Bruce Smith Research Interests Immersion Lithography
This email address is being protected from spam bots, you need Javascript enabled to view it
Last Updated ( Friday, 17 March 2006 )
Conference Proceedings Smith, B. W.; Fan, Y.; Zhou, J.; Lafferty, N.; Estroff, A. Evanescent wave imaging in optical lithography Proc. SPIE Optical Microlithography XIX, 6154, 2006. (2006) Fan, Y.; Bouroy, A.; Slocum, M.; Smith, B. W. Effects of beam pointing instability on two-beam interferometric lithography Proc. SPIE Optical Microlithography XIX, 6154, 2006 (2006) Bourov, A.; Robertson, S. A.; Smith, B. W.; Slocum, M. A.; Piscani, E. C. Resist process window characterization for the 45-nm node using an interferometric immersion microstepper Proc. SPIE Advances in Resist Technology and Processing XXIII, 6153, 2006. (2006) Robertson, S. A,; Leonard, J. M.; Smith, B. W.; Bourov, A. Comparison of immersion lithography from projection and interferometric exposure tools Proc. Optical Microlithography XIX, 6154, 2006 (2006) Zhou, J.; Fan, Y.; Smith, B. W. Three-dimensional imaging of 30-nm nanospheres using immersion interferometric lithography Proc. Optical Microlithography XIX, 6154, 2006. (2006) Bourov, A.; Robertson, S. A.; Smith, B. W.; Slocum, M. A.; Piscani, E. C. Experimental measurement of photoresist modulation curves Proc. Optical Microlithography XIX, 6154, 2006. (2006) Zavyalova, L. V.; Smith, B. W,; Bourov, A.; Zhang, G.; Vellanki, V.; Reynolds, P.; Flagello, D. G. Practical approach to full-field wavefront aberration measurement using phase wheel targets Proc. Optical Microlithography XIX, 6154, 2006. (2006) Estroff, A.; Fan, Y.; Bourov, A.; Smith, B. W.; Foubert, P.; Leunissen, L. H.; Aksenov, Y. Mask Induced Polarization Effects at High NA Proc. SPIE 5754, 2005. (2005) Smith, B. W.; Bourov, A; Fan, Y.; Zavyalova, L.; Lafferty, N.; Cropanese, F. Approaching the numerical aperture of water - immersion lithography at 193nm Proc. SPIE 5377, 2004 (2004) Fan, Y.; Lafferty, N.; Bouroy, A.;.Zavyalova, L.; Smith, B. W. Study of Air Bubble Induced Light Scattering Effect On Image Quality in 193 nm Immersion Lithography Proc. SPIE 5377, 2004. (2004) Bourov, A; Fan, Y,; Cropanese, F.; Lafferty, N.; Zavyalova, L.; Kang, H.; Smith, B. W. Immersion microlithography at 193nm with a Talbot prism interferometer, Proc. SPIE 5377, 2004. (2004) Smith, B. W.; Zavyalova, L.; Estroff, A. Benefiting from polarization - effects of high-NA on imaging Proc. SPIE 5377, 2004 (2004) Estroff, A.; Fan, Y.; Cropanese, F.; Lafferty, N.; Zavyalova, L.; Smith, B. W. Mask induced polarization Proc. SPIE 5377, 2004. (2004) Zavyalova, L. V.; Smith, B. W,; Suganaga, T.; Matsuura, S.; Itani, T.; Cashmore, J. In-situ aberration monitoring using phase wheel targets Proc. Proc. SPIE 5377, 2004. (2004) Lafferty, N.; Vandenberghe, G.; Smith, B. W.; Lassiter, M.; Martin, P. Gray assist bar OPC, Proc. SPIE 5377, 2004 (2004) Cropanese, F. C.; Bourov, A.; Fan, Y.;Estroff, A.; Zavyalova, L.; Smith, B. W. Synthesis of projection lithography for low k1 via interferometry Proc. SPIE 5377, 2004. (2004) Smith, B. W.; Petersen, J. S. Resolution and DOF improvement through the use of square shaped illumination, Proc. SPIE Optical Microlithography XII, 1999. (1999) Smith, B. W.; Bourov, A.; Zavyalova, L.; Cangemi, M. Design and development of thin film materials for 157 nm and VUV wavelengths: Proc. SPIE Emerging Lithographic Technologies III, 1999. (1999) Petersen, J. S.; Smith, B. W.; McCallum, M.; Kachwala, N.; Socha, R.; Chen, J. F.; Laidlaw, T.; Gordon, R.; Mack, C. Assessment of a hypothetical roadmap to extend optical lithography through the 70nm SIA technology node SPIE BACUS Proceedings, 1998. (1998) Smith, B. W.; Zavyalova, L.; Petersen, J. S. Illumination pupil filtering using modified quadrupole apertures Proc. SPIE Optical Microlithography XI, 3334, 1998. (1998) Smith, B. W. Revalidation of the Rayleigh resolution and DOF limits Proc. SPIE Optical Microlithography XI, v3334, 1998. (1998) Smith, B. W.; Zavyalova, L; Butt, S.; Bourov, A.; Bergman, N. Fonseca, C.; Alan, Z. The effects of excimer laser radiation on attenuated phase-shift masking materials" Proc. SPIE 3051, 1997. (1997) Randolf, A.; Kurinec, S.; Smith, B. W. Optical and dielectric properties of sputtered aluminum nitride thin films Proc. MRS Symposium on Materials Research, Rochester, N.Y., 1996 (1996) Carcia, P. F.; French, R. H.; Sharp, K.; Meth, J. S.; Smith, B. W. Materials screening for attenuated embedded phase shift photomasks for DUV and 193nm lithography Proc. 16th Annual BACUS Symposium on Microlithography, 1996. (1996) Sauer, C.; Smith, B.; Dean, R.; Morita, E.; Tan, Z.; Ewbank, D.; Duttagupta, S Evaluation of Commercial and Experimental Resist Materials for use in Electron beam Application Proc. 15th Annual BACUS Symposium on Microlithography, 1995. (1995) Smith, B. W.; Novembre, A. E. A Negative Acting Single Layer Resist for 193 nm Lithography, P(SI-CMS) Proc. Tenth International Conference on Photopolymers, (1994). (1994) Books Smith, B. W. Principles of Optical Nanolithography CRC Press (Taylor and Francis), 2006. (2006) Smith, B. W. The Fundamental Limits of Optical Lithography Shortcourse Workbook 2000-2005 (2005) Smith, B. W. Advancing the Limits of Optical Lithography Shortcourse Workbook 2000-2005 (2005) Smith, B. W. Principles of Microlithography Shortcourse Workbook 1995-2005 (2005) Smith, B. W. Polarization, Immersion, and Optical Enhancement Technology Shortcourse Workbook 2003-2005 (2005) Smith, B. W. Deep – Ultraviolet (DUV) Lithography Shortcourse Workbook 1997-2003 (2003) Smith, B. W. Understanding the Limits of Optical Lithography Shortcourse Workbook 1999 (1999) Smith, B. W. Understanding Lens Aberrations and Influences with RET Shortcourse Workbook 1999 (1999) Smith, B. W. Maskmaking for IC Microlithography Shortcourse Workbook 1998 (1998) Sheats, J.; Smith, B. W. Microlithography:Science and Technology ed. , Marcel Dekker: New York, 1997 (1997) Smith, B. W. Multilayer Resist Systems for Optical Lithography Shortcourse Workbook 1997 (1997) Book Chapters Smith, B. W.; Fan, Y.; Zhou, J.; Bourov, A.; Zavyalova, L.; Lafferty, N.; Cropanese, F.; Estroff, A. Hyper NA water immersion lithography at 193 nm and 248 nm J. Vac. Sci. .Technol. B: Microelectronics and Nanometer Structures 22(6), 3439-3443, 2004. (2004) Smith, B. W.; Bourov, A.; Kang, H.; Cropanese, F. Zavyalova, L.; Water immersion optical lithography at 193 nm, J. Microlith, , Microfab and Microsys, 3(1), pp. 44-51, 2004. (2004) Smith, B. W.; Bourov, A.; Liu, Y Optimizing vacuum ultraviolet attenuated phase shift masking materials J. Vac. Sci.Technol. B: Microelectronics and Nanometer Structures , 20(6) 6, 2578-2582. 2002 (2002) Smith, B. W. Optical research for UV and VUV SRC Review, Madison, WI, July 2001. (2001) Smith, B. W. Resist processing Microlithography: Science and Technology, Ch. 9, J. Sheats and B.W. Smith, ed. , Marcel Dekker: New York, 1997. (1997) Smith, B. W. Multilayer resist technology Microlithography: Science and Technology, Ch. 10, J. Sheats and B.W. Smith, ed. , Marcel Dekker: New York, 1997. (1997) Smith, B. W. Optics for microlithography Microlithography: Science and Technology, Ch. 2, J. Sheats and B.W. Smith, ed. , Marcel Dekker: New York, 1997. (1997) Crivello, J. V.; Shim, S. Y.; Smith, B. W.; Deep UV Chemically Amplified Dissolution Inhibited Photoresists Chem. of Matls., Vol. 6, No. 11, 2167 (1994). (1994) Other Smith, B. W. Interferometric Immersion Nanopatterning DARPA NanoFab Workshop, Salt Lake City, UT, November 2006. (2006) Smith, B. W. Advanced Micro Devices v. Oki Electronics (2005-2006) Expert Witness, photoresist processing infringements and patent validity case. (2006) Fan, Y.; Lafferty, N.; Bouroy, A.;.Zavyalova, L.; Smith, B. W. Air bubble-induced light-scattering effect on image quality in 193 nm immersion lithography, Appl. Opt., Vol. 44 Issue 19 , 3904, 2005 (2005) Cropanese, F. C.; Bourov, A.; Fan, Y.; Zhou, J.; Zavyalova, L.; Smith, B. W. Synthetic defocus in interferometric lithography SPIE Optical Microlithography, vol. 5754, 2005 (2005) Lee, K.; Kunjappu, J.; Jockusch, S.; Turro, N. J.; Widerschpan, T.; Zhou, J.; Smith, B. W.; Zimmerman, P.; Conley, W. Amplification of the index of refraction of aqueous immersion fluids by ionic surfactants SPIE Advances in Resist Technology and Processing XXII, vol. 5373, 2005. (2005) Estroff, A.; Fan, Y.; Bourov, A.; Smith, B. W.; Foubert, P.; Leunissen, L. H.; Philipsen, V.; Aksenov, Y. Mask-induced polarization effects at high NA SPIE Optical Microlithography, vol. 5754, 2005. (2005) Zhou, J.; Fan, Y.; Bourov, A.; Lafferty, N.; Cropanese, F.; Zavyalova, L.; Estroff, A.;Smith, B. W. Immersion lithography fluids for high NA 193 nm lithography SPIE Optical Microlithography, vol. 5754, 2005. (2005) Smith, B. W. Principles of Microlithography 1995-2005 Intel University two-day course ” held in Chandler, AZ; Rio Rancho, NM; Santa Clara, CA; Hudson, MA; Leixlip, Ireland; Colorado Springs, CO (18 offerings total) (2005) Smith, B. W. Principles of Microlithgraphy 1995-2005 Industrial short course held at Chartered Semiconductor (Singapore), TI-Tech (Singapore), Sony (San Antonio, TX), Motorola (Phoenix, AZ and Austin, TX), Rockwell Semiconductor (Colorado Springs, CO and San Diego, CA), Analog Devices (Boston, MA), Acer Semiconductor (Taiwan), Micron Semiconductor (Boise, ID), Infineon Semiconductor (Richmond, VA), Sematech (Austin, TX) (2005) Smith, B. W. Amphibian Systems manufacturer of specialty micro-and nano-lithography equipment for semiconductor and nanotechnology applications, specializing in immersion lithography imaging systems and metrology, New York State S-corporation, 2005. (2005) Smith, B. W. Ultratech Stepper, Inc. v. ASM Lithography, Inc (2004-2005) Expert witness, scanning optical system patent infringement and invalidity case (2005) Smith, B. W. Immersion Optical Microlithography OSA Optical Fabrication and Testing , OMA2, Rochester, NY, Oct. 2004. (2004) Smith, B. W. 193nm - 248nm Immersion Lithography: Water and Beyond IMEC Lithography Review, Leuven, Belgium, June 2004. (2004) Smith, B. W. Hyper-NA Water Immersion Lithography at 193nm and 248nm EIPBN 2004, San Diego, CA, May 2004 (2004) Smith, B. W. Water-based 193nm Immersion Lithography Sematech Immersion Lithography Workshop, Los Angeles, CA, January 2004. (2004) Smith, B. W. Water Immersion Lithography at Excimer Laser Wavelengths DARPA Microlithography Program Review, Las Vegas, NV, January 2004. (2004) Smith, B. W. Under Water: Immersion techniques carry 193-nm lithography beyond the 65-nm node OE Magazine, July 2004 (2004) Smith, B. W. SEMICON West July 2004 SEMICON West SC117-124 (2004) Smith, B. W. Forbidden Pitch or Duty-Free: Revealing the Causes of Across-Pitch Imaging Differences SPIE Optical Microlithography XV, Vol. 5040, 2003. (2003) Smith, B. W.; Kang, H.; Cropanese, F.; Fan, Y. Water Immersion Optical Lithography for the 45nm Node SPIE Optical Microlithography XV, Vol. 5040, 2003. (2003) Smith, B. W. Lithography at 134nm and 6.42eV (193nm Water Immersion Lithography) Sematech Immersion Workshop, Almaden, CA, December 2003. (2003) Smith, B. W. Water Immersion Optical Lithography at 193nm for sub-0.25 k1 Imaging, DARPA Microlithography Program Review, Santa Fe, NM, September 2003 (2003) Smith, B. W. Immersion Optical Lithography at 193nm Future Fab Intl., Volume 15, Bruce W. Smith, 2003. (2003) Smith, B. W. BACUS 2003-2004 BACUS (Sc117, SC124) (2003) Smith, B. W. : Ewbank, D. E. OPC and image optimization using localized frequency analysis SPIE Optical Microlithography XV, Vol. 4691, 2002 (2002) Smith, B. W.; Cashmore, J.; Gover, M. Challenges in High NA, Polarization, and Photoresists SPIE Optical Microlithography XV, Vol. 4691, 2002. (2002) Smith, B. W.; Chen, J. F. OPC and Image Optimization Using Localized Frequency Analysis SPIE Optical Microlithography XV, Vol. 4691, 2002. (2002) Smith, B. W.; Vandenbergh, G. Image Enhancement Through Square Illumination Shaping SPIE Optical Microlithography XV, Vol. 4691, 2002. (2002) Smith, B. W. Mutually Optimizing resolution enhancement techniques J. Microlit., Microfab., Microsys., 1 (2), 7 (2002). (2002) Smith, B. W. Extreme NA Lithography at 0.8 to 1.4 IMEC Lithography Review, Leuven, Belgium, June 2002. (2002) Smith, B. W. Optical research for UV and VUV SRC Review, Austin, TX, July 2002.. (2002) Smith, B. W. Expert consultant (1997-2002) Expert consultant, IBM Fishkill, NY and Essex, VT, including Union Carbide Corp., Eastman Kodak, J. T. Baker Chemical, KTI, Shipley, Ashland Oil, E. I. DuPont de Nemours and Industri-Chem, suppliers of solvents for the IBM cleanroom operations (multi-state litigation) (2002) Smith, B. W. Expert Witness and Consultant (1997-2002) Expert Witness and Consultant, San Jose IBM Workers Litigation involving allegations regarding various chemicals used in an IBM manufacturing facility in San Jose, California (2002) Smith, B. W. Spatial filtering effects of the attenuated PSM and assist bar OPC SPIE Lithography for Semiconductor Manufacturing II, Vol. 4404, 2001. (2001) Smith, B. W.; Kang, H. Optical lithography at a 126nm wavelength SPIE Optical Microlithography XIV, Vol. 4343, 2001. (2001) Smith, B. W. Mutually Optimizing resolution enhancement techniques SPIE Optical Microlithography XIV, Vol. 4343, 2001 (2001) Smith, B. W.; McCallum, M. A study of obscuration in catadioptric lenses SPIE Optical Microlithography XIV, Vol. 4343, 2001 (2001) Smith, B. W. 157nm Aberration Parameter Modeling Using Phase Ring Structures 157nm Technical Data Review, Orlando, FL, December 2001. (2001) Smith, B. W. Optical Lithography Challenges for Sub-100nm Imaging IBM Semiconductor Division, East Fishkill, October 2001. (2001) Smith, B. W. OPC and RET with Gray Bars for the100nm Technology Node IMEC Lithography Review, Leuven, Belgium, June 2001. (2001) Smith, B. W. Customizing Illumination and Square Pupil Shapes IMEC Lithography Review, Leuven, Belgium, June 2001. (2001) Smith, B. W. Optics in Microlithography University of Leuven Engineering Talent Night, Leuven, Belgium, November 2001. (2001) Schlief, R.; Smith, B. W. Investigation of the interplay between illumination, mask patterning, and aberrations from the lens perspective, SPIE Optical Microlithography XIV, Vol. 4343, 2001. (2000) Smith, B. W.; Kang, H. Frequency filtering in alternative pupil planes J. Vac. Soc. B 2000. (2000) Venkataraman, P.; Smith, B. W. Aberration of steppers using phase shifting point diffraction interferometry SPIE Optical Microlithography XIII, Vol. 4000, 2000 (2000) Cangemi, M.; Lassiter, M.; Bourov, A.; Smith, B. W. Properties and potential of VUV lithographic thin film materials SPIE Optical Microlithography XIII, Vol. 4000, 2000 (2000) Smith, B. W.; Kang, H. Spatial frequency filtering in the pellicle plane SPIE Optical Microlithography XIII, Vol. 4000, 252, 2000. (2000) Smith, B. W. Understanding lens aberration and influences to lithographic imaging SPIE Optical Microlithography XIII, Vol. 4000, 2000. (2000) Kang, H.; Smith, B. W. Fabrication of small contacts using practical pupil filtering SPIE Optical Microlithography XIII, Vol. 4000, 2000. (2000) Smith, B. W. Impact of Aberrations of Optical Extension OE Lens Code Sematech OE Workshop, Burlington, VT, June 2000 (2000) Smith, B. W. Tolerancing of aberrations for resolution enhancement technology: Issues involed in optimizing Sematech OE Workshop, Austin, TX, January 2000. (2000) Smith, B. W. Pupil Plane Filtering Near Mask and Image Planes IEEE Lithography Workshop St. John, USVI , December 2000. (2000) Smith, B. W. Optical research for UV and VUV SRC Review, Madison, WI, June 2000. (2000) Smith, B. W. Variations to the influence of lens aberration invoked with PSM and OAI Proc. SPIE Optical Microlithography XII, 1999 (1999) Smith, B. W.; Webb, J; Petersen, J. S.; Meute, J. Aberration evaluation and tolerancing of 193 nm lithographic objective lenses SPIE Optical Microlithography XI, v3334, 1998. (1998) Smith, B. W. Optical extension technology MaskTools OE Workshops, Taiwan , February, 1999, Semicon West 1999, San Jose 1998. (1998) Smith, B. W. Lithographic Technology Corporation consulting and technology development for integrated Circuit Microlithography applications, New York State S-corporation, 1998. (1998) Reichmanis, E.; Nalamasu, O.; Wallow, T. I.; Cirelli, R.; Dabbagh, G.; Hutton, R. S.; Novembre, A. E.; Smith, B. W. Resist design concepts for 193nm lithography: Opportunities for innovation and invention J. Vac. Soc. Am. B, 15 (6), 2528, 1997. (1997) Smith, B. W.; Zavyalova, L.; Bourov, A.; Butt, S.; Fonesca, C. Investigation into excimer laser radiation damage of DUV optical phase masking films J. Vac. Soc. Am. B, 15 (6), 2444, 1997. (1997) Smith, B. W.; Fonesca, C.; Zavyalova, L.; Alam, L. Z.; Bourov, A. Plasma reactive ion etching of 193nm attenuated phase shift mask materials, J. Vac. Soc. Am. B, 15 (6), 2259, 1997. (1997) Smith, B.W.; Alam., Z.;Butt, S.;Kurinec, S.;Lane, R.; Arthur, G. Development and characterization of nitride and oxide based composite materials for sub-0.18mm attenuated phase shift masking Microelectronic Engineering 35, 201, 1997. (1997) Smith, B. W. Strategies toward sub-0.25 micron lithography B. Smith, Optics and Photonics News 8, 3, 23 (1997). (1997) Smith, B. W.; Butt,S.; Alam, Z. Attenuated phase shift mask materials for 248 and 193 nm lithography Microlithography World, 6(2), 7 1997. (1997) Smith, B. W.; Butt, S.; Alam. Z.; Kurinec, S.;Lane, R. Attenuated phase shift mask materials for 248 and 193 nm lithography J. Vac. Soc. Am. B, 14 (6), 1996. (1996) Rizvi, N.; Grover, M.; Ashworth, D.; Smith, B.' Rumbsy, P.; Goodalll, F.; Lawes, R. 193nm imaging using a small-field high-resoultion resist exposure tool, SPIE 2726, 1996 (1996) Smith, B. W. Sub-0.25 micron optical lithography technology, SEMICON, Korea, 1996. (1996) Smith, B. W.; Butt, S. A.; Novembre, A. E.; Mixon, D. A. Design and Characterization of Poly(trimethylsilylmethyl methacrylate-co-chloromethyl styrene) for 193 nm exposure SPIE Advances in Resist Technology and Processing XII, 2438, (1995). (1995) Turgur, S.; Smith, B. W. Direct Measurement of Optical Constants of Metals from a KrF Excimer using Polarization Methods SPIE Integrated Circuit Metrology, Inspection, and Process Control IX, 2439, (1995). (1995) Goldman, M.; Alexander, D.; Chowdhury, S. D.; Drennan, P. G.; Karklin, L.; Smith, B. W. Photolithography Process Characterization and 3D Modeling using DRM Data SPIE Advances in Resist Technology and Processing XII, 2438, (1995). (1995) Smith, B. W. Semiconductor Microlithography for sub 0.25-micron Rutherford Appleton Laboratories (RAL), Oxford, UK, 1995. (1995) Smith, B. W. Phase-shift Mask Issues for 193 nm Lithography SPIE Optical/Laser Microlithography V, 2194, (1994). (1994) Smith, B. W.; Eakin, T. D. Characterization of Safe Solvent PMMA Resist Variables for Electron Beam Lithography SPIE E-Beam, X-Ray, and I-Beam Submicron Lithography, 2195, (1994). (1994) Zhang, G.; Smith, B. W. Optimization of a Liquid Phase Silylation Process for 248 nm Lithography using EL IR Photoresists SPIE Advances in Resist Technology and Processing, 2195, (1994). (1994) Crow, R. T.; Iravani, M. V.; Smith, B. W. Near-field Optical Microscopy Characterization of ICs SPIE IC Metrology, Inspection, and Process Control, 2196, (1994). (1994) Drennan, P.; Smith, B. W. Technique for the Measurement of the In-Situ Development Rate of DNQ/Novalac Resists SPIE IC Metrology, Inspection, and Process Control, 2196, (1994). (1994) Drennan, P.; Smith, B. W. Extraction of Process Specific Photolithography Model Parameters SPIE IC Metrology, Inspection, and Process Control, 2196, (1994). (1994) Smith, B. W.; Grover, M. A 193 nm Deep-UV Lithography System using a Line-narrowed ArF Excimer Laser, SPIE Optical/Laser Microlithography VI, 1927, (1993). (1993) Smith, B. W.; Flagello, D. Comparison of Scalar and Vector Diffraction Theory for Deep-UV Lithography SPIE Optical/Laser Microlithography VI, 1927, (1993). (1993) Smith, B. W.; Crow, R. T. Characterization of Atomic Force Microscopy and Electrical Probing Techniques for IC Metrology SPIE Integrated Circuit Metrology, Inspection, and Process Control, 1926, (1993). (1993) Holscher, R.; Smith, B. W. Response Surface Modelling of Phase-Shift Mask Process Simulation SPIE Advances in Resist Technology IX, (1993) (1993) Connors, J. E.; Kos, T. M.; Pack, R. C.; Smith, B. W. Advanced lithography simulation tools for development and analysis of wide-field high NA projection optical systems SPIE Optical/Laser Microlithography VI, 1927, (1993). (1993) Smith, B. W.; Shaio, W. M. Response Surface Modelling Utilizing Lithographic Process Simulation SPIE Integrated Circuit Metrology and Process Control IV, 1673, (1992). (1992) Seminar Abstracts Smith, B. W. Pushing the Limits: Optical Enhancement, Polarization, and Immersion Lithography 2004-2005 SPIE (2004) Smith, B. W. Advancing the Limits of Optical Lithography 2000-2003 SPIE (2000) Smith, B. W. The Fundamental Limits of Optical Lithography 2000-2005 SPIE (2000) Smith, B. W.; Butt, S.; Alam. Z. Optical films for attenuated phase shift mask application at 193nm IEEE Lithography Workshop, conference abstracts, Maui, 1996. (1996) Smith, B. W.; Butt, S.; Alam. Z. Optical films for attenuated phase shift mask application at 193nm IEEE Lithography Workshop, conference abstracts, Maui, 1996. (1996) Smith, B. W.; Stem, D.; Alam, Z.; Butt, S. Optical properties and optimization of SixNy as an anti-reflective layer for 193 nm photolithograph Second Intl. Symp. on 193nm Lithography (conference abstracts), 1996. (1996) Smith, B. W.; Butt, S.; Alam. Z.; Crow, R.; Turgut, S. Attenuated Phase-Shift Masks for 193nm First Intl. Symp. on 193nm Lithography (conference abstracts), 1995. (1995) Smith, B. W.; Ramamoorthi, S The Impact of Optical Aberrations and Flare on High NA 193nm Lithography: Resist Requirements for DOF First Intl. Symp. on 193nm Lithography (conference abstracts), 1995. (1995) Conference Presentation (No Proceedings) Smith, B. W. Nanolithography and the Future of the IC Western NY Meeting of the Optical Society of America, Rochester, NY, November 2006. (2006) Smith, B. W. Metrology for EUV Projection Optics Albany Nanotech Workshop on EUV Optics, Albany, NY, June 2006. (2006) Smith, B. W. Solid Immersion and Evanescent Wave Lithography at Numerical Apertures > 1.60, Sematech Immersion Symposium, Kyoto, Japan, Oct. 2006. (2006) Smith, B. W. Research Activities in Immersion Interferometric Lithography Sematech Immersion Symposium, Kyoto, Japan, Oct. 2006. (2006) Smith, B. W. High NA and Polarization Considerations with Immersion Lithography ARCH Interface 2004 Microlithography Symposium, Phoenix, AZ, September 2004 (2004) Smith, B. W. Pushing the limits of optical lithography Optical Fabrication & Testing 2004, OSA Annual Meeting, Rochester, NY, October 2004 (2004) Smith, B. W. Optical Lithography at the Limits of Diffraction Optical Society of America, Rochester Section, October 2003. (2003) Smith, B. W. Optical microlithography: will the party ever end? OSA Rochester New York Section, Rochester, NY, November 2003. (2003) Smith, B. W. Extreme-NA Water Immersion Lithography for 35-65 nm Technology Third International Symposium on 157nm Lithography, Antwerp, Belgium, September 2002. (2002) Smith, B. W. Optimizing VUV Attenuated Phase Shift masking Materials 46th International Conference EIPBN, Anaheim, CA May 2002. (2002) Smith, B. W. Challenges in Microlithography for Sub-100 nm Device Patterning, 25th Annual EDS/CAS Conference, Rochester, NY, November 2001. (2001) Smith, B. W. Federal and State Research Funding Opportunities in Engineering Government Relations Committee Meeting, Rochester Institute of Technology, November, 2001. (2001) Smith, B. W. Spatial Filtering Effects of the Attenuated PSM and Assist Bar OPC SPIE Symposium on Microelectronic and MEMS Technology, Edinburgh, Scotland June, 2001 (2001) Smith, B. W. Lithographic Challenges for 130nm Devices IEEE Computer and Electron Device Society Maine Chapter, May , 2000. (2000) French, R. H.; Carcia, P. F.; Sharp, K. G.; Meht, J. S.; Smith, B. W.; Cannon, R. M. New Materials Families for 193 nm and DUV Attenuating Embedded Phase Shifter Photomasks Annual Meeting, American Ceramic Society, Cincinnati, OH, May 1997. (1997) Smith, B. W. Optical enhancement techniques for 193-nm lithography: modified illumination and attenuated phase-shift masking, ISMA’97, Singapore, June 1997. (1997)
