)

    DiFrancesco, G.A.; Reed, K.J.; Allston, T.D.; Langner, A., Fuel Additive Containing Lattice Engineered Cerium Dioxide Nanoparticles, 2012/0124899 (2012)

    DiFrancesco, A.G.; Allston, T.D.; Hailstone, R.K.; Langner, A; Reed, K.J., Fuel Additive Containing Lattice Engineered Cerium Dioxide Nanoparticles, US Patent 2012/0124899 (2012)

    Reed, K.J.; Erlichman, J.S.; Costanzo, W.A.; DeCoteau, W.E.; Hailstone, R.K.; Stadler, B.M.; Bell, E.L., Nanoceria for the Reduction of Oxidative Stress, U. S. Prov. Pat. Appl. Ser. No. 13/654,321 (2012)


CONFERENCE PRESENTATION (NO PROCEEDINGS)

    Dai, Y; Forbes, D; Guo, W; Slocum, M; Hailstone, R.K.; Kerestes, C; Hubbard, S, Crystal Structure Characterization of Indium Arsenide Nanowires for Photovoltaic Applications, MRS, EMC-MRS 2012, State College, Penn State U, US, June (2012)

    Hailstone, R.K.; DiFrancesco, A.G.; Fitting-Kourkoutis, L; Muller, D.A.; Herder, L; Allston, T.D.; Reed, K.J., Highly Scalable Synthesis of Colloidally Stable Metal Oxide Nanoparticles, Tech Connect World, Nanotech 2012, Santa Clara, California, US, June (2012)

    Hailstone, R.K., Nanocharacterization of Soil Using Aberration-Corrected STEM, Cornell Center for Materials Science, Spring Symposium, Ithaca, New York, United States (2012)

    Hailstone, R.K.; Xin, H.L.; Muller, D.A., TEM/STEM Characterization of Soil, MSA, Annual Mtg, Nashville, Tennessee, United States (2011)

    Hailstone, R.K.; DiFrancesco, A.G.; Herder, L; Allston, T.D.; Reed, K.J., TEM Characterization of Iron-Doped Ceria-Zirconia., MSA, Ann Mtg, Nashville, Tennessee, United States (2011)

    Hailstone, R.K.; DiFrancesco, A.G.; Reed, K.J., Preparation and Characterization of CeO2 Nanoparticles, MSA, Ann Mtg, Richmond, Virginia, United States (2009)

    Vyavahare, O; Hailstone, R.K., Enhanced Performance of Organic Light Emitting Diodes Using LiF Buffer Layer, MRS, Ann Mtg, San Francisco, California, United States (2009)

    Hailstone, R.K.; DiFrancesco, A.G.; Reed, K.J., Preparation and Characterization of CeO2 Nanoparticles, MRS, Ann Mtg, Boston, Massachusetts, United States (2008)

    Svrcek, V; Mariotti, D; Hailstone, R.K.; Fujiwara, H; Kondo, M, Luminescent Colloidal Silicon Nanocrystals Prepared by Nanosecond Laser Fragmentation, MRS, Ann Mtg, San Francisco, California, United States (2008)

    Ravines, P; Wiegandt, R; Hailstone, R.K.; Romer, G, Quantitative Characterization of Fine Art Images Using Nondestructive and Noncontact Surface Profilometric Techniques and Their Application to Daguerrotypes, Conservation Science, Ann Mtg, Milano, Italy, Italy (2007)

    Smith, B.W., Nanolithography and the Future of the IC, Western NY Meeting of the Optical Society of America, Rochester, NY, November (2006)

    Smith, B.W., Interferometric Immersion Nanopatterning, DARPA, DARPA NanoFab Workshop, Salt Lake City, Utah, United States, November (2006)

    Smith, B.W., Solid Immersion and Evanescent Wave Lithography at Numerical Apertures > 1.60,, Sematech Immersion Symposium, Kyoto, Japan, October (2006)

    Smith, B.W., Research Activities in Immersion Interferometric Lithography, Sematech Immersion Symposium, Kyoto, Japan, October (2006)

    Smith, B.W., Metrology for EUV Projection Optics, Albany Nanotech Workshop on EUV Optics, Albany, NY, June (2006)

    Smith, B.W., Pushing the limits of optical lithography, Optical Fabrication & Testing 2004, OSA Annual Meeting, Rochester, NY, October (2004)

    Smith, B.W., High NA and Polarization Considerations with Immersion Lithography, ARCH Interface 2004 Microlithography Symposium, Phoenix, AZ, September (2004)

    Smith, B.W., 193nm - 248nm Immersion Lithography: Water and Beyond, IMEC, IMEC Lithography Review, Leuven, Brussels, Belgium, June (2004)

    Smith, B.W., Water-based 193nm Immersion Lithography, Sematech, Sematech Immersion Lithography Workshop, Los Angeles, California, United States, January (2004)

    Smith, B.W., Water Immersion Lithography at Excimer Laser Wavelengths, DARPA, DARPA Microlithography Program Review, Las Vegas, Nevada, United States, January (2004)

    Smith, B.W., Pushing the Limits: Optical Enhancement, Polarization, and Immersion Lithography, Semiconductor International, SEMICON West 2004, San Francisco, California, United States (2004)

    Smith, B.W., Lithography at 134nm and 6.42eV (193nm Water Immersion Lithography), Sematech, Sematech Immersion Lithography Workshop, Almaden, California, United States, December (2003)

    Smith, B.W., Optical microlithography: will the party ever end?, OSA Rochester New York Section, Rochester, NY, November (2003)

    Smith, B.W., Optical Lithography at the Limits of Diffraction, Optical Society of America, Rochester Section, October (2003)

    Smith, B.W., Water Immersion Optical Lithography at 193nm for sub-0.25 k1 Imaging,, DARPA, DARPA Microlithography Program Review, Santa Fe, New Mexico, United States, September (2003)

    Smith, B.W., Extreme-NA Water Immersion Lithography for 35-65 nm Technology, Third International Symposium on 157nm Lithography, Antwerp, Belgium, September (2002)

    Smith, B.W., Extreme NA Lithography at 0.8 to 1.4, IMEC, IMEC Lithography Review, Leuven, Brussels, Belgium, June (2002)

    Smith, B.W., Optimizing VUV Attenuated Phase Shift masking Materials, 46th International Conference EIPBN, Anaheim, CA, May (2002)

    Smith, B.W., Optical research for UV and VUV, Semiconductor Research Corporation, SRC Review, Austin, Texas, United States (2002)

    Smith, B.W., 157nm Aberration Parameter Modeling Using Phase Ring Structures, Sematech, 157nm Technical Data Review, Orlando, Florida, United States, December (2001)

    Smith, B.W., Challenges in Microlithography for Sub-100 nm Device Patterning,, 25th Annual EDS/CAS Conference, Rochester, NY, November (2001)

    Smith, B.W., Federal and State Research Funding Opportunities in Engineering, Government Relations Committee Meeting, Rochester Institute of Technology, November (2001)

    Smith, B.W., Spatial Filtering Effects of the Attenuated PSM and Assist Bar OPC, SPIE Symposium on Microelectronic and MEMS Technology, Edinburgh, Scotland, June (2001)

    Smith, B.W., OPC and RET with Gray Bars for the 100nm Technology Node, IMEC, IMEC Lithography Review, Leuven, Brussels, Belgium, June (2001)

    Smith, B.W., Customizing Illumination and Square Pupil Shapes, IMEC, IMEC Lithography Review, Leuven, Brussels, Belgium, June (2001)

    Kahn, B.E.; Calcines, J.; Kelly, C.D.; Klinger, R.L.; DiFrancesco, A.G.; Hailstone, R.K., Factors Influencing the Morphology and Epitaxial Growth Rates of Mixed Silver Halide Phases, Particles 2001, Ann Mtg, Orlando, Florida, United States (2001)

    Smith, B.W., Pupil Plane Filtering Near Mask and Image Planes, IEEE, IEEE Lithography Workshop, Saint John, Virgin Islands, December (2000)

    Smith, B.W., Impact of Aberrations of Optical Extension OE Lens Code, Sematech, Sematech OE Workshop, Burlington, Vermont, United States, June (2000)

    Smith, B.W., Optical research for UV and VUV, Semiconductor Research Corporation, SRC Review, Madison, Wisconsin, United States, June (2000)

    Smith, B.W., Lithographic Challenges for 130nm Devices, IEEE Computer and Electron Device Society Maine Chapter, May (2000)

    Smith, B.W., Tolerancing of aberrations for resolution enhancement technology: Issues involed in optimizing, Sematech, Sematech OE Workshop, Austin, Texas, United States, January (2000)

    Kahn, B.E.; Calcines, J.; Dolan, H.M.; Falkenstern, K.R.; Klinger, R.L.; Murphy, E.P.; DiFrancesco, A.G.; Hailstone, R.K., Kinetics of Silver Halide Conversion, IS&T, International Symposium on Silver Halide Imaging, Montreal, Quebec, Canada (2000)

    Hailstone, R.K., A Comparison of Reduction Sensitization on AgBr (111) and (100) Surfaces, IS&T, International Congress of Photographic Science, Antwerp, Antwerpen, Belgium (1998)

    Muenter, A; Brumbaugh, D; Strati, G; Hailstone, R.K., Temperature Dependence of Monomer and J-Aggregate Spectral Sensitization, IS&T, International Congress of Photographic Science, Antwerp, Antwerpen, Belgium (1998)

    Smith, B.W., Optical enhancement techniques for 193-nm lithography: modified illumination and attenuated phase-shift masking,, ISMA’97, Singapore, June (1997)

    French, R.H.; Carcia, P.F.; Sharp, K.G.; Meht, J.S.; Smith, B.W.; Cannon, R.M., New Materials Families for 193 nm and DUV Attenuating Embedded Phase Shifter Photomasks, American Ceramic Society, Annual Meeting, Cincinnati, OH, May (1997)

    DiFrancesco, A.G.; Tyne, M.; Dai, J.; Hailstone, R.K.; West, A; Schoenberg, A, Chemically Produced Silver Clusters: Electron or Hole Trapping?, IS&T, International Symposium on Silver Halide Imaging, Victoria, British Columbia, Canada (1997)

    Hailstone, R.K., Achieving Synergy Between Theory and Experiment by Computer Simulation, IS&T, International Symposium on Silver Halide Imaging, Victoria, British Columbia, Canada (1997)

    Obi, N.; Takeuchi, J.; Kojima, Y.; DiFrancesco, G.A.; Hailstone, R.K., Mechanistic Studies of a New Nucleated Infectious Development Using Pyridinium Salts, IS&T, Ann Mtg, Minneapolis, Minnesota, United States (1997)

    DiFrancesco, G.A.; Tyne, M.; Hailstone, R.K., The Behavior of Internal Reduction Sensitization Centers in AgBr Core-Shell Emulsions, IS&T, Ann Mtg, Minneapolis, Minnesota, United States (1996)

    Hailstone, R.K.; Zhao, T, Characterization of (Ag2S)n Clusters on AgBr Grains, IS&T, Ann Mtg, Minneapolis, Minnesota, United States (1996)

    Hailstone, R.K., Relaxation Mechanisms in AgX via Computer Simulation, IS&T, Ann Mtg, Minneapolis, Minnesota, United States (1996)

    Hailstone, R.K., Capturing Images with Silver Halide Microcrystals: A Materials Science Perspective, ACS, 25th NERM, Rochester, New York, United States (1995)

    Hailstone, R.K., Capturing Images with Silver Halide Microcrystals: A Materials Science Perspective, ACS, 25th NERM, Rochester, New York, United States (1995)

    Hailstone, R.K., Spectroscopic and Sensitometric Studies of Silver and Silver Sulfide Clusters, SPSTJ, Ann Mtg, Toyko, Japan, Japan (1995)

    Hailstone, R.K., From Physics to Photography Via Computer Simulation, SPSTJ, Ann Mtg, Toyko, Japan, Japan (1995)

    Hailstone, R.K., Computer Simulation Study of the Sensitometric Effects of Corner Rounding in Cubic Grains, IS&T, Ann Mtg, Washington, District of Columbia, United States (1995)

    Rogers, J.K.; Toledo-Crow, R.; Iravani, M.V.; DiFrancesco, G.A.; Zhao, T; Hailstone, R.K., Studies of a Spectral Sensitizing Dye by Near-Field Scanning Optical Microscopy, IS&T, Ann Mtg, Washington, District of Columbia, United States (1995)

    DiFrancesco, G.A.; Pryor, C.; Tyne, M.; Hailstone, R.K., “Spectroscopic and Sensitometric Analysis of High-pH-Induced Reduction Sensitized Silver Bromide Emulsions, IS&T, Ann Mtg, Washington, District of Columbia, United States (1995)

    Guo, S.; Hailstone, R.K., Spectroscopic and Sensitometric Studies of Chemically Produced Silver Clusters, IS&T, Ann Mtg, Washington, District of Columbia, United States (1995)

    DiFrancesco, G.A.; Kaspryzk, T; Pryor, C.; Hailstone, R.K., The Influence of Unintentional Reduction Sensitization on the Speed/Grain-Size Relationship in AgBr Octahedral Emulsions, IS&T, International Congress of Photographic Science, Rochester, New York, United States (1995)

    O'Toole, S.W.; Hailstone, R.K., Latent Image Stability in the Presence of Oxygen and Water Vapor, IS&T, International Congress of Photographic Science, Rochester, New York, United States (1994)

    Hailstone, R.K., Chemical Sensitization — Where Do We Go From Here?, IS&T, International Congress of Photographic Science, Rochester, New York, United States (1994)

    Erdtmann, D.E.; Hailstone, R.K., Computer Simulation Study of Photoconductivity Decay: Relaxation Model, IS&T, Ann Mtg, Cambridge, Massachusetts, United States (1993)

    Heieck, J.; Siegel, J.H.; Hailstone, R.K.; Granzer, F, A Study of the Impact of a Spectral Sensitizing Dye on the Physical and Photographic Properties of Cubic and Octahedral AgBr Microcrystals, IS&T, The International East-West Symposium on New Frontiers in Silver Halide Imaging, Lahaina, Hawaii, United States (1993)

    Heieck, J.; Hailstone, R.K.; Granzer, F, Computer Simulation Study of Photoconductivity Decay: Two-Center Model, IS&T, The International East-West Symposium on New Frontiers in Silver Halide Imaging, Lahaina, Hawaii, United States (1992)

    Erdtmann, D.E.; Hailstone, R.K., Computer Simulation Study of Photoconductivity Decay: Relaxation Model, IS&T, The International East-West Symposium on New Frontiers in Silver Halide Imaging, Lahaina, Hawaii, United States (1992)

    Zhang, D.; Hailstone, R.K., Electronic Properties of Sensitizer Centers, IS&T, The International East-West Symposium on New Frontiers in Silver Halide Imaging, Lahaina, Hawaii, United States (1992)

    Heieck, J.; Hailstone, R.K., Computer Simulation of Photoconductivity Decay: Two-Center Model, CIS , Industrial Associates Meeting, Rochester, New York, United States (1992)

    Erdtmann, D.E.; Hailstone, R.K., Computer Simulation of Photoconductivity Decay: Relaxation Model, CIS, Industrial Associates Meeting, Rochester, New York, United States (1992)

    Zhang, D.; Hailstone, R.K., Electronic Properties of Sensitizer Centers, ACS/IS&T, Frontiers in Imaging Science and Technology, Rochester, New York, United States (1992)

    Hailstone, R.K., The Silver Halide Laboratory: An Important Component of the Chemical Imaging Activities, CIS, Industrial Associates Meeting, Tokyo, Tokyo, Japan (1991)

    Zhang, D.; Hailstone, R.K., Electronic Properties of Sensitizer Centers, CIS, Industrial Associates Meeting, Rochester, New York, United States (1991)

    Hailstone, R.K., The Distribution of Photoproduced Metal Clusters on AgBr Microcrystals, **, Gordan Research Conference, Wolfeboro, New Hampshire, United States (1991)

    Hailstone, R.K., Evidence for the ‘Extra’ Electron from R Centers, IS&T, Ann Mtg, Saint Paul, Minnesota, United States (1991)

    Hailstone, R.K., Computer Simulation as a Way of Studying the Physics of the Photographic Process, IS&T, Ann Mtg, Saint Paul, Minnesota, United States (1991)

    Hailstone, R.K., Translating Physics into Photography, APS, Symposium Science of Imaging, Rochester, New York, United States (1991)

    Hailstone, R.K., Advances in Understanding Latent-Image Formation, RIT, Symposium on Chemical and Materials Science Aspects of Imaging Science, Rochester, New York, United States (1989)

    Muenter, A; Hailstone, R.K.; Hamilton, J.F., Quantitative Studies of Electron-Trapping Dye Desensitization, IS&T, East-West Symposium on Factors Influencing the Efficiency of Photographic Imaging, Hilo, Hawaii, United States (1988)

    Hailstone, R.K.; Liebert, N.B.; Levy, M.; Hailstone, R.K., Latent Subimage in a AgBr Model Emulsion. 1. Sulfur-Plus-Gold Sensitization, IS&T, International Congress of Photographic Science, Cologne, Nordrhein-Westfalen, Germany (1987)

    Hailstone, R.K.; Hamilton, J.F., Determination of the Minimum Size of the Latent Image, IS&T, East-West Symposium on Factors Influencing Photographic Sensitivity, Lahaina, Hawaii, United States (1984)

    Hailstone, R.K., Effect of Dye Energy Levels on the Efficiency and Energetics of Spectral Sensitization, IS&T, International Congress of Photographic Science, Cambridge, England, United Kingdom (1982)


Last Modified: 12:40pm 10 Aug 11