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Last Updated ( Monday, 29 January 2007 )
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PublicationsGennett, T., Landi, B. J., Elich, J. M., Jones, K. M., Alleman, J. L., Lamarre, P., Morris, R. S., Raffaelle, R. P., Heben, M. J Fuel Cell Applications of Nanotube-Metal Supported Catalysts Materials Research Society Symposium Proceedings, Boston, MA, Vol. 756, FF5.8.1. (2202)Wang, W.; J. P. McCarney, K. A. Hughes, K. J. Trotter, R. A. Stapleton, J. R. Chabot, E. J. Siochi, M. Kotlarchyk, M. L. Illingsworth Pendent Polyimides Using Mellitic Acid Dianhydride. III. The Effect of Pendent Group Functionality on Polymer Properties (submitted to Journal of Polymer Chemistry, April) (2008)Chen, S.H.; Kotlarchyk, M. Interactions of Photons and Neutrons with Matter World Scientific Publishing, Singapore (2007)Fagan, J. A., Simpson, J. R.., Landi, B. J., Richter, L. J., Mandelbaum, I., Bajpai, V., Ho, D. L., Raffaelle, R., Walker, A. R. Hight, Bauer, B. J., Hobbie, E. K. Dielectric Response of Aligned Semiconducting Single-Wall Nanotubes Physical Review Letters, 98, 14, pp. 147402/1-147402/4. (2007)DiLeo, R. A., Landi, B. J., Raffaelle, R. P. Purity Assessment of Multiwalled Carbon Nanotubes by Raman Spectroscopy Journal of Applied Physics, 101, 6, pp. 064307/1-064307/5. (2007)Landi, B. J., Raffaelle, R. P. Effects of Carrier Gas Dynamics on Single Wall Carbon Nanotube Chiral Distributions During Laser Vaporization Synthesis Journal of Nanoscience and Nanotechnology, 7, 3, pp. 883-890. (2007)Hubbard, S. M., Raffaelle, R., Robinson, R., Bailey, C., Wilt, D., Wolford, D., Maurer, W., Bailey, S. Growth and Characterization of InAs Quantum Dot Enhanced Photovoltaic Devices Mater. Res. Soc. Symp. Proc., 1017E, DD13-11. (2007)Zambrano,E.; Kotlarchyk, M; A. Langner; A. Faraone Isomeric and Concentration Effects of C4-Cosurfactants on Four-Component Microemulsions Investigated by Neutron Spin-Echo and Small-Angle Scattering J. Phys.: Condens. Matter 18, S2451 (2006)Smith, T. W.; M. Ayubali, M. Kotlarchyk, and A. Langner Synthesis of KDP Nanocrystals in Micellar Solutions of Block Copolymers of Poly(styrene) and Poly(oxyethylene) Polymer Preprints 47 464 (2006)Smith, B. W.; Fan, Y.; Zhou, J.; Lafferty, N.; Estroff, A. Evanescent wave imaging in optical lithography Proc. SPIE Optical Microlithography XIX, 6154, 2006. (2006)Fan, Y.; Bouroy, A.; Slocum, M.; Smith, B. W. Effects of beam pointing instability on two-beam interferometric lithography Proc. SPIE Optical Microlithography XIX, 6154, 2006 (2006)Bourov, A.; Robertson, S. A.; Smith, B. W.; Slocum, M. A.; Piscani, E. C. Resist process window characterization for the 45-nm node using an interferometric immersion microstepper Proc. SPIE Advances in Resist Technology and Processing XXIII, 6153, 2006. (2006)Robertson, S. A,; Leonard, J. M.; Smith, B. W.; Bourov, A. Comparison of immersion lithography from projection and interferometric exposure tools Proc. Optical Microlithography XIX, 6154, 2006 (2006)Zhou, J.; Fan, Y.; Smith, B. W. Three-dimensional imaging of 30-nm nanospheres using immersion interferometric lithography Proc. Optical Microlithography XIX, 6154, 2006. (2006)Bourov, A.; Robertson, S. A.; Smith, B. W.; Slocum, M. A.; Piscani, E. C. Experimental measurement of photoresist modulation curves Proc. Optical Microlithography XIX, 6154, 2006. (2006)Zavyalova, L. V.; Smith, B. W,; Bourov, A.; Zhang, G.; Vellanki, V.; Reynolds, P.; Flagello, D. G. Practical approach to full-field wavefront aberration measurement using phase wheel targets Proc. Optical Microlithography XIX, 6154, 2006. (2006)J. Zhou, Y. Fan, A. Bourov, B.W. Smith High NA 193nm Immersion Lithography for 32nm Half-Pitch Imaging’ Appl. Opt., 2006 (2006)Smith, B. W. Principles of Optical Nanolithography CRC Press (Taylor and Francis), 2006. (2006)Smith, B. W. Nanolithography and the Future of the IC Western NY Meeting of the Optical Society of America, Rochester, NY, November 2006. (2006)Smith, B. W. Metrology for EUV Projection Optics Albany Nanotech Workshop on EUV Optics, Albany, NY, June 2006. (2006)Smith, B. W. Solid Immersion and Evanescent Wave Lithography at Numerical Apertures > 1.60, Sematech Immersion Symposium, Kyoto, Japan, Oct. 2006. (2006)Smith, B. W. Research Activities in Immersion Interferometric Lithography Sematech Immersion Symposium, Kyoto, Japan, Oct. 2006. (2006)Smith, B. W. Interferometric Immersion Nanopatterning DARPA NanoFab Workshop, Salt Lake City, UT, November 2006. (2006)Smith, B. W. Advanced Micro Devices v. Oki Electronics (2005-2006) Expert Witness, photoresist processing infringements and patent validity case. (2006)Hailstone, R. Rochester Center for Biomedical Ultrasound Member (2006)Helguera, M Rotational Transform Assisted Correlation Filtering for Feature Extraction in Medical Imaging Applications Course material developed for Derek Walvoord, 1st and 2nd quarters (2006)Fagan J. A., Landi B. J., Mandelbaum I., Simpson J. R., Bajpai V., Bauer B. J., Migler K., Walker A. R. Hight, Raffaelle R., Hobbie E. K. Comparative Measures of Single-Wall Carbon Nanotube Dispersio The Journal of Physical Chemistry B, 110, 47, pp. 23801-23805. (2006)Cress, C. D., Landi, B. J., Raffaelle, R. P., Wilt, D. M. InGaP Alpha Voltaic Batteries: Synthesis, Modeling, and Radiation Tolerance Journal of Applied Physics, 100, 11, pp. 114519/1-114519/5. (2006)Fagan, J. A., Landi, B. J., Mandelbaum, I., Simpson, J. R., Bajpai, V., Bauer, B. J., Migler, K., Walker, A. R. Hight, Raffaelle, R., Hobbie, E. K. Comparative Measures of Single-Wall Carbon Nanotube Dispersion Journal of Physical Chemistry B, 110, 47, pp. 23801-23805. (2006)Landi, B. J., Evans, C. M., Worman, J. J., Castro, S. L., Bailey, S. G., Raffaelle, R. P. Noncovalent Attachment of CdSe Quantum Dots to Single Wall Carbon Nanotubes Materials Letters, 60, 29-30, pp. 3502-3506. (2006)Raffaelle, R. P., Cress, C. D., Wilt, D. M., Bailey, S. G. Degradation of Nanomaterials Materials Research Society Symposium Proceedings, 887, pp. 147-157. (2006)Parekh, B., Debies, T., Evans, C. M., Landi, B. J., Raffaelle, R. P., Takacs, G. A. Photo-Oxidation of Single-Walled Carbon Nanotubes Materials Research Society Symposium Proceedings, 887, pp. 3-8. (2006)Hubbard, S. M., Wilt, D., Bailey, S., Byrnes, D., Raffaelle, R. OMVPE Grown InAs Quantum Dots for Application in Nanostructured Photovoltaics Proc. of the IEEE World Conference on Photovoltaic Energy Conversion, 1, 118-121. (2006)B. W. Smith, Y. Fan, M. Slocum, L. Zavyalova 25nm Immersion Lithography at a 193nm Wavelength Proc. SPIE Optical Microlithography, vol. 5754, 2005. (2005)B. W. Smith, A. Bourov, Y. Fan, F. Cropanese, Amphibian XIS: An Immersion Lithography Microstepper Platform Proc. SPIE Optical Microlithography, vol. 5754, 2005. (2005)Y. Fan, A. Bourov, L. Zavyalova, J. Zhou, A. Estroff, N. Lafferty, B.W. Smith, ILSim - A compact simulation tool for interferometric lithography Proc. SPIE Optical Microlithography, vol. 5754, 2005. (2005)Fan, Y.; Lafferty, N.; Bouroy, A.;.Zavyalova, L.; Smith, B. W. Air bubble-induced light-scattering effect on image quality in 193 nm immersion lithography, Appl. Opt., Vol. 44 Issue 19 , 3904, 2005 (2005)Bourov A, Fan Y, Cropanese F. C., Smith B. W. Photoresist Modulation Curves Proc. SPIE Optical Microlithography, vol. 5754, 2005 (2005)L. Zavyalova, A. Bourov, B.W. Smith Automated Aberration Extraction using Phase Wheel Targets Proc. SPIE Optical Microlithography, vol. 5754, 2005. (2005)Cropanese, F. C.; Bourov, A.; Fan, Y.; Zhou, J.; Zavyalova, L.; Smith, B. W. Synthetic defocus in interferometric lithography SPIE Optical Microlithography, vol. 5754, 2005 (2005)Lee, K.; Kunjappu, J.; Jockusch, S.; Turro, N. J.; Widerschpan, T.; Zhou, J.; Smith, B. W.; Zimmerman, P.; Conley, W. Amplification of the index of refraction of aqueous immersion fluids by ionic surfactants SPIE Advances in Resist Technology and Processing XXII, vol. 5373, 2005. (2005)Estroff, A.; Fan, Y.; Bourov, A.; Smith, B. W.; Foubert, P.; Leunissen, L. H.; Philipsen, V.; Aksenov, Y. Mask-induced polarization effects at high NA SPIE Optical Microlithography, vol. 5754, 2005. (2005)Zhou, J.; Fan, Y.; Bourov, A.; Lafferty, N.; Cropanese, F.; Zavyalova, L.; Estroff, A.;Smith, B. W. Immersion lithography fluids for high NA 193 nm lithography SPIE Optical Microlithography, vol. 5754, 2005. (2005)Estroff, A.; Fan, Y.; Bourov, A.; Smith, B. W.; Foubert, P.; Leunissen, L. H.; Aksenov, Y. Mask Induced Polarization Effects at High NA Proc. SPIE 5754, 2005. (2005)Smith, B. W. The Fundamental Limits of Optical Lithography Shortcourse Workbook 2000-2005 (2005)Smith, B. W. Advancing the Limits of Optical Lithography Shortcourse Workbook 2000-2005 (2005)Smith, B. W. Principles of Microlithography Shortcourse Workbook 1995-2005 (2005)Smith, B. W. Polarization, Immersion, and Optical Enhancement Technology Shortcourse Workbook 2003-2005 (2005)Smith, B. W. Principles of Microlithography 1995-2005 Intel University two-day course ” held in Chandler, AZ; Rio Rancho, NM; Santa Clara, CA; Hudson, MA; Leixlip, Ireland; Colorado Springs, CO (18 offerings total) (2005)Smith, B. W. Principles of Microlithgraphy 1995-2005 Industrial short course held at Chartered Semiconductor (Singapore), TI-Tech (Singapore), Sony (San Antonio, TX), Motorola (Phoenix, AZ and Austin, TX), Rockwell Semiconductor (Colorado Springs, CO and San Diego, CA), Analog Devices (Boston, MA), Acer Semiconductor (Taiwan), Micron Semiconductor (Boise, ID), Infineon Semiconductor (Richmond, VA), Sematech (Austin, TX) (2005)Smith, B. W. Amphibian Systems manufacturer of specialty micro-and nano-lithography equipment for semiconductor and nanotechnology applications, specializing in immersion lithography imaging systems and metrology, New York State S-corporation, 2005. (2005)Smith, B. W. Ultratech Stepper, Inc. v. ASM Lithography, Inc (2004-2005) Expert witness, scanning optical system patent infringement and invalidity case (2005)Atkinson, J. W. Collett J. L., Marconi, A. Axon, D. J. Alonso-Herrero A., Batcheldor, D. Binney, J. J. Capetti, A. Carollo, C. Dressel, M. L. Ford, H. Gerssen J., , Hughes M. A., Macchetto, D. Maciejewski , W. Merrifield, M. . Scarlata C, Sparks W., Supermassive black hole mass estimates for NGC 1300 and NGC 2748 based on HST emission-line gas kinematics Mon. Not. R. astr. Soc, 359,504 (2005)Raffaelle, R., Junek, W., Gorse, J., Thompson, T., Harris, J., Hehemann, D., Hepp, A., Rybicki, G. Chemically Deposited Thin-Film Solar Cell Materials 16th Space Photovoltaic Research and Technology Conference, pp. 158-163, (1999). NASA Conference Publication (2005)Schnabel, C. M., Tabib-Azar, M., Raffaelle, R. P., Su, H. B., Dudley, M., Neudeck, P. G., Bailey, S. Electrical Characterization of Defects in SiC Schottky Barriers 16th Space Photovoltaic Research and Technology Conference, pp. 183-188, (1999). NASA Conference Publication (2005)Hepp, A. F.; Banger, K. K.; Raffaelle, R. P.; Editors Thin Films and Nanomaterials for Energy Conversion and Storage Mater. Sci. Eng., B, 116, 3, pp. 231-417 (2005)Landi, B.J., Raffaelle, R. P., Heben, M.J., Alleman, J.L., Van Derveer, W., and Gennett, T. Development and Characterization of Single Wall Carbon Nanotube-Nafion Composite Actuators Mater. Sci. Eng. B., 116, pp. 359-362. (2005)Landi, B. J., Raffaelle, R. P., Castro, S. L., Bailey, S. G. Single Wall Carbon Nanotube-Polymer Solar Cells Prog. in Photovolt 13, pp. 1-8. (2005)Raffaelle, R. P., Landi, B.J., Harris, J.D., Bailey, S.G., Hepp, A.F. Carbon Nanotubes for Power Applications Mater. Sci. Eng. B. 116, pp. 233-243. (2005)Harris, J.D., Raffaelle, R. P., Gennett, T, Landi, B.J., Hepp, A.F. Growth of Multi-Walled Carbon Nanotubes by Injection CVD Using Cyclopentadienyliron Dicarbonyl Dimer and Cyclooctatetraene Iron Tricarbonyl, Mater. Sci. Eng. B. 116, pp. 369-374. (2005)Landi, B. J., Castro, S. L., Ruf, H. J., Evans, C. M., Bailey, S. G., Raffaelle, R. P. CdSe Quantum Dot-Single Wall Carbon Nanotube Complexes for Polymeric Solar Cells Sol. Energy Mater. Sol. Cells. 87, pp. 733-746. (2005)Landi, B. J., Ruf, H. J., Evans, C. M., Cress, C. D., Raffaelle, R. P. Purity Assessment of Single Wall Carbon Nanotubes, Using Optical Absorption Spectroscopy J. Phys. Chem. B. 109, 9952-9965. (2005)Neupane, P. P., Manasreh, M. O., Weaver, B. D., Landi, B. J., Raffaelle, R. P. Proton Irradiation Effect on Single-Wall Carbon Nanotubes in a Poly(3-octylthiophene) Matrix Appl. Phys. Lett,. 86, p. 221908. (2005)Landi, B. J., Cress, C. D., Evans, C. M., Raffaelle, R. P. Thermal Oxidation Profiling of Single-Walled Carbon Nanotubes Chemistry of Materials, 17, 26, pp. 6819-6834. (2005)Landi, B. J., Raffaelle, R. P., Castro, S. L., Bailey, S. G. Single-Wall Carbon Nanotube-Polymer Solar Cells Progress in Photovoltaics, 13, 2 pp. 165-172. (2005)Landi, B. J., Castro, S. L., Evans, C. M., Ruf, H. J., Bailey, S. G., Raffaelle, R. P. Quantum Dot-Single Wall Carbon Nanotube Complexes for Polymeric Photovoltaics Materials Research Society Symposium Proceedings, 836, pp. 55-60. (2005)Huang, S., Efstathiadis, H., Haldar, P., Lee, H., Landi, B., Raffaelle, R. P. Fabrication of Nanorod Arrays for Organic Solar Cell Applications Materials Research Society Symposium Proceedings, 836, pp. 49-53. (2005)Raffaelle, R. P., Sinharoy, S., King, C. W., Bailey, S. G. InAs Quantum Dot Development for Enhanced InGaAs Space Solar Cells Materials Research Society Symposium Proceedings, 851, pp. 195-203. (2005)Hailstone, R. K; French, J; De Keyzer, R Latent-Image Formation in AgBr Tabular Grain Emulsions: Experimental Studies The Imaging Science Journal 52 151 (2004)Hailstone, R. K; De Keyzer, R Latent-Image Formation in AgBr Tabular Grain Emulsions: Computer Simulation Studies The Imaging Science Journal 52, 164 (2004)Hailstone, R. K; DiFrancesco, A. G; Tyne, M; De Keyzer, R Sulphide Centers on AgIBr (100) Sur¬faces: Effect of Tetraazaindene on Electronic Properties The Imaging Science Journal 52, 27 (2004)Tan, J; Hailstone, R. K Gold-Sulfide vs Sulphide Centers on (111) AgIBr Surfaces: Characterization and Mechanism The Imaging Science Journal, in press (2004)Smith, B. W.; Fan, Y.; Zhou, J.; Bourov, A.; Zavyalova, L.; Lafferty, N.; Cropanese, F.; Estroff, A. Hyper NA water immersion lithography at 193 nm and 248 nm J. Vac. Sci. .Technol. B: Microelectronics and Nanometer Structures 22(6), 3439-3443, 2004. (2004)Smith, B. W.; Bourov, A.; Kang, H.; Cropanese, F. Zavyalova, L.; Water immersion optical lithography at 193 nm, J. Microlith, , Microfab and Microsys, 3(1), pp. 44-51, 2004. (2004)Smith, B. W.; Bourov, A; Fan, Y.; Zavyalova, L.; Lafferty, N.; Cropanese, F. Approaching the numerical aperture of water - immersion lithography at 193nm Proc. SPIE 5377, 2004 (2004)Fan, Y.; Lafferty, N.; Bouroy, A.;.Zavyalova, L.; Smith, B. W. Study of Air Bubble Induced Light Scattering Effect On Image Quality in 193 nm Immersion Lithography Proc. SPIE 5377, 2004. (2004)Bourov, A; Fan, Y,; Cropanese, F.; Lafferty, N.; Zavyalova, L.; Kang, H.; Smith, B. W. Immersion microlithography at 193nm with a Talbot prism interferometer, Proc. SPIE 5377, 2004. (2004)Smith, B. W.; Zavyalova, L.; Estroff, A. Benefiting from polarization - effects of high-NA on imaging Proc. SPIE 5377, 2004 (2004)Estroff, A.; Fan, Y.; Cropanese, F.; Lafferty, N.; Zavyalova, L.; Smith, B. W. Mask induced polarization Proc. SPIE 5377, 2004. (2004)Zavyalova, L. V.; Smith, B. W,; Suganaga, T.; Matsuura, S.; Itani, T.; Cashmore, J. In-situ aberration monitoring using phase wheel targets Proc. Proc. SPIE 5377, 2004. (2004)Lafferty, N.; Vandenberghe, G.; Smith, B. W.; Lassiter, M.; Martin, P. Gray assist bar OPC, Proc. SPIE 5377, 2004 (2004)Cropanese, F. C.; Bourov, A.; Fan, Y.;Estroff, A.; Zavyalova, L.; Smith, B. W. Synthesis of projection lithography for low k1 via interferometry Proc. SPIE 5377, 2004. (2004)Smith, B. W. Immersion Optical Microlithography OSA Optical Fabrication and Testing , OMA2, Rochester, NY, Oct. 2004. (2004)Smith, B. W. 193nm - 248nm Immersion Lithography: Water and Beyond IMEC Lithography Review, Leuven, Belgium, June 2004. (2004)Smith, B. W. High NA and Polarization Considerations with Immersion Lithography ARCH Interface 2004 Microlithography Symposium, Phoenix, AZ, September 2004 (2004)Smith, B. W. Hyper-NA Water Immersion Lithography at 193nm and 248nm EIPBN 2004, San Diego, CA, May 2004 (2004)Smith, B. W. Water-based 193nm Immersion Lithography Sematech Immersion Lithography Workshop, Los Angeles, CA, January 2004. (2004)Smith, B. W. Water Immersion Lithography at Excimer Laser Wavelengths DARPA Microlithography Program Review, Las Vegas, NV, January 2004. (2004)Smith, B. W. Pushing the limits of optical lithography Optical Fabrication & Testing 2004, OSA Annual Meeting, Rochester, NY, October 2004 (2004)Smith, B. W. Under Water: Immersion techniques carry 193-nm lithography beyond the 65-nm node OE Magazine, July 2004 (2004)Smith, B. W. Pushing the Limits: Optical Enhancement, Polarization, and Immersion Lithography 2004-2005 SPIE (2004)Smith, B. W. SEMICON West July 2004 SEMICON West SC117-124 (2004)Bailey, S., Raffaelle, R. P., Landi, B., and Castro, S Nanotube/Quantum Dot-Polymer Solar Cells Proceedings of the 19th European PVSEC, 3, pp. 2137-2143 (2004)Morris, R. S., Dixon, B. G., Gennett, T., Raffaelle, R High-Energy, Rechargeable Li-Ion Battery Based on Carbon Nanotube Technology Proceedings of the 41st Power Sources Conference, Philadelphia, PA, pp. 389-392 (2004)Morris, R. S., Dixon, B. G., Gennett, T., Raffaelle, R., Heben, M. High-Energy, Rechargeable Li-Ion Battery Based on Carbon Nanotube Technology Journal of Power Sources, 138, 1-2, pp. 277-280, (2004)Castro, S., Bailey, S., Raffaelle, R. P., Banger, K., and Hepp, A. Synthesis and Characterization of Colloidal CuInS2 Nanoparticles from a Molecular Single-Source Precursor J. Phys. Chem. B, 108, pp. 12429-12435, (2004)Landi, B., Ruf, H., Raffaelle, R. P Purity Assessment of As-Produced Single Wall Carbon Nanotube Soot Carbon 2004, Providence, Rhode Island, July, (2004), Paper 33.5. (2004)Ruf, H. J., Landi, B. J., Raffaelle, R. P SWNT Enhanced PEM Fuel Cells American Society of Mechanical Engineers Fuel Cell 2004: Second International Conference on Fuel Cell Science, Engineering, and Technology, Rochester, NY, June, (2004), 2527. (2004)Evans, C., Landi, B., Raffaelle, R. P., Krainsky, I., Bailey, S., Landis, G Thermoelectric and Thermionic Emission Properties of Carbon Nanotubes, American Institute of Aeronautics and Astronautics: 2nd International Energy Conversion Engineering Conference, Providence, RI, August, 5589. (2004)Ruf, H., Landi, B., Raffaelle, R. P. SWNT Enhanced PEM Fuel Cell Membranes In American Institute of Aeronautics and Astronautics: 2nd International Energy Conversion Engineering Conference, Providence, RI, August, 5571. (2004)Landi, B., Ruf, H., Schauerman, C., Raffaelle, R. P., Harris, J., Hepp, A. Injection CVD Grown MWNTs for PEM Fuel Cells In American Institute of Aeronautics and Astronautics: 2nd International Energy Conversion Engineering Conference, Providence, RI, August, 5550. (2004)Castro, S., Raffaelle, R. P., Bailey, S., Landi, B. Colloidal CuInS2 Nanoparticles for Polymeric Solar Cells In American Institute of Aeronautics and Astronautics: 2nd International Energy Conversion Engineering Conference, Providence, RI, August, 5528. (2004)Landi, B. J., Ruf, H.J., Worman, J. J., Raffaelle, R. P. Effects of Alkyl Amide Solvents on the Dispersion of Single Wall Carbon Nanotubes J. Phys. Chem. B. 108, pp. 17089-17095 (2004)Landis, G. A., Jenkins, P., Scheiman,D. A., and Raffaelle, R. P. Extended Temperature Solar Cell Technology Development American Institute of Aeronautics and Astronautics: 2nd International Energy Conversion Engineering Conference, Providence, RI, August, 5571. (2004)Landi, B. J., Castro, S.L., Evans, C. M., Ruf, H. J., Bailey, S.G., Raffaelle, R. P. Quantum Dot-Single Wall Carbon Nanotube Complexes for Polymeric Photovoltaics Materials Research Society Symposium Proceedings, Boston, MA, Vol. L2.8. (2004)Huang, S., Efstathiadis, H., Haldar, P., Lee, H., Landi, B., Raffaelle, R. P. Investigation of Nanostructure-Polymer Blend Solar Cells American Institute of Aeronautics and Astronautics: 2nd International Energy Conversion Engineering Conference, Providence, RI, August, 5527 (2004)Hann, D.S. Specular Image Capture and Evaluation for Microgloss Uniformity Measurements. (2003)Pyrdsa, J.M. LIDAR Receiver Optical Design (2003)Helguera, M; Rao, N.A.H.K On the Role of Narrow Bandwidth Excitation and Resolution Cell Volume in the Study of Tissue Microstructure Analysis with Ultrasound Submitted to Physics in Medicine and Biology (2003). (2003)Zheng, J. P; DiFrancesco, A. G; Hailstone, R. K; Callant, P; De Keyzer, R Dye Desensitization Studies: AgBr Core-Shell vs AgBr-Core/AgIBr Shell Emulsions The Imaging Science Journal, 51, 47 (2003)Hailstone, R. K; French, J; De Keyzer, R Sulphide Centers on AgIBr (100) Surfaces: Characteriza¬tion and Energy Levels The Imaging Science Journal 51, 21 (2003)Hailstone, R. K; French, F; De Keyzer, R Selenide vs Sulphide Centers on AgIBr (100) Surfaces: Characterization and Energy Levels The Imaging Science Journal 51, 33. (2003)Hailstone, R. K; French, J; De Keyzer, R Sulphide Centers on (111) AgBr Surfaces: Energy Levels and Computer-Simulated Sensitometry The Imaging Science Journal 51, 125 (2003)Hailstone, R. K; French, J; Tan, J; De Keyzer, R Sulphide Centers on (111) AgBr Surfaces: Effect of Thiocyanate on Electronic Properties The Imaging Science Journal 51, 141. (2003)Smith, B. W. Forbidden Pitch or Duty-Free: Revealing the Causes of Across-Pitch Imaging Differences SPIE Optical Microlithography XV, Vol. 5040, 2003. (2003)Smith, B. W.; Kang, H.; Cropanese, F.; Fan, Y. Water Immersion Optical Lithography for the 45nm Node SPIE Optical Microlithography XV, Vol. 5040, 2003. (2003)Smith, B. W. Deep – Ultraviolet (DUV) Lithography Shortcourse Workbook 1997-2003 (2003)Smith, B. W. Optical Lithography at the Limits of Diffraction Optical Society of America, Rochester Section, October 2003. (2003)Smith, B. W. Lithography at 134nm and 6.42eV (193nm Water Immersion Lithography) Sematech Immersion Workshop, Almaden, CA, December 2003. (2003)Smith, B. W. Water Immersion Optical Lithography at 193nm for sub-0.25 k1 Imaging, DARPA Microlithography Program Review, Santa Fe, NM, September 2003 (2003)Smith, B. W. Optical microlithography: will the party ever end? OSA Rochester New York Section, Rochester, NY, November 2003. (2003)Smith, B. W. Immersion Optical Lithography at 193nm Future Fab Intl., Volume 15, Bruce W. Smith, 2003. (2003)Smith, B. W. BACUS 2003-2004 BACUS (Sc117, SC124) (2003)Harris, J.D., Hepp, A.F., Raffaelle, R. P., Gennett, T., Vander Wal, R., Landi, B.J., Luo, Y., Scherson, D.A. Growth and Characterization of Multi-Walled Carbon Nanotubes at NASA Glenn Research Center American Institute of Aeronautics and Astronautics: 1st International Energy Conversion Engineering Conference, Portsmouth, VA, August, 5953 (2003)Raffaelle, R. P., Gennett, T., Lau, J. E., Jenkins, P., Castro S. L., Tin, P., Wilt, D. M., Pal, A. M., and Bailey, S. G Scanning Tunneling Optical Resonance Microscopy (STORM) Mat. Res. Soc., 738, pp.135-141 (2003)Castro, S. L. , Bailey, S. G., Raffaelle, R. P., Banger, K. K., Hepp, A. F Nanocrystalline Chalcopyrite Materials (CuInS2 and CuInSe2) Via Low-Temperature Pyrolysis of Molecular Single-Source Precursors Chem. Mater., 15, 16, pp.3142-3147 (2003)Castro, S. L. , Bailey, S. G., Raffaelle, R. P., Banger, K. K., Hepp, A. F Quantum Dot Development for Space Photovoltaics Proceedings of the 1st International Energy Conversion Engineering Conference, pp. 233-236 (2003)Elich, J., Landi, B., Gennett, T., Raffaelle, R. P., Krainsky, I., Landis, G., Bailey, S Thermionic Properties of Single Wall Carbon Nanotubes Proceedings of the 1st International Energy Conversion Engineering Conference, pp. 233-236 (2003)Wilt, D., Hepp, A., Moran, M., Jenkins, P., Scheiman, D., Raffaelle, R Integrated Micro-Power System (IMPS) Development at NASA Glenn Research Center Proceedings - Electrochemical Society, pp. 194-202, (2003)Gennett, T., Landi, B. J., Elich, J. M., Jones, K. M., Alleman, J. L., Lamarre, P., Morris, R. S., Raffaelle, R. P., Heben, M. J Fuel Cell Applications of Nanotube-Metal Supported Catalysts Materials Research Society Symposium Proceedings, 756, 379-384, (2003)Bailey, S. G., Raffaelle, R. P., Lau, J. E., Jenkins, P., Castro, S. L. , Scheiman, D., Tin, P., Wilt, D. M. Scanning Tunneling Optical Resonance Spectroscopy Photonics Tech Briefs, 2a-6a, October (2003)Dai, J; DiFrancesco, A. G; Hailstone, R. K Electronic Properties of Chemically Produced Silver Clusters: Sensitometric Studies J. Imag. Sci. Technol., 46, 75. (2002)Tan, J; Hailstone, R. K Electronic Properties of Chemically Produced Silver Clusters: Photobleaching Studies J. Imag. Sci. Technol., 46, 81 (2002)Calcines, J; Dolan, H. M; Falkenstern, K. R; Kelly, C. D; Murphy, E.P; Klinger, R.; Kahn, B. E; DiFrancesco, A. G; Hailstone, R. K Silver Halide Recrystallization Kinetics for the Conversion of AgCl to AgClBr J. Imag. Sci. Technol., 46, 101. (2002)Zheng, J. P; DiFrancesco, A. G; Hailstone, R. K; Callant, P; De Keyzer, R Dye Desensitization Studies: AgBr Core-Shell Emulsions The Imaging Science Journal, 49, 63 (2002)Kotlarchyk, M. Electromagnetic Radiation and Interactions with Matter in Encyclopedia of Imaging Science and Technology, J. Hornak, ed., Wiley, New York (2002)Smith, B. W.; Bourov, A.; Liu, Y Optimizing vacuum ultraviolet attenuated phase shift masking materials J. Vac. Sci.Technol. B: Microelectronics and Nanometer Structures , 20(6) 6, 2578-2582. 2002 (2002)Smith, B. W. : Ewbank, D. E. OPC and image optimization using localized frequency analysis SPIE Optical Microlithography XV, Vol. 4691, 2002 (2002)Smith, B. W.; Cashmore, J.; Gover, M. Challenges in High NA, Polarization, and Photoresists SPIE Optical Microlithography XV, Vol. 4691, 2002. (2002)Smith, B. W.; Chen, J. F. OPC and Image Optimization Using Localized Frequency Analysis SPIE Optical Microlithography XV, Vol. 4691, 2002. (2002)Smith, B. W.; Vandenbergh, G. Image Enhancement Through Square Illumination Shaping SPIE Optical Microlithography XV, Vol. 4691, 2002. (2002)Smith, B. W. Mutually Optimizing resolution enhancement techniques J. Microlit., Microfab., Microsys., 1 (2), 7 (2002). (2002)Smith, B. W. Extreme-NA Water Immersion Lithography for 35-65 nm Technology Third International Symposium on 157nm Lithography, Antwerp, Belgium, September 2002. (2002)Smith, B. W. Optimizing VUV Attenuated Phase Shift masking Materials 46th International Conference EIPBN, Anaheim, CA May 2002. (2002)Smith, B. W. Extreme NA Lithography at 0.8 to 1.4 IMEC Lithography Review, Leuven, Belgium, June 2002. (2002)Smith, B. W. Optical research for UV and VUV SRC Review, Austin, TX, July 2002.. (2002)Smith, B. W. Expert consultant (1997-2002) Expert consultant, IBM Fishkill, NY and Essex, VT, including Union Carbide Corp., Eastman Kodak, J. T. Baker Chemical, KTI, Shipley, Ashland Oil, E. I. DuPont de Nemours and Industri-Chem, suppliers of solvents for the IBM cleanroom operations (multi-state litigation) (2002)Smith, B. W. Expert Witness and Consultant (1997-2002) Expert Witness and Consultant, San Jose IBM Workers Litigation involving allegations regarding various chemicals used in an IBM manufacturing facility in San Jose, California (2002)Raffaelle, R. P., Castro, S. L. , Hepp, A. F., and Bailey, S. G. Quantum Dot Solar Cells Progress in Photovoltiacs, 10, 1 (2002)Raffaelle, R. P., Gennett, T., Maranchi, J., Kumta, P., Hepp, A. F., Heben, M. J., Dillon, A. C., Jones, K. C. Carbon Nanotube Anodes For Lithium Ion Batteries Materials Research Society Symposium Proceedings, 706, pp. 343-349 (2002)Patterson, J. D., Blatt, J., Burns, J., Mantovani, J. G., and Raffaelle, R. P. A Model of Enhanced STM Current Due to Semiconductor Optical Absorption J. of Physics and Chemistry of Solids, 63, 257 (2002)Raffaelle, R. P., Hepp, A. F., Landis, G. A., Hoffman, D. J. Mission Applicability Assessment of Integrated Power Supplies and Components, Progress in Photovoltiacs, 10 (2002)Bailey, S., Hepp, A., Raffaelle, R. P. and Flood, D Advanced Thin Film Solar Arrays for Space - the Terrestrial Legacy Proceedings of the 12th International Photovoltaic Science and Engineering Conference, pp. 571-574, (2002). Solar Energy Materials and Solar Cells, 10 (2002)Bailey, S., Hepp, A., and Raffaelle, R. P Thin Film Photovoltaics for Space Applications Proceedings of the 36th Intersociety Energy Conversion Engineering Conference, pp. 235-238 (2002)Bailey, S., Raffaelle, R. P., and Emery, K. Space and Terrestrial Photovoltaics – Synergy and Diversity Progress in Photovoltaics, 10, 6, pp. 399-406 (2002)Raffaelle, R. P.; Castro, S. L.; Hepp, A. F.; Bailey, S. G. Quantum Dot Solar Cells Photovoltaic Research and Technology Conference, pp. 178-186, (2001). NASA Conference Publication (2002)Raffaelle, R. P., Hepp, A., Bailey, S., Landis, G Microelectronic Space Power Supplies Proceedings of the Sixth European Space Power Conference, pp. 153-157 (2002)Bailey, S., Harris, J., Hepp, A., E. Anglin, Raffaelle, R. P., Clark, H., Gardner, S., and Sun, S Thin-Film Organic-Based Solar Cells for Space Power, Proceedings of the 37th Intersociety Energy Conversion Engineering Conference, pp 233-236 (2002)Bailey, S., Landis, G., and Raffaelle, R. P The Next-Generation of Space Cells for Diverse Environments Proceedings of the Sixth European Space Power Conference, pp. 9-15 (2002)Landi, B. J., Raffaelle, R. P., Heben, M. J., Alleman, J. L., Van Derveer, W., Gennett, T Single Wall Carbon Nanotube-Nafion Composite Actuators Nano Letters, 2, 11 (2002)Godlewski, M. Image Resizing and Image Quality (2001)Hailstone, R. K; Zhao, T; DiFrancesco, A. G; Tyne, M Sulfide Centers on (111) AgBr Surfaces: Characterization. J. Imag. Sci. Technol., 45: 125. (2001)Hailstone, R. K; DeKeyzer, R The Effect of Trap Depth on Latent-Image Formation in an AgBr Tab¬ular Grain: A Computer Simulation Study J. Imag. Sci. Technol., 45: 338 (2001)Hailstone, R. K; De Keyzer, R A Computer Simulation Study of Silver-Gold Cluster Formation on AgBr Tabular Microcrystals with AgIBr Cores J. Phys. Chem. B., 105: 7533 (2001)Tan, J.; Dai, J; DiFrancesco, A. G; Hailstone, R. K Electronic Properties of Chemically Produced Sil¬ver Clusters: Grain Morphology Studies The Imaging Science Journal, 49, 179. (2001)Hailstone, R. K Electronic Properties of Chemically Produced Silver Clusters: Electron Trapping or Hole Removing? The Imaging Science Journal, 49, 189 (2001)Smith, B. W. Spatial filtering effects of the attenuated PSM and assist bar OPC SPIE Lithography for Semiconductor Manufacturing II, Vol. 4404, 2001. (2001)Smith, B. W.; Kang, H. Optical lithography at a 126nm wavelength SPIE Optical Microlithography XIV, Vol. 4343, 2001. (2001)Smith, B. W. Mutually Optimizing resolution enhancement techniques SPIE Optical Microlithography XIV, Vol. 4343, 2001 (2001)Smith, B. W.; McCallum, M. A study of obscuration in catadioptric lenses SPIE Optical Microlithography XIV, Vol. 4343, 2001 (2001)Smith, B. W. 157nm Aberration Parameter Modeling Using Phase Ring Structures 157nm Technical Data Review, Orlando, FL, December 2001. (2001)Smith, B. W. Challenges in Microlithography for Sub-100 nm Device Patterning, 25th Annual EDS/CAS Conference, Rochester, NY, November 2001. (2001)Smith, B. W. Optical Lithography Challenges for Sub-100nm Imaging IBM Semiconductor Division, East Fishkill, October 2001. (2001)Smith, B. W. Federal and State Research Funding Opportunities in Engineering Government Relations Committee Meeting, Rochester Institute of Technology, November, 2001. (2001)Smith, B. W. OPC and RET with Gray Bars for the100nm Technology Node IMEC Lithography Review, Leuven, Belgium, June 2001. (2001)Smith, B. W. Customizing Illumination and Square Pupil Shapes IMEC Lithography Review, Leuven, Belgium, June 2001. (2001)Smith, B. W. Spatial Filtering Effects of the Attenuated PSM and Assist Bar OPC SPIE Symposium on Microelectronic and MEMS Technology, Edinburgh, Scotland June, 2001 (2001)Smith, B. W. Optical research for UV and VUV SRC Review, Madison, WI, July 2001. (2001)Smith, B. W. Optics in Microlithography University of Leuven Engineering Talent Night, Leuven, Belgium, November 2001. (2001)Henderson, D. O., Mu, R., Ueda, A., Wu, M. H., Gordon, E. M., Tung, Y. S., Huang, M., Keay, J., Feldman, L. C., Hollingsworth, J. A., Buhro, W. E., Harris, J. D., Hepp, A. F., Raffaelle, R. P. Optical and Structural Characterization of Copper Indium Disulfide Thin Films Materials & Design, 22, 7, pp. 585-589 (2001)Nomura, A. E., Kurinec, S. K., Raffaelle, R Ohmic Contact Formation on N-type 6H-SiC Using Polysilicon and Silicides International Semiconductor Device Research Symposium Proceedings, Washington, DC, pp. 523-526 (2001)Raffaelle, R. P., Landi, B.J., Gennett, T., Morris, R.S., Dixon, B., Lamarre, P Fuel Cell Applications of Carbon Nanotubes, American Society of Mechanical Engineers Fuel Cell 2003: Fuel Cell Science, Engineering, and Technology, Rochester, New York, April, 1708 (2001)Obi, N.; Takeuchi, J; DiFrancesco, A. G.; Hailstone, R. K Mechanistic Studies of a New Nucleated Infectious Development System Using Pyridinium Salts J. Imag. Sci. Technol., 44: 219 (2000)Hailstone, R. K; Vandenbroucke, D; De Keyzer, R Effect of Deep Electron Traps on Contrast in AgCl Emulsions. J. Imag. Sci. Technol., 44: 250. (2000)Wen, Z; DiFrancesco, A. G; Hailstone, R. K A New Approach to Measuring the Fraction of Grains Developable in Polydisperse Emulsions. J. Imag. Sci. Technol., 44: 257 (2000)Schlief, R.; Smith, B. W. Investigation of the interplay between illumination, mask patterning, and aberrations from the lens perspective, SPIE Optical Microlithography XIV, Vol. 4343, 2001. (2000)Smith, B. W.; Kang, H. Frequency filtering in alternative pupil planes J. Vac. Soc. B 2000. (2000)Venkataraman, P.; Smith, B. W. Aberration of steppers using phase shifting point diffraction interferometry SPIE Optical Microlithography XIII, Vol. 4000, 2000 (2000)Cangemi, M.; Lassiter, M.; Bourov, A.; Smith, B. W. Properties and potential of VUV lithographic thin film materials SPIE Optical Microlithography XIII, Vol. 4000, 2000 (2000)Smith, B. W.; Kang, H. Spatial frequency filtering in the pellicle plane SPIE Optical Microlithography XIII, Vol. 4000, 252, 2000. (2000)Smith, B. W. Understanding lens aberration and influences to lithographic imaging SPIE Optical Microlithography XIII, Vol. 4000, 2000. (2000)Kang, H.; Smith, B. W. Fabrication of small contacts using practical pupil filtering SPIE Optical Microlithography XIII, Vol. 4000, 2000. (2000)Smith, B. W. Impact of Aberrations of Optical Extension OE Lens Code Sematech OE Workshop, Burlington, VT, June 2000 (2000)Smith, B. W. Tolerancing of aberrations for resolution enhancement technology: Issues involed in optimizing Sematech OE Workshop, Austin, TX, January 2000. (2000)Smith, B. W. Pupil Plane Filtering Near Mask and Image Planes IEEE Lithography Workshop St. John, USVI , December 2000. (2000)Smith, B. W. Optical research for UV and VUV SRC Review, Madison, WI, June 2000. (2000)Smith, B. W. Lithographic Challenges for 130nm Devices IEEE Computer and Electron Device Society Maine Chapter, May , 2000. (2000)Smith, B. W. Advancing the Limits of Optical Lithography 2000-2003 SPIE (2000)Smith, B. W. The Fundamental Limits of Optical Lithography 2000-2005 SPIE (2000)Hailstone, R. K Effect of I- impurity on the efficiency of silver cluster formation on AgBr microcrystal surfaces. J. Appl.Phys, 86: 1363 (1999)Kotlarchyk, M. Scattering Theory in Encyclopedia f Spectroscopy and Spectrometry, J.C. Lindon, G.E. Tranter, J.L. Holmes, eds., Academic Press, London (1999)Smith, B. W. Variations to the influence of lens aberration invoked with PSM and OAI Proc. SPIE Optical Microlithography XII, 1999 (1999)Smith, B. W.; Petersen, J. S. Resolution and DOF improvement through the use of square shaped illumination, Proc. SPIE Optical Microlithography XII, 1999. (1999)Smith, B. W.; Bourov, A.; Zavyalova, L.; Cangemi, M. Design and development of thin film materials for 157 nm and VUV wavelengths: Proc. SPIE Emerging Lithographic Technologies III, 1999. (1999)Smith, B. W. Understanding the Limits of Optical Lithography Shortcourse Workbook 1999 (1999)Smith, B. W. Understanding Lens Aberrations and Influences with RET Shortcourse Workbook 1999 (1999)Weiner, C. Improved Acquisition of Underdrawings in Oil-Paintings Using IR-Reflectography (1998)Jacoby, K. Characterizing the Effect of Spatial Translations on JPEG-compressed Images (1998)Wong, Y. Modeling the Halftone Image to Determine the Area Fraction of Ink (1998)Pattanaik, S. N.; Ferwerda, J A ; Fairchild, M D ;Greenberg, D P A multiscale model of adaptation and spatial vision for image display Proceedings of SIGGRAPH 98, 287-298 (1998). (1998)Obi, N;Takeuchi, J; Kojima, Y; Shigemitsu, Y; DiFrancesco, A. G; Hailstone, R. K Mechanistic Studies of a New Nucleated Infectious Development System Using Pyridinium Salts: Nucleation of Silver Halide Grains by Dihydropyridines J. Imag. Sci. Technol., 42: 221 (1998)Smth, B. W.; Petersen, J. S. Influence of off-axis illumination on optical lens aberration J. Vac. Soc. B Vol. 16, 6, 3398 1998 (1998)Petersen, J. S.; Smith, B. W.; McCallum, M.; Kachwala, N.; Socha, R.; Chen, J. F.; Laidlaw, T.; Gordon, R.; Mack, C. Assessment of a hypothetical roadmap to extend optical lithography through the 70nm SIA technology node SPIE BACUS Proceedings, 1998. (1998)Smith, B. W.; Zavyalova, L.; Petersen, J. S. Illumination pupil filtering using modified quadrupole apertures Proc. SPIE Optical Microlithography XI, 3334, 1998. (1998)Smith, B. W. Revalidation of the Rayleigh resolution and DOF limits Proc. SPIE Optical Microlithography XI, v3334, 1998. (1998)Smith, B. W.; Webb, J; Petersen, J. S.; Meute, J. Aberration evaluation and tolerancing of 193 nm lithographic objective lenses SPIE Optical Microlithography XI, v3334, 1998. (1998)Smith, B. W. Maskmaking for IC Microlithography Shortcourse Workbook 1998 (1998)Smith, B. W. Optical extension technology MaskTools OE Workshops, Taiwan , February, 1999, Semicon West 1999, San Jose 1998. (1998)Smith, B. W. Lithographic Technology Corporation consulting and technology development for integrated Circuit Microlithography applications, New York State S-corporation, 1998. (1998)Reichmanis, E.; Nalamasu, O.; Wallow, T. I.; Cirelli, R.; Dabbagh, G.; Hutton, R. S.; Novembre, A. E.; Smith, B. W. Resist design concepts for 193nm lithography: Opportunities for innovation and invention J. Vac. Soc. Am. B, 15 (6), 2528, 1997. (1997)Smith, B. W.; Zavyalova, L.; Bourov, A.; Butt, S.; Fonesca, C. Investigation into excimer laser radiation damage of DUV optical phase masking films J. Vac. Soc. Am. B, 15 (6), 2444, 1997. (1997)Smith, B. W.; Fonesca, C.; Zavyalova, L.; Alam, L. Z.; Bourov, A. Plasma reactive ion etching of 193nm attenuated phase shift mask materials, J. Vac. Soc. Am. B, 15 (6), 2259, 1997. (1997)Smith. B. W.; Novembre, A. E.; Mixon, D A Negative Acting Single Layer Resist for 193 nm Lithography, P(SI-CMS) Microelectronic Engineering 34(2), 137, 1997 (1997)Smith, B. W.; Zavyalova, L; Butt, S.; Bourov, A.; Bergman, N. Fonseca, C.; Alan, Z. The effects of excimer laser radiation on attenuated phase-shift masking materials" Proc. SPIE 3051, 1997. (1997)Smith, B.W.; Alam., Z.;Butt, S.;Kurinec, S.;Lane, R.; Arthur, G. Development and characterization of nitride and oxide based composite materials for sub-0.18mm attenuated phase shift masking Microelectronic Engineering 35, 201, 1997. (1997)French, R. H.; Carcia, P. F.; Sharp, K. G.; Meht, J. S.; Smith, B. W.; Cannon, R. M. New Materials Families for 193 nm and DUV Attenuating Embedded Phase Shifter Photomasks Annual Meeting, American Ceramic Society, Cincinnati, OH, May 1997. (1997)Sheats, J.; Smith, B. W. Microlithography:Science and Technology ed. , Marcel Dekker: New York, 1997 (1997)Smith, B. W. Resist processing Microlithography: Science and Technology, Ch. 9, J. Sheats and B.W. Smith, ed. , Marcel Dekker: New York, 1997. (1997)Smith, B. W. Multilayer resist technology Microlithography: Science and Technology, Ch. 10, J. Sheats and B.W. Smith, ed. , Marcel Dekker: New York, 1997. (1997)Smith, B. W. Optics for microlithography Microlithography: Science and Technology, Ch. 2, J. Sheats and B.W. Smith, ed. , Marcel Dekker: New York, 1997. (1997)Smith, B. W. Multilayer Resist Systems for Optical Lithography Shortcourse Workbook 1997 (1997)Smith, B. W. Optical enhancement techniques for 193-nm lithography: modified illumination and attenuated phase-shift masking, ISMA’97, Singapore, June 1997. (1997)Smith, B. W. Strategies toward sub-0.25 micron lithography B. Smith, Optics and Photonics News 8, 3, 23 (1997). (1997)Smith, B. W.; Butt,S.; Alam, Z. Attenuated phase shift mask materials for 248 and 193 nm lithography Microlithography World, 6(2), 7 1997. (1997)Hossain, M.M.; Bajorski, P. and Y, W.ang Frictional Characteristics of Sand and Sand-Deicer Mixtures on Bare Ice Transportation Research Record, No. 1585, pp.30-38. (1997)Hailstone, R. K From Physics to Photography via Computer Simulation J. Photogr. Sci. Technol. Jpn., 59: 242. (1996)Guo, S; Hailstone, R. K Spectroscopic and Sensitometric Studies of Chemically Produced Silver Clusters J. Imag. Sci. Technol., 40: 210. (1996)DiFrancesco, A. G.; Pryor, C; Tyne, M;Hailstone, R. K Hole Removal in High-pH-Induced Reduc¬tion-Sensitized Silver Bromide Grains J. Imag. Sci. Technol., 40: 576. (1996)Smith, B. W.; Butt, S.; Alam. Z.; Kurinec, S.;Lane, R. Attenuated phase shift mask materials for 248 and 193 nm lithography J. Vac. Soc. Am. B, 14 (6), 1996. (1996)Randolf, A.; Kurinec, S.; Smith, B. W. Optical and dielectric properties of sputtered aluminum nitride thin films Proc. MRS Symposium on Materials Research, Rochester, N.Y., 1996 (1996)Smith, B. W.; Butt, S.; Alam. Z. Optical films for attenuated phase shift mask application at 193nm IEEE Lithography Workshop, conference abstracts, Maui, 1996. (1996)Carcia, P. F.; French, R. H.; Sharp, K.; Meth, J. S.; Smith, B. W. Materials screening for attenuated embedded phase shift photomasks for DUV and 193nm lithography Proc. 16th Annual BACUS Symposium on Microlithography, 1996. (1996)Smith, B. W.; Butt, S.; Alam. Z. Optical films for attenuated phase shift mask application at 193nm IEEE Lithography Workshop, conference abstracts, Maui, 1996. (1996)Rizvi, N.; Grover, M.; Ashworth, D.; Smith, B.' Rumbsy, P.; Goodalll, F.; Lawes, R. 193nm imaging using a small-field high-resoultion resist exposure tool, SPIE 2726, 1996 (1996)Smith, B. W.; Stem, D.; Alam, Z.; Butt, S. Optical properties and optimization of SixNy as an anti-reflective layer for 193 nm photolithograph Second Intl. Symp. on 193nm Lithography (conference abstracts), 1996. (1996)Smith, B. W. Sub-0.25 micron optical lithography technology, SEMICON, Korea, 1996. (1996)Hailstone, R. K; Heieck, J Computer Simulation of Photoconductivity Decay in AgBr Microcrystals: Two-Center Model J. Phys. D: Appl. Phys., 28: 375 (1995)Hailstone, R. K Computer Simulation Studies of Silver Cluster Formation on AgBr Microcrystals J. Phys. Chem., 99: 4414 (1995)Rogers, J. K; Toledo-Crow, R; Vaez-Iravani, M; DiFrancesco, G; Zhao, T; Hailstone, R Correlative Near-Field Direct/Fluorescence Imaging and Spectroscopy of a Sensitizing Dye on Single Microcrystals of Silver Halide J. Imag. Sci. Technol., 39: 205 (1995)Hailstone, R. K Computer Simulation Study of the Effect of Grain Size on the Efficiency of Latent-Image Formation. J. Imag. Sci. Technol., 39: 407 (1995)Hailstone, R. K; De Keyzer, R Computer Simulation Study of the Sensitometric Effects of Corner Rounding in Cubic Grains. J. Imag. Sci. Technol., 39: 509. (1995)Sauer, C.; Smith, B.; Dean, R.; Morita, E.; Tan, Z.; Ewbank, D.; Duttagupta, S Evaluation of Commercial and Experimental Resist Materials for use in Electron beam Application Proc. 15th Annual BACUS Symposium on Microlithography, 1995. (1995)Smith, B. W.; Butt, S.; Alam. Z.; Crow, R.; Turgut, S. Attenuated Phase-Shift Masks for 193nm First Intl. Symp. on 193nm Lithography (conference abstracts), 1995. (1995)Smith, B. W.; Ramamoorthi, S The Impact of Optical Aberrations and Flare on High NA 193nm Lithography: Resist Requirements for DOF First Intl. Symp. on 193nm Lithography (conference abstracts), 1995. (1995)Smith, B. W.; Butt, S. A.; Novembre, A. E.; Mixon, D. A. Design and Characterization of Poly(trimethylsilylmethyl methacrylate-co-chloromethyl styrene) for 193 nm exposure SPIE Advances in Resist Technology and Processing XII, 2438, (1995). (1995)Turgur, S.; Smith, B. W. Direct Measurement of Optical Constants of Metals from a KrF Excimer using Polarization Methods SPIE Integrated Circuit Metrology, Inspection, and Process Control IX, 2439, (1995). (1995)Goldman, M.; Alexander, D.; Chowdhury, S. D.; Drennan, P. G.; Karklin, L.; Smith, B. W. Photolithography Process Characterization and 3D Modeling using DRM Data SPIE Advances in Resist Technology and Processing XII, 2438, (1995). (1995)Smith, B. W. Semiconductor Microlithography for sub 0.25-micron Rutherford Appleton Laboratories (RAL), Oxford, UK, 1995. (1995)Raman, N.; Rao, N Pre-enhancement of chirp signal for inverse filtering in medical ultrasound Proc. 16th Annual International Conference of IEEE Engg. Med. Biol. (1994) (1994)Hailstone, R. K Transputer-based Simulations of Image Recording in Silver-Halide Materials Comput¬ers in Physics, 8: 205 (1994)Hailstone, R. K Effect of Internal Latent-Image Formation in Diagnosing Unit- vs Segmented-Grain Behavior J. Soc. Photogr. Sci. Technol. Jpn, 57: 215. (1994)Hailstone, R. K; Erdtmann, D. E Computer Simulation of Photoconductivity Decay in AgBr Microc¬rystals: Relaxation Model J. Appl. Phys., 76: 4184. (1994)Smith, B. W.; Novembre, A. E. A Negative Acting Single Layer Resist for 193 nm Lithography, P(SI-CMS) Proc. Tenth International Conference on Photopolymers, (1994). (1994)Crivello, J. V.; Shim, S. Y.; Smith, B. W.; Deep UV Chemically Amplified Dissolution Inhibited Photoresists Chem. of Matls., Vol. 6, No. 11, 2167 (1994). (1994)Smith, B. W. Phase-shift Mask Issues for 193 nm Lithography SPIE Optical/Laser Microlithography V, 2194, (1994). (1994)Smith, B. W.; Eakin, T. D. Characterization of Safe Solvent PMMA Resist Variables for Electron Beam Lithography SPIE E-Beam, X-Ray, and I-Beam Submicron Lithography, 2195, (1994). (1994)Zhang, G.; Smith, B. W. Optimization of a Liquid Phase Silylation Process for 248 nm Lithography using EL IR Photoresists SPIE Advances in Resist Technology and Processing, 2195, (1994). (1994)Crow, R. T.; Iravani, M. V.; Smith, B. W. Near-field Optical Microscopy Characterization of ICs SPIE IC Metrology, Inspection, and Process Control, 2196, (1994). (1994)Drennan, P.; Smith, B. W. Technique for the Measurement of the In-Situ Development Rate of DNQ/Novalac Resists SPIE IC Metrology, Inspection, and Process Control, 2196, (1994). (1994)Drennan, P.; Smith, B. W. Extraction of Process Specific Photolithography Model Parameters SPIE IC Metrology, Inspection, and Process Control, 2196, (1994). (1994)Zhang, D.; Hailstone, R. K Electronic Properties of Sensitizer Centers J. Imag. Sci. Technol., 37:61. (1993)Smith, B. W.; Grover, M. A 193 nm Deep-UV Lithography System using a Line-narrowed ArF Excimer Laser, SPIE Optical/Laser Microlithography VI, 1927, (1993). (1993)Smith, B. W.; Flagello, D. Comparison of Scalar and Vector Diffraction Theory for Deep-UV Lithography SPIE Optical/Laser Microlithography VI, 1927, (1993). (1993)Smith, B. W.; Crow, R. T. Characterization of Atomic Force Microscopy and Electrical Probing Techniques for IC Metrology SPIE Integrated Circuit Metrology, Inspection, and Process Control, 1926, (1993). (1993)Holscher, R.; Smith, B. W. Response Surface Modelling of Phase-Shift Mask Process Simulation SPIE Advances in Resist Technology IX, (1993) (1993)Connors, J. E.; Kos, T. M.; Pack, R. C.; Smith, B. W. Advanced lithography simulation tools for development and analysis of wide-field high NA projection optical systems SPIE Optical/Laser Microlithography VI, 1927, (1993). (1993)Kotlarchyk, M.; Sheu, E.Y.; Capel, M. Structural and Dynamical Transformations Between Neighboring Dense Microemulsion Phases Phys. Rev. A 46, 928 (1992)Sheu, E.Y.; De Tar, M.M.; Kotlarchyk, M.; Lin, J.S.; Capel, M.; Storm, D.A. Structural Evolution and Transition of a Three-Component Dense Microemulsion System in Structure and Dynamics of Strongly Interacting Colloids and Supramolecular Aggregates in Solution, S.H. Chen, J.S. Huang, P. Tartaglia, eds., Kluwer Academic Publishers, Netherlands, P. 419 (1992)Smith, B. W.; Shaio, W. M. Response Surface Modelling Utilizing Lithographic Process Simulation SPIE Integrated Circuit Metrology and Process Control IV, 1673, (1992). (1992)Hailstone, R. K; Liebert, N. B; Levy, M; Hamilton, J. F Achieving High Quantum Sensitivities with Hydrogen Hypersensitization. 2. Mechanism J. Imag. Sci., 35:219 (1991)Kotlarchyk, M.; Ritzau, S.M. Paracrystal Model of the High-Temperature Lamellar Phase of a Ternary Microemulsion System J. Appl. Cryst. 24, 753 (1991)Hailstone, R. K; Liebert, N. B; Levy, M On the Mechanism of Oversensitization J. Imag. Sci., 34:169. (1990)Huang, J.S.; Kotlarchyk, M.; Chen, S.H. Structure and Properties of Three-Component Microemulsions Near the Critical Point in Micellar Solutions and Microemulsions: Structure, Dynamics, and Statistical Thermodynamics, S. H. Chen, R. Rajagopalan, eds., Springer-Verlag, New York, p. 227 (1990)Hailstone, R. K; Liebert, N. B; Levy, M Development Center Distributions in a AgBr Model Emul¬sion. 2. Sulfur-Sensitized Versions J. 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